Mr. Hyunsuk Bang Profile

Hyunsuk Bang

at Tekscend Photomask Korea Inc

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 8 November 2005 Paper

Characteristics of RIE lag and pattern density effect in alternating aperture phase-shift masks

Byung-Soo Chang, Yoon-Young Chang, Hyun-Suk Bang, In-Soo Lee, Lee-Ju Kim, Chang-Nam Ahn, Hong-Suk Kim

Proceedings Volume 5992, 59923Q (2005) https://doi.org/10.1117/12.632022

KEYWORDS: Etching, Reactive ion etching, Quartz, Critical dimension metrology, Ions, Photomasks, Diffractive optical elements, Plasma, Atomic force microscopy, Phase shifts

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Proceedings Article | 5 September 2001 Paper

Effect of clear field ratio on critical dimension in the dry etching process

Chul-Joong Lee, Hyun-Suk Bang, J. Choi, H. Jung, Cheol Shin, Hong-Seok Kim

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438357

KEYWORDS: Critical dimension metrology, Dry etching, Etching, Photomasks, Lithography, Standards development, Wet etching, Target detection, Mask making, Semiconducting wafers

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Proceedings Article | 22 January 2001 Paper

Double-step process for manufacturing reticle to reduce gate CD variation

Makoto Kozuma, Masaya Komatsu, Rieko Arakawa, Seiji Kubo, Tatsuya Takahashi, John Jensen, Hyun-Suk Bang, Il-Ho Lee, Cheol Shin, Hong-Seok Kim, Keun-Won Park

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410759

KEYWORDS: Reticles, Critical dimension metrology, Logic, Image processing, Overlay metrology, Computer aided design, Manufacturing, Dry etching, Transistors, Etching

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