Inna Tarshish-Shapir
Advanced Application Development Engineer
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 113251X (2020) https://doi.org/10.1117/12.2551797
KEYWORDS: Scanning electron microscopy, Overlay metrology, Metrology, Calibration, Optical calibration

Proceedings Article | 24 March 2016 Paper
Inna Tarshish-Shapir, Eitan Hajaj, Greg Gray, Jeffery Hodges, Jianming Zhou, Sarah Wu, Sam Moore, Guy Ben-Dov, Chen Dror, Ze'ev Lindenfeld, David Gready, Mark Ghinovker, Mike Adel
Proceedings Volume 9778, 97782J (2016) https://doi.org/10.1117/12.2219181
KEYWORDS: Metrology, Overlay metrology, Electromagnetic simulation, Reflectivity, Diffraction, Semiconducting wafers, Inspection, Scatterometry, Polarization, Device simulation, Interference (communication), Optical design, Light sources

Proceedings Article | 8 March 2016 Paper
Guy Ben-Dov, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Mike Adel, Eitan Herzel, Soonho Oh, DongSub Choi, Sang Hyun Han, Mohamed El Kodadi, Chan Hwang, Jeongjin Lee, Seung Yoon Lee, Kuntack Lee
Proceedings Volume 9778, 97783B (2016) https://doi.org/10.1117/12.2219108
KEYWORDS: Overlay metrology, Metrology, Critical dimension metrology, Scatterometry, Optical testing, Image processing, Scatter measurement, Optical metrology, Diffraction gratings, Diffraction, Semiconducting wafers, Wafer testing, Device simulation

Proceedings Article | 10 April 2015 Paper
Proceedings Volume 9424, 94240D (2015) https://doi.org/10.1117/12.2086084
KEYWORDS: Metrology, Scanning electron microscopy, Diffraction gratings, Overlay metrology, Uncertainty analysis, Performance modeling, Diffraction, Scatterometry, Critical dimension metrology, Image processing

SPIE Journal Paper | 6 October 2014 Open Access
DongSub Choi, Tal Itzkovich, Inna Tarshish-Shapir, Eros Huang, Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, David Tien, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su
JM3, Vol. 13, Issue 04, 041404, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041404
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

Showing 5 of 8 publications
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