Mr. Hideaki Hashimoto Profile

Hideaki Hashimoto

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 28 June 2013 Paper

Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly

Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara

Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363

KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Optical lithography, Extreme ultraviolet, Image sensors, Sensors, Image transmission, Double patterning technology, Lithography

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Proceedings Article | 30 June 2012 Paper

Development of a new mask pattern inspection tool NPI-7000 and applied results to EUV mask inspection

Hideaki Hashimoto, Nobutaka Kikuiri, Ikunao Isomura, Manabu Isobe, Noriaki Musashi

Proceedings Volume 8441, 844117 (2012) https://doi.org/10.1117/12.973655

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Lithography, Current controlled current source, Phase shifts, Laser sources, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 29 September 2010 Paper

Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Ryoichi Hirano, Nobutaka Kikuiri, Hideaki Hashimoto, Kenichi Takahara, Masatoshi Hirono, Hiroyuki Shigemura

Proceedings Volume 7823, 782339 (2010) https://doi.org/10.1117/12.866673

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Defect detection, Extreme ultraviolet lithography, Image contrast enhancement, Image enhancement, Lithographic illumination, Image sensors, Light sources

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Proceedings Article | 2 April 2010 Paper

A novel defect detection optical system using 199-nm light source for EUVL mask

Ryoichi Hirano, Nobutaka Kikuiri, Masatoshi Hirono, Riki Ogawa, Hiroyuki Sigemura, Kenichi Takahara, Hideaki Hashimoto

Proceedings Volume 7638, 76382Z (2010) https://doi.org/10.1117/12.848679

KEYWORDS: Photomasks, Inspection, Defect detection, Image contrast enhancement, Signal detection, Extreme ultraviolet lithography, Extreme ultraviolet, Image enhancement, Lithography, Image sensors

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Proceedings Article | 30 September 2009 Paper

Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yukiyasu Arisawa, Osamu Suga, Hideaki Hashimoto, Masanori Saito, Masaya Takeda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7488, 74882I (2009) https://doi.org/10.1117/12.829748

KEYWORDS: Photomasks, Inspection, Opacity, Defect inspection, Defect detection, Extreme ultraviolet lithography, Semiconducting wafers, Reflectivity, Signal analysis, Scanning electron microscopy

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Proceedings Article | 30 September 2009 Paper

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda

Proceedings Volume 7488, 74882O (2009) https://doi.org/10.1117/12.829747

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Image contrast enhancement, Laser sources, Optical inspection, Defect detection, Super resolution, Optical alignment

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Proceedings Article | 11 May 2009 Paper

Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Yukiyasu Arisawa, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7379, 73792K (2009) https://doi.org/10.1117/12.824334

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect inspection, Reflectivity, Optical inspection, Defect detection, Signal detection, Opacity, Finite-difference time-domain method

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Proceedings Article | 24 March 2009 Paper

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

Ryoichi Hirano, Masatoshi Hirono, Riki Ogawa, Nobutaka Kikuiri, Kenichi Takahara, Hideaki Hashimoto, Hiroyuki Shigemura

Proceedings Volume 7272, 72722A (2009) https://doi.org/10.1117/12.814466

KEYWORDS: Photomasks, Inspection, Super resolution, Lithography, Image transmission, Polarization, Optical inspection, 193nm lithography, Defect detection, Image contrast enhancement

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Proceedings Article | 17 October 2008 Paper

The study of EUVL mask defect inspection technology for 32-nm half-pitch node device and beyond

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Tsuneo Terasawa, Yukiyasu Arisawa, Hideaki Hashimoto, Norio Kameya, Masaya Takeda, Nobutaka Kikuiri, Ryoichi Hirano, Masatoshi Hirono

Proceedings Volume 7122, 71222F (2008) https://doi.org/10.1117/12.801550

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Reflectivity, Defect inspection, Opacity, Scanning electron microscopy, Defect detection, Optical inspection, Finite-difference time-domain method

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Proceedings Article | 15 May 2007 Paper

Evaluation of defect inspection sensitivity using 199-nm inspection optics

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Hideaki Hashimoto, Shingo Murakami, Nobutaka Kikuiri

Proceedings Volume 6607, 66073F (2007) https://doi.org/10.1117/12.729034

KEYWORDS: Inspection, Opacity, Photomasks, Extreme ultraviolet lithography, Optical inspection, Defect inspection, Reflectivity, Scanning electron microscopy, Deep ultraviolet, Defect detection

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Showing 5 of 10 publications

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