Dr. Jae-Heon Kim Profile

Dr. Jae-Heon Kim

at Hynix Semiconductor Inc

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Author

Publications (5)

Proceedings Article | 23 March 2012 Paper

Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning

Keundo Ban, Junggun Heo, Hyunkyung Shim, Minkyung Park, Kilyoung Lee, Sunyoung Koo, Jaeheon Kim, Cheolkyu Bok, Myoungsoo Kim, Hyosang Kang

Proceedings Volume 8322, 83221A (2012) https://doi.org/10.1117/12.916119

KEYWORDS: Double patterning technology, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Line width roughness, Photomasks, Optical lithography, Etching, Metrology, Edge roughness

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Proceedings Article | 16 April 2011 Paper

Patterning process study for 30nm hole

Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Byounghoon Lee, Jongsik Bang, Hyunkyung Shim, Sungjin Kim, James Moon, Donggyu Yim, Sung-Ki Park

Proceedings Volume 7972, 79720P (2011) https://doi.org/10.1117/12.880906

KEYWORDS: Optical lithography, Photomasks, Critical dimension metrology, Nanoimprint lithography, Chromium, Etching, Double patterning technology, Scanners, Image processing, Photoresist developing

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Proceedings Article | 29 March 2011 Paper

Comprehensive EUV lithography model

Mark Smith, Trey Graves, John Biafore, Stewart Robertson, Cheolkyun Kim, James Moon, Jaeheon Kim, Cheolkyu Bok, Donggyu Yim

Proceedings Volume 7969, 796906 (2011) https://doi.org/10.1117/12.879766

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Data modeling, Photomasks, Calibration, Extreme ultraviolet, Point spread functions, Lithography, Photoresist materials, Stochastic processes

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Proceedings Article | 31 March 2010 Paper

Mesh patterning process for 40nm contact hole

Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Hyunkyung Shim, Junggun Heo, Junghyung Lee, Hyeong-Soo Kim, Donggu Yim, Sung-Ki Park

Proceedings Volume 7639, 76391S (2010) https://doi.org/10.1117/12.846388

KEYWORDS: Optical lithography, Double patterning technology, Image processing, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Coating

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Proceedings Article | 4 December 2008 Paper

Alternative technology for double patterning process simplification

Hee-Youl Lim, Kyo-Young Jang, Jae-Heon Kim, Sung-Gu Lee, Sarohan Park, Tae-Hwan Kim, Cheol-Kyu Bok, Seung-Chan Moon

Proceedings Volume 7140, 714020 (2008) https://doi.org/10.1117/12.804657

KEYWORDS: Double patterning technology, Lithography, Photomasks, Etching, Photoresist materials, Optical lithography, Image processing, Coating, Scanning electron microscopy, Extreme ultraviolet

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