Mr. Hidenori Takahashi Profile

Hidenori Takahashi

at FUJIFILM Corp

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 27 March 2017 Presentation + Paper

Challenges and progress in low defectivity for advanced ArF and EUV lithography processes using surface localized material technology

Michihiro Shirakawa, Hideaki Tsubaki, Hajime Furutani, Wataru Nihashi, Naohiro Tango, Kazuhiro Marumo, Kei Yamamoto, Hidenori Takahashi, Akiyoshi Goto, Mitsuhiro Fujita

Proceedings Volume 10146, 101460E (2017) https://doi.org/10.1117/12.2257956

KEYWORDS: Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Image processing, Immersion lithography, Chemically amplified resists, High volume manufacturing, Photomasks, Scanners, Polymers, Research management, Semiconducting wafers, Fluorine, Coating

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Proceedings Article | 16 April 2011 Paper

Characterizing polymer bound PAG-type EUV resist

Hiroshi Tamaoki, Shinji Tarutani, Hideaki Tsubaki, Toshiya Takahashi, Naoki Inoue, Tooru Tsuchihashi, Hiroo Takizawa, Hidenori Takahashi

Proceedings Volume 7972, 79720A (2011) https://doi.org/10.1117/12.879394

KEYWORDS: Polymers, Diffusion, Line width roughness, Extreme ultraviolet lithography, Lithography, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet, Polymer thin films, Research management

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Proceedings Article | 31 March 2010 Paper

Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system

Shinji Tarutani, Hideaki Tsubaki, Hidenori Takahashi, Takayuki Itou, Kentaro Matsunaga, Gousuke Shiraishi, Toshiro Itani

Proceedings Volume 7639, 76391O (2010) https://doi.org/10.1117/12.846033

KEYWORDS: Polymers, Diffusion, Lithography, Line width roughness, Semiconducting wafers, Polymer thin films, Extreme ultraviolet lithography, Research management, Optical lithography, Photoresist processing

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Proceedings Article | 30 March 2010 Paper

Study on approaches for improvement of EUV-resist sensitivity

Shinji Tarutani, Hideaki Tsubaki, Hidenori Takahashi, Takayuki Itou

Proceedings Volume 7639, 763909 (2010) https://doi.org/10.1117/12.846031

KEYWORDS: Polymers, Diffusion, Extreme ultraviolet, Absorption, Ionization, Electroluminescence, Extreme ultraviolet lithography, Yield improvement, Semiconducting wafers, Research management

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Proceedings Article | 1 April 2009 Paper

Effect of resist polymer molecular weight on EUV lithography

Hideaki Tsubaki, Katsuhiro Yamashita, Hidenori Takahashi, Daisuke Kawamura, Toshiro Itani

Proceedings Volume 7273, 72733S (2009) https://doi.org/10.1117/12.812204

KEYWORDS: Polymers, Line width roughness, Diffusion, Extreme ultraviolet lithography, Photomasks, Electroluminescence, Semiconducting wafers, Glasses, Extreme ultraviolet, Image resolution

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