Dr. Hoang V. Tran Profile

Dr. Hoang V. Tran

R&D Chemist at Dupont CR&D

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 29 March 2013 Paper

High chi polymer development for DSA applications using RAFT technology

Michael Sheehan, William Farnham, Hoang Tran, J. David Londono, Yefim Brun

Proceedings Volume 8682, 868225 (2013) https://doi.org/10.1117/12.2018255

KEYWORDS: Polymers, Polymerization, Control systems, Statistical analysis, Molecular self-assembly, Liquids, Materials processing, Chemical analysis, Light scattering, Directed self assembly

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Proceedings Article | 16 April 2011 Paper

Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology

Michael Sheehan, William Farnham, Charles Chambers, Hoang Tran, Hiroshi Okazaki, Yefim Brun, Matthew Romberger, James Sounik

Proceedings Volume 7972, 79720T (2011) https://doi.org/10.1117/12.882960

KEYWORDS: Polymers, Polymerization, Photoresist materials, Optical lithography, Directed self assembly, Photomasks, Lithography, Photoresist developing, Line width roughness, Microelectronics

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SPIE Journal Paper | 1 July 2009

Fluid-photoresist interactions and imaging in high-index immersion lithography

Hoang Tran, Eric Hendrickx, Frieda Van Roey, Geert Vandenberghe, Roger French

JM3, Vol. 8, Issue 03, 033006, (July 2009) https://doi.org/10.1117/12.10.1117/1.3224950

KEYWORDS: Microfluidics, Water, Microfluidic imaging, Semiconducting wafers, Immersion lithography, Crystals, Liquids, Quartz, Printing, Lithography

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Proceedings Article | 12 March 2008 Paper

High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches

Roger French, Hoang Tran, Doug Adelman, Nyrissa Rogado, Mureo Kaku, Michael Mocella, Charles Chen, Eric Hendrickx, Freida Van Roey, Adam Bernfeld, Rebekah Derryberry

Proceedings Volume 6924, 692417 (2008) https://doi.org/10.1117/12.772105

KEYWORDS: Semiconducting wafers, Absorbance, Silicon, Water, Microfluidics, Lithography, Liquids, Contamination, Double patterning technology, Extreme ultraviolet

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Proceedings Article | 26 March 2007 Paper

High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches

R. French, V. Liberman, H. Tran, J. Feldman, D. Adelman, R. Wheland, W. Qiu, S. McLain, O. Nagao, M. Kaku, M. Mocella, M. Yang, M. Lemon, L. Brubaker, A. Shoe, B. Fones, B. Fischel, K. Krohn, D. Hardy, C. Chen

Proceedings Volume 6520, 65201O (2007) https://doi.org/10.1117/12.712234

KEYWORDS: Water, Absorbance, Microfluidics, Refractive index, Immersion lithography, Diffractive optical elements, Contamination, Scanners, Computational fluid dynamics, Absorption

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Proceedings Article | 15 March 2006 Paper

Second generation fluids for 193nm immersion lithography

Roger French, Weiming Qiu, Min Yang, Robert Wheland, Michael Lemon, Aaron Shoe, Doug Adelman, Michael Crawford, Hoang Tran, Jerald Feldman, Steve McLain, Sheng Peng

Proceedings Volume 6154, 615415 (2006) https://doi.org/10.1117/12.656626

KEYWORDS: Microfluidics, Refractive index, Immersion lithography, Microfluidic imaging, Water, Absorbance, Transparency, Lithography, 193nm lithography, Optical lithography

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Proceedings Article | 12 June 2003 Paper

Single-layer fluoropolymer resists for 157-nm lithography

Michael Crawford, William Farnham, Andrew Feiring, Jerald Feldman, Roger French, Kenneth Leffew, Viacheslav Petrov, Weiming Qiu, Frank Schadt, Hoang Tran, Robert Wheland, Fredrick Zumsteg

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485206

KEYWORDS: Absorbance, Polymers, Etching, Silicon, Resistance, Absorption, Fluorine, Lithography, Infrared radiation, Photoresist materials

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Proceedings Article | 24 July 2002 Paper

Acid mobility in chemically amplified photoresists

Michael Stewart, Darren Becker, Timothy Stachowiak, Gerard Schmid, Timothy Michaelson, Hoang Tran, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474168

KEYWORDS: Diffusion, Polymers, Glasses, Photoresist materials, Molecules, Adaptive optics, Temperature metrology, Systems modeling, Chemical reactions, Chemical analysis

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In a chemically amplified resist the exposure energy is used to generate a catalytic species, which promotes a solubility-switching reaction during a post exposure processing step. Using an absorbed photon to generate a catalyst, instead of using it to directly cause a solubility-switching photochemical reaction, allows for much lower exposure doses to be used for patterning since the catalytic species can eventually promote multiple solubility-switching events instead of just one. Some level of catalyst mobility is necessary to achieve the amplification effect as the catalyst must move from reaction site to reaction site, but any catalyst mobility creates the possibility of movement from exposed regions into unexposed regions causing image blur or line width spreading. As the catalyst diffuses in the resist, it promotes chemical reactions; these chemical reactions complicate analyses of catalyst diffusion by changing the chemical environment of the diffusant. Thus, the material properties of the surrounding resin are changing, sometimes drastically, as the catalyst diffuses. In addition to simple changes in material type, the chemical reaction also generates a transient material state as reaction by-products either remain in the resist film or desorb. The variation in lifetime of this transient state is another factor that must be considered in a full analysis. This work reports a method to separate reaction effects from catalyst diffusion effects. Acid diffusion in polymers which are close structural analogues to poly(4-t-butyloxycarbonyloxystrene) (TBOCST), while being unreactive to diffusing acidic molecules, was studied. Specifically, the diffusion properties of photogenerated perfluorobutanesulfonic acid in the unreactive TBOCST analogues poly(4-isopropyloxycarbonyloxystyrene) and poly(4-neopentyloxycarbonyloxysytrene) are reported. Measuring and understanding diffusion in these analogue polymers provides insight into the more complicated, and more important, reaction-diffusion processes of TBOCST.

Proceedings Article | 24 July 2002 Paper

Dissolution inhibitors for 157-nm microlithography

Will Conley, Daniel Miller, Charles Chambers, Brian Osborn, Raymond Hung, Hoang Tran, Brian Trinque, Matthew Pinnow, Takashi Chiba, Scott McDonald, Paul Zimmerman, Ralph Dammel, Andrew Romano, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474282

KEYWORDS: Polymers, Absorbance, Photoresist materials, Imaging systems, Lithography, Semiconducting wafers, Transparency, Optical lithography, Vacuum ultraviolet, Phase measurement

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Proceedings Article | 24 July 2002 Paper

Advances in resists for 157-nm microlithography

Brian Trinque, Brian Osborn, Charles Chambers, Yu-Tsai Hsieh, Schuyler Corry, Takashi Chiba, Raymond Hung, Hoang Tran, Paul Zimmerman, Daniel Miller, Will Conley, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474272

KEYWORDS: Polymers, Absorbance, Transparency, Fluorine, Vacuum ultraviolet, Spectroscopy, Phase shifts, Optical lithography, Carbon monoxide, Silica

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Proceedings Article | 24 August 2001 Paper

Resist materials for 157-nm microlithography: an update

Raymond Hung, Hoang Tran, Brian Trinque, Takashi Chiba, Shintaro Yamada, Daniel Sanders, Eric Connor, Robert Grubbs, John Klopp, Jean Frechet, Brian Thomas, Gregory Shafer, Darryl DesMarteau, Will Conley, C. Grant Willson

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436870

KEYWORDS: Polymers, Absorbance, Fluorine, Carbon monoxide, Polymerization, Palladium, Transparency, Nickel, Lithography, Vacuum ultraviolet

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Proceedings Article | 24 August 2001 Paper

Top surface imaging at 157-nm

Andrew Jamieson, Mark Somervell, Hoang Tran, Raymond Hung, Scott MacDonald, C. Grant Willson

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436872

KEYWORDS: Polymers, Etching, Absorbance, Line edge roughness, Opacity, Polymerization, Binary data, Silicon, Photomasks, Transparency

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Proceedings Article | 23 June 2000 Paper

Study of acid transport using IR spectroscopy and SEM

Michael Stewart, Mark Somervell, Hoang Tran, Sergei Postnikov, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388353

KEYWORDS: Diffusion, Scanning electron microscopy, Sensors, Polymers, Infrared spectroscopy, Glasses, Photoresist materials, Information operations, Temperature metrology, Silicon

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Showing 5 of 13 publications

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