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Heather Polgrean
at IBM Corp
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Publications (1)
Proceedings Article | 23 March 2020 Paper
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
Proceedings Volume 11326, 1132609 (2020) https://doi.org/10.1117/12.2551967
KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Ions, Optical lithography, Stochastic processes, Data modeling, Interfaces, Solids, Systems modeling
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