Mr. Isaac Lee Profile

Isaac Lee

Key Account Manager at MKS Instruments Inc

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Author

Publications (5)

Proceedings Article | 28 June 2013 Paper

EUV reticle inspection with a 193nm reticle inspector

William Broadbent, Gregg Inderhees, Tetsuya Yamamoto, Isaac Lee, Phillip Lim

Proceedings Volume 8701, 87010W (2013) https://doi.org/10.1117/12.2032553

KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Defect detection, EUV optics, Databases, Data modeling, Semiconducting wafers, Extreme ultraviolet lithography, Particles

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Proceedings Article | 20 March 2010 Paper

Assessing EUV mask defectivity

Uzodinma Okoroanyanwu, Anna Tchikoulaeva, Paul Ackmann, Obert Wood, Bruno La Fontaine, Karsten Bubke, Christian Holfeld, Jan Hendrik Peters, Sumanth Kini, Sterling Watson, Isaac Lee, Bo Mu, Phillip Lim, Sudhar Raghunathan, Carol Boye

Proceedings Volume 7636, 76360J (2010) https://doi.org/10.1117/12.847348

KEYWORDS: Reticles, Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet, Defect detection, Line edge roughness, Scanning electron microscopy, Defect inspection, Optical lithography

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Proceedings Article | 17 October 2008 Paper

SL2+: H5 use case

Kosuke Ito, Steven Liu, Isaac Lee, Russell Dover, Paul Yu

Proceedings Volume 7122, 71223N (2008) https://doi.org/10.1117/12.802333

KEYWORDS: Inspection, Photomasks, Reticles, Sensors, Contamination, Semiconducting wafers, SRAF, Stars, Algorithm development, Defect detection

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Proceedings Article | 19 May 2008 Paper

Thin-line de-sense capability for database mode inspections with KLA-Tencor TeraScanHR

Arosha Goonesekera, Isaac Lee, Bo Mu, Aditya Dayal

Proceedings Volume 7028, 70282J (2008) https://doi.org/10.1117/12.793089

KEYWORDS: SRAF, Inspection, Databases, Reticles, Photomasks, Optical proximity correction, Sensors, Resolution enhancement technologies, Photoresist materials, Lithography

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Proceedings Article | 19 May 2008 Paper

Results of new CD detection capability on advanced reticles

Arosha Goonesekera, Heiko Schmalfuss, Isaac Lee, Chun Guan, Aditya Dayal, Thomas Schulmeyer, Jan Heumann

Proceedings Volume 7028, 70282L (2008) https://doi.org/10.1117/12.793091

KEYWORDS: Inspection, Reticles, Critical dimension metrology, Sensors, Defect detection, Photomasks, Detection and tracking algorithms, Opacity, Resolution enhancement technologies, Image processing

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