Dr. Hiroshi Komori Profile

Dr. Hiroshi Komori

at EUVA

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 20 March 2010 Paper

Paper

First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo

Proceedings Volume 7636, 763608 (2010) https://doi.org/10.1117/12.846271

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Tin, Laser systems engineering, Plasma systems, Mirrors, Extreme ultraviolet lithography, Pulsed laser operation

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Proceedings Article | 18 May 2009 Paper

Paper

Characterization of tin vapor from CO[sub]2[/sub] laser produced EUV light source

Yoshifumi Ueno, Tatsuya Yanagida, Takashi Suganuma, Hiroshi Komori, Akira Sumitani, Akira Endo

Proceedings Volume 7361, 73610X (2009) https://doi.org/10.1117/12.820966

KEYWORDS: Tin, Ions, Liquids, Plasma, Carbon dioxide lasers, Laser induced fluorescence, Solids, Chemical species, Extreme ultraviolet, Pulsed laser operation

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Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 12 May 2008 Paper

Paper

Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Yoshifumi Ueno, Georg Soumagne, Takashi Suganuma, Takayuki Yabu, Masato Moriya, Hiroshi Komori, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 7005, 70052U (2008) https://doi.org/10.1117/12.782475

KEYWORDS: Tin, Magnetism, Plasma, Ions, Carbon dioxide lasers, Mirrors, Extreme ultraviolet, Light sources, Carbon dioxide, Nd:YAG lasers

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Proceedings Article | 21 March 2008 Paper

Paper

Magnetic debris mitigation of a CO2 laser-produced Sn plasma

Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 69212Z (2008) https://doi.org/10.1117/12.771817

KEYWORDS: Tin, Plasma, Magnetism, Carbon dioxide lasers, Ions, Mirrors, Silicon, Extreme ultraviolet, Gold, Statistical analysis

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Proceedings Article | 20 March 2008 Paper

Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Akira Endo, Hideo Hoshino, Takashi Suganuma, Krzysztof Nowak, Tatsuya Yanagida, Takayuki Yabu, Takeshi Asayama, Yoshifumi Ueno, Masato Moriya, Masaki Nakano, Hiroshi Someya, Toshihiro Nishisaka, Tamotsu Abe, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6921, 69210T (2008) https://doi.org/10.1117/12.771959

KEYWORDS: Tin, Carbon dioxide lasers, Extreme ultraviolet, Ions, Magnetism, Mirrors, Plasma, Pulsed laser operation, Light sources, Carbon dioxide

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Proceedings Article | 13 September 2007 Paper

Paper

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Akira Endo, Tamotsu Abe, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6703, 670309 (2007) https://doi.org/10.1117/12.732254

KEYWORDS: Gas lasers, Tin, Carbon monoxide, Extreme ultraviolet, Plasma, Pulsed laser operation, Carbon dioxide lasers, Light sources, Magnetism, Ions

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Proceedings Article | 21 March 2007 Paper

Paper

Characterization of various Sn targets with respect to debris and fast ion generation

Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura, Masaki Nakano, Hiroshi Komori, Georg Soumagne, Akira Endo, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65173B (2007) https://doi.org/10.1117/12.711226

KEYWORDS: Tin, Gas lasers, Ions, Plasma, Carbon monoxide, Nd:YAG lasers, Extreme ultraviolet, Glasses, Solids, Mirrors

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Proceedings Article | 19 March 2007 Paper

Paper

Laser-produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65170O (2007) https://doi.org/10.1117/12.711097

KEYWORDS: Gas lasers, Carbon monoxide, Tin, Extreme ultraviolet, Plasma, Pulsed laser operation, Nd:YAG lasers, Light sources, Optical amplifiers, Ions

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Proceedings Article | 23 March 2006 Paper

Paper

Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Proceedings Volume 6151, 61510S (2006) https://doi.org/10.1117/12.656941

KEYWORDS: Gas lasers, Carbon monoxide, Plasma, Pulsed laser operation, Xenon, Extreme ultraviolet, Ions, Magnetism, Laser irradiation, Oscillators

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Proceedings Article | 31 August 2005 Paper

Paper

EUV characteristics of a high power and high repetition rate CO2 laser driven Xe plasma

Hiroshi Komori, Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Akira Endo

Proceedings Volume 5918, 59180H (2005) https://doi.org/10.1117/12.616051

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Ions, Xenon, Nd:YAG lasers, Pulsed laser operation, Laser irradiation, Light sources, Mirrors

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Proceedings Article | 6 May 2005 Paper

Paper

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599333

KEYWORDS: Extreme ultraviolet, Light sources, Xenon, Laser applications, Gas lasers, Laser systems engineering, Nd:YAG lasers, Oscillators, Amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 6 May 2005 Paper

Paper

Model of neutralization of highly ionized Xe generated by laser-produced plasma

Iwao Nishiyama, Hiroshi Komori, Georg Soumagne

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601449

KEYWORDS: Ions, Xenon, Plasma, Extreme ultraviolet, Chemical species, Plasma generation, Light sources, Magnetism, Sensors, Extreme ultraviolet lithography

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Proceedings Article | 6 May 2005 Paper

Paper

Magnetic field ion mitigation for EUV light sources

Hiroshi Komori, Yousuke Imai, Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Akira Endo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600360

KEYWORDS: Ions, Magnetism, Xenon, Plasma, Extreme ultraviolet, Mirrors, Light sources, Pulsed laser operation, Laser energy, Nd:YAG lasers

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Proceedings Article | 8 October 2004 Paper

Paper

Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography

Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Yuichi Takabayashi, Akira Endo

Proceedings Volume 5662, (2004) https://doi.org/10.1117/12.596356

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Liquids, Pulsed laser operation, Nd:YAG lasers, Mirrors, Plasma systems

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Proceedings Article | 20 September 2004 Paper

Paper

Measurements of energy distribution functions of xenon ions from laser-produced plasmas for lithography

Georg Soumagne, Tamotsu Abe, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Akira Endo

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.545933

KEYWORDS: Ions, Xenon, Plasmas, Mirrors, Picosecond phenomena, Microchannel plates, Pulsed laser operation, Reflectivity, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 10 June 2004 Paper

Paper

Emission spectra of laser-produced plasmas for EUV and soft x-ray sources

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5482, (2004) https://doi.org/10.1117/12.558598

KEYWORDS: Plasmas, Picosecond phenomena, Pulsed laser operation, Aluminum, Extreme ultraviolet, Tin, Copper, X-ray sources, Spectrographs, Tungsten

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Proceedings Article | 20 May 2004 Paper

Paper

Ion damage analysis on EUV collector mirrors

Hiroshi Komori, Georg Soumagne, Hideo Hoshino, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Akira Endo, Koichi Toyoda

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534060

KEYWORDS: Ions, Xenon, Plasmas, Magnetism, Mirrors, Extreme ultraviolet, Reflectivity, Microchannel plates, Light sources, Surface roughness

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Proceedings Article | 20 May 2004 Paper

Paper

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda, Yasuhiro Horiike

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536076

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Deformable mirrors, Mirrors, Liquids, Nd:YAG lasers, Oscillators

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Proceedings Article | 7 January 2004 Paper

Paper

Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Akira Endo, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Nakano Masaki, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.503434

KEYWORDS: Xenon, Extreme ultraviolet, Plasma, Ions, Liquids, Absorption, Mirrors, Light sources, Data modeling, Pulsed laser operation

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Proceedings Article | 18 November 2003 Paper

Paper

EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5063, (2003) https://doi.org/10.1117/12.541149

KEYWORDS: Plasma, Picosecond phenomena, Aluminum, Tin, Copper, Pulsed laser operation, Extreme ultraviolet, Solids, Light sources, Laser energy

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Proceedings Article | 16 June 2003 Paper

Paper

Development of a liquid-jet laser-produced plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Yukihiko Sugimoto, Hiroshi Someya, Hideo Hoshino, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483598

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Extreme ultraviolet lithography, Plasma, Laser systems engineering, Oscillators, Liquids, Amplifiers, Temperature metrology

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Proceedings Article | 25 February 2002 Paper

Paper

Ultra-line-narrowed F2 laser for microlithography

Hiroshi Komori, Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4426, (2002) https://doi.org/10.1117/12.456815

KEYWORDS: Oscillators, Laser development, Pulsed laser operation, Optical amplifiers, Laser systems engineering, Laser applications, Optical lithography, Lithography, Amplifiers, Refractor telescopes

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Proceedings Article | 7 July 1997 Paper

Paper

Subpicometer ArF excimer laser for 193-nm lithography

Jun Akita, Hiroshi Komori, Noriaki Kouda, Shunsuke Yoshioka, Yasuo Itakura, Hakaru Mizoguchi

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276010

KEYWORDS: Excimer lasers, Lithography, Laser development, Argon ion lasers, Lenses, Laser stabilization, Optical lithography

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Proceedings Article | 7 June 1996 Paper

Paper

High-power KrF excimer laser with a solid state switch for microlithography

Hakaru Mizoguchi, Noritoshi Ito, Hiroaki Nakarai, Yukio Kobayashi, Yasuo Itakura, Hiroshi Komori, Osamu Wakabayashi, Taketo Aruga, Takashi Sakugawa, Takehisa Koganezawa

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240945

KEYWORDS: Excimer lasers, Solid state lasers, Pulsed power, Chlorine, Solid state physics, Switches, Pulsed laser operation, Optical lithography, Reliability, Switching

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Proceedings Article | 26 May 1995 Paper

Paper

Feasibility study of argon fluoride excimer laser for microlithography

Hiroshi Komori, Hidetomi Ochi, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209315

KEYWORDS: Excimer lasers, Laser systems engineering, Projection systems, Optical lithography, Lithography, Pulsed laser operation, Reflectivity, Light sources, Amplifiers, Oscillators

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Showing 5 of 26 publications

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