Dr. Hoon Kim Profile

Dr. Hoon Kim

at National Univ of Singapore

SPIE Involvement:

Author

Proceedings Article | 5 March 2013 Paper

Multi-domain vertical alignment of nematic liquid crystals for reduced off-axis gamma shift

Tae-Hoon Yoon, Byung Wok Park, Ki-Han Kim, Hoon Kim, Ki-Chul Shin, Hee Seop Kim

Proceedings Volume 8642, 86420D (2013) https://doi.org/10.1117/12.2003295

KEYWORDS: Polymers, Liquid crystals, Ultraviolet radiation, Transmittance, Molecules, LCDs, Electrodes, Distortion, Switching, Electro optics

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Cha-Won Koh, In-Yong Kang, Tae Geun Kim, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Hakseung Han, Sungmin Huh, In-Yong Kang, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 7271, 72710D (2009) https://doi.org/10.1117/12.813932

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Silicon, Semiconducting wafers, Ruthenium, Extreme ultraviolet, Reflectivity, Phase shifts, Refractive index

Read Abstract +

Proceedings Article | 27 March 2008 Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Sungmin Huh, Hoon Kim, Gisung Yoon, Jaehyuck Choi, Han-Shin Lee, Dong Gun Lee, Byungsup Ahn, Hwan-Seok Seo, Dongwan Kim, Seoung Sue Kim, Han Ku Cho, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412

KEYWORDS: Photomasks, Carbon, Contamination, Ruthenium, Extreme ultraviolet lithography, Silicon, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Semiconducting wafers

Read Abstract +

Proceedings Article | 3 October 2006 Paper

Simulation approach to the improvement of dispersion tolerance for electrical-binary-signal-based duobinary transmitters

Byungjik Kim, Jaehoon Lee, Hanlim Lee, Hoon Kim, Sung Kee Kim, Yonggyoo Kim, Seongtaek Hwang, Yunje Oh, Jichai Jeong

Proceedings Volume 6353, 635346 (2006) https://doi.org/10.1117/12.691607

KEYWORDS: Transmitters, Tolerancing, Modulators, Receivers, Eye, Dispersion, Signal generators, Binary data, Optical filters, Optical amplifiers

Read Abstract +

Proceedings Article | 21 September 2006 Paper

Cost-effective optical duobinary transmitters

Hoon Kim, Hanlim Lee, Sung Kee Kim, Gyuwoong Lee, Seongtaek Hwang, Yunje Oh

Proceedings Volume 6353, 63530C (2006) https://doi.org/10.1117/12.688018

KEYWORDS: Modulators, Transmitters, Receivers, Optical filters, Eye, Transponders, Tolerancing, Computer programming, Modulation, Pulse shaping

Read Abstract +

Proceedings Article | 9 December 2005 Paper

Differential phase-shift-keyed transmission

Hoon Kim

Proceedings Volume 6021, 60212O (2005) https://doi.org/10.1117/12.636508

KEYWORDS: Receivers, Transmitters, Complex systems, Phase shift keying, Modulation, Modulators, Nonlinear optics, Signal detection, Tolerancing, Sensors

Read Abstract +

Showing 5 of 7 publications

Conference Committee Involvement (2)

Optical Transmission, Switching, and Subsystems

2 November 2007 | Wuhan, China

Optical Transmission, Switching, and Subsystems III

7 November 2005 | Shanghai, China

Keywords/Phrases

Search In:

Publication Years