Dr. Jiangliu Shi Profile

Dr. Jiangliu Shi

at Beijing Superstring Academy of Memory Technology

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 10 December 2024 Paper

A study of aerial image NILS and exposure energy as improvement factors for LER

Di Liang, Hao Yang, Yufei Sha, Yuxing Zhou, Jiahao Xi, Enqiang Tian, Cuixiang Wang, Ganlin Song, Xiaohong Zhao, Jiangliu Shi, Miao Jiang

Proceedings Volume 13423, 134230M (2024) https://doi.org/10.1117/12.3052903

KEYWORDS: Line edge roughness, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Lithography

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Proceedings Article | 10 December 2024 Paper

Multilayer reticle heating impact on product overlay

Yuxing Zhou, Guangying Zhou, Mingyi Yao, Di Liang, Jiahao Xi, Ganlin Song, Xiuyan Cheng, Miao Jiang, Jiangliu Shi

Proceedings Volume 13423, 134230K (2024) https://doi.org/10.1117/12.3052900

KEYWORDS: Reticles, Semiconducting wafers, Overlay metrology, Lithography, Scanners

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Proceedings Article | 10 December 2024 Paper

The implementation of overlay compensation between multiple photo layers generated by a single mask

Hao Yang, Di Liang, Yuxing Zhou, Jiahao Xi, Enqiang Tian, Ganlin Song, Mingyi Yao, Jiangliu Shi, Miao Jiang

Proceedings Volume 13423, 134230N (2024) https://doi.org/10.1117/12.3052904

KEYWORDS: Overlay metrology, Semiconducting wafers, Photomasks, Modeling, Failure analysis

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Proceedings Article | 20 November 2024 Poster + Paper

Optimization of lithography performance at different Manhattan levels of ILT and electron beam shot size

Cuixiang Wang, Yu Mu, Futian Wang, Juan Wei, Ruihua Liu, Enqiang Tian, Di Liang, Yufei Sha, Yaokun Li, Hao Yang, Song Sun, Miao Jiang, Qingchen Cao, Jiangliu Shi

Proceedings Volume 13216, 1321625 (2024) https://doi.org/10.1117/12.3034463

KEYWORDS: Optical proximity correction, Semiconducting wafers, Lithography, Source mask optimization, Semiconductor manufacturing, Printing, Finite element methods, Electron beams, Electron beam lithography, Yield improvement

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Proceedings Article | 12 November 2024 Poster + Paper

Contour-based mask quantization methodology for curvilinear ILT mask and on wafer performance analysis

Futian Wang, Xiaonan Liu, Juan Wei, Miao Jiang, Cuixiang Wang, Yu Mu, Enqiang Tian, Yaokun Li, Song Sun, Ruihua Liu, Jiahao Xi, Yufei Sha, Di Liang, Hao Yang, Qingchen Cao, Jiangliu Shi

Proceedings Volume 13216, 132161Z (2024) https://doi.org/10.1117/12.3034016

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Manufacturing, SRAF, Critical dimension metrology, Contour extraction, Optical proximity correction, Error analysis, Quantization, Lithography

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Proceedings Article | 12 November 2024 Poster + Paper

Accurate ILT model calibration using curvilinear mask and all-angle gauges

Juan Wei, Peng Xu, Guangyu Sun, Jingkang Qin, Jinlai Liu, Cuixiang Wang, Futian Wang, Jiangliu Shi, Qingchen Cao

Proceedings Volume 13216, 1321620 (2024) https://doi.org/10.1117/12.3034460

KEYWORDS: Contour modeling, Performance modeling, Calibration, 3D mask effects, Lithography, Optical proximity correction, Modeling

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Proceedings Article | 10 April 2024 Poster + Paper

Photoresist process simulation to study line edge roughness

Yufei Sha, Shuxin Yao, Miao Jiang, Hao Yang, Di Liang, Cuixiang Wang, Futian Wang, Enqiang Tian, Jiahao Xi, Yulong Jiang, Jiangliu Shi

Proceedings Volume 12953, 1295317 (2024) https://doi.org/10.1117/12.3010734

KEYWORDS: Photoresist materials, Line edge roughness, Quenching, Photoresist developing, Diffusion, Polymers, Acid diffusion length, Photoacid generators, Lithography, Line width roughness

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Proceedings Article | 10 April 2024 Poster + Paper

Balancing mask manufacturability and image quality with inverse lithography: a study on variable fracture sizes

Fu Li, Yu Mu, Jingjing Fan, Chunlong Yu, Ruihua Liu, Song Sun, Chong Wang, Jiangliu Shi, Qingchen Cao

Proceedings Volume 12953, 1295310 (2024) https://doi.org/10.1117/12.3010071

KEYWORDS: Optical proximity correction, Manufacturing, Lithography, Image quality, Vestigial sideband modulation, Scanning electron microscopy, Critical dimension metrology, Image processing, Shape analysis, Compliance

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Proceedings Article | 10 April 2024 Poster + Paper

Test pattern generation by conditional generative model labeled by image parameters

Tianshuai Qi, Peng Xu, Jingwei Xu, Song Sun, Juan Wei, Guangyu Sun, Zhao Liu, Qingchen Cao, Jiangliu Shi, Zhenjie Yao, Xijin Zhao, Chun Zhang

Proceedings Volume 12954, 129541C (2024) https://doi.org/10.1117/12.3010111

KEYWORDS: Optical proximity correction

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Proceedings Article | 21 November 2023 Poster + Paper

Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology

Futian Wang, Song Sun, Chunlong Yu, Yu Mu, Juan Wei, Xiaonan Liu, Cuixiang Wang, Liang Li, Qingchen Cao, Miao Jiang, Peng Xu, Joshua Jeong, Yilei Zeng, Andy Lan, Jiangliu Shi

Proceedings Volume 12751, 1275117 (2023) https://doi.org/10.1117/12.2686740

KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Resolution enhancement technologies, Logic, Electron beam lithography, Vestigial sideband modulation, Photomask technology, Manufacturing

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Proceedings Article | 21 November 2023 Poster + Paper

Optimized test pattern selection with machine learning method

Peng Xu, Juan Wei, Jingkang Qin, Jinlai Liu, Guangyu Sun, Song Sun, Cuixiang Wang, Qingchen Cao, Jiangliu Shi

Proceedings Volume 12751, 1275113 (2023) https://doi.org/10.1117/12.2685435

KEYWORDS: Data modeling, Matrices, Optical proximity correction, Machine learning, Lithography, Advanced patterning, Active learning, Process modeling, Deconvolution

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Proceedings Article | 21 November 2023 Poster + Paper

Rounded-corner aware OPC for convergency and lithography performance improving

Ruihua Liu, Fu Li, Chunlong Yu, Jingjing Fan, Yu Mu, Song Sun, Chong Wang, Jiangliu Shi, Qingchen Cao

Proceedings Volume 12751, 1275115 (2023) https://doi.org/10.1117/12.2686228

KEYWORDS: Optical proximity correction, Lithography, Photoresist processing, Reliability, Photoresist materials, Mask making, Manufacturing, Integrated circuits, Electron beams, Chip manufacturing

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Proceedings Article | 21 November 2023 Poster + Paper

SEM image contour extraction with deep learning method

Junhao Gu, Yingying Shang, Peng Xu, Juan Wei, Song Sun, Qingchen Cao, Jiangliu Shi, Xijin Zhao, Chun Zhang

Proceedings Volume 12751, 1275114 (2023) https://doi.org/10.1117/12.2686135

KEYWORDS: Scanning electron microscopy, Contour extraction, Image segmentation, Lithography, Deep learning

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Proceedings Article | 28 April 2023 Poster + Paper

Hybrid deep learning OPC framework with generative adversarial network

Qingchen Cao, Peng Xu, Juan Wei, Ruihua Liu, Fu Li, Jingjing Fan, Chunlong Yu, Zhifeng Li, Jiangliu Shi, Yayi Wei

Proceedings Volume 12495, 124951R (2023) https://doi.org/10.1117/12.2658271

KEYWORDS: Optical proximity correction, Photomasks, Design and modelling, Lithography, Deep learning, Adversarial training, Machine learning

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Proceedings Article | 28 April 2023 Poster + Paper

Frequency doubling and phase error tolerance exploration for chrome-less phase shift mask

Liang Li, Miao Jiang, Di Liang, Binbin Yan, Mingqi Gao, Dajun Wu, Andy Lan, Jiangliu Shi

Proceedings Volume 12494, 1249413 (2023) https://doi.org/10.1117/12.2657844

KEYWORDS: Tolerancing, Semiconducting wafers, Simulations, Reticles, Phase shifts, Etching, Resolution enhancement technologies, Quartz

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Proceedings Article | 27 April 2023 Poster + Paper

Frame generation methodology in mask tape-out flow and automation application

Binbin Yan, Miao Jiang, Futian Wang, Di Liang, Liang Li, Wei Feng, Joer Huang, Dajun Wu, Andy Lan, Jiangliu Shi

Proceedings Volume 12496, 124962K (2023) https://doi.org/10.1117/12.2657841

KEYWORDS: Optical alignment, Overlay metrology, Automation, Metrology

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SPIE Journal Paper | 19 January 2023

Curvilinear mask optimization with refined generative adversarial nets

Qingchen Cao, Peng Xu, Song Sun, Jianfang He, Juan Wei, Jiangliu Shi, Yayi Wei

JM3, Vol. 22, Issue 01, 013201, (January 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.1.013201

KEYWORDS: Gallium nitride, Optical proximity correction, Design and modelling, Lithography, Education and training, Source mask optimization, Model-based design, Computer simulations, Contour modeling, Adversarial training

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Showing 5 of 17 publications

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