Mr. Hiraku Hashimoto Profile

Hiraku Hashimoto

at University of Hyogo

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 25 October 2016 Paper

Observation results of actual phase defects using micro coherent EUV scatterometry microscope

Hiraku Hashimoto, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 9985, 99850K (2016) https://doi.org/10.1117/12.2246945

KEYWORDS: Extreme ultraviolet, Scatterometry, Microscopes, Extreme ultraviolet lithography, Photomasks, Atomic force microscopy, Particles, Scattering, Inspection, Phase shifts

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Proceedings Article | 25 October 2016 Paper

Development of actual EUV mask observation method for micro coherent EUV scatterometry microscope

T. Harada, H. Hashimoto, T. Watanabe

Proceedings Volume 9985, 99851T (2016) https://doi.org/10.1117/12.2242809

KEYWORDS: Extreme ultraviolet, Photomasks, Microscopes, Diffraction, Scatterometry, Extreme ultraviolet lithography, Speckle, Signal detection, CCD cameras, Multilayers

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SPIE Journal Paper | 18 February 2016

Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

JM3, Vol. 15, Issue 02, 021007, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021007

KEYWORDS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging

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Proceedings Article | 9 November 2015 Paper

Phase imaging results of phase defect using micro coherent EUV scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

Proceedings Volume 9635, 96351E (2015) https://doi.org/10.1117/12.2205304

KEYWORDS: Microscopes, Extreme ultraviolet, Phase contrast, Phase imaging, Extreme ultraviolet lithography, Coherence imaging, Diffraction, Photomasks, CCD cameras, Reconstruction algorithms, Reflection

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Proceedings Article | 9 July 2015 Paper

Development of a reflectometer for a large EUV mirror in NewSUBARU

Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9658, 965819 (2015) https://doi.org/10.1117/12.2199014

KEYWORDS: Reflectometry, Mirrors, Extreme ultraviolet, Reflectivity, Photomasks, Spherical lenses, Switching, Multilayers, Extreme ultraviolet lithography, Synchrotrons

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