KEYWORDS: Picture Archiving and Communication System, Molecules, Scanning electron microscopy, Photoresist developing, Hydrogen, Molecular interactions
Our earlier studies pointed to a strong correlation between the molecular weight of novolac resin and lithographic characteristics. In particular, they showed that the resolution and DOF characteristics of resists may be improved by controlling molecular weight distribution. The present study focuses on photoactive compound (PAC) structure and resin structure. This paper discusses the effects of differences in PAC ballast structure and the composition of m-cresol (metacresol), p-cresol (para-cresol), and xylenol, phenolic monomers that constitute novolac resin, on resolution and lithographic characteristics, based on development rates and resist pattern simulations.
In recent years, we have seen growing numbers of reports on problems associated with outgas generated from resists during ArF exposure, including contaminating of the exposure equipment lens. Scanner manufacturers have apparently begun taking countermeasures—for example, establishing criteria for outgas generated by resists during exposure. In the near future, resist manufacturers will likely be required to attach documents regarding outgassing to their products at the time of shipment. In our earlier studies, we tried to establish methods for evaluating outgassing from KrF resists during KrF (248 nm) exposure. This paper examines an approach to evaluating outgassing from ArF chemically-amplified resists during ArF exposure, with a special focus on sulfate ions (SO42-) derived from PAG, based on the outgas analytical techniques that we have built up to date. We used ion chromatography (IC) as the method of analysis.
In this study, we prepared the EUV metal resist, which included ZrO2 nano-particle and three type of ligands such as 2-propenoic acid 2-methyl (MAA), propanoic acid 2-methyl (IBA) and vinylbenzoic acid (VBA). In this study, we prepared the following resists by blending each material separately for evaluating the outgassing from the view point of EUV resist materials. We prepared three type of samples on a basis of ZrO2-MAA, ZrO2-IBA and ZrO2-VBA, each resist was coated on a silicon wafer, and we evaluated the outgassing from these samples during irradiation of 2 keV electron by in-situ mass spectrometry. From the results of mass spectrum, we observed the outgassing of PAG as unique peaks. And each ligand peak was distributed over the low mass range. On the other hand, the ZrO2 peaks could not be observe in mass spectrum of each sample. Thus, ZrO2 nano-particles might not be evaporating during 2keV electron irradiation.
It has long been known that snail shells have an excellent anti-fouling function, as it is said that there are no dirty snails. The snails encountered during the baiu rainy season in Japan always have clean, shining shells. These shells are known to have convex-concave nanoscale structures on their surface (roughness on the order of approximately 200 nm) that promote the formation of a film of water on the shell surface, creating an ultra-hydrophilic nanoscale structure that repels oils and stains [1] . Creating such an ultra-hydrophilic nanoscale structure on a polymer surface should allow us to produce an antifouling polymer sheet. Additionally, producing a tube from a polymer film with this nanoscale structure should make it possible to create a tube with high antifouling properties. The field of technologies based on imitating properties and structures observed in living organisms in nature is called biomimetics [2]. This paper reports on the development of antifouling sheets and tubes with antifouling functions fabricated using the above technologies. The first step was creating a mold with an artificial snail shell structure using ZrO2 nanoparticles [3], whose patterns were then transferred to polymer with nanoimprint technology [4-5]. These antifouling sheets and tubes are expected to see wide use for medical applications.
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