Data are presented for AlGaN-AlN multiple-quantum-well optically pumped lasers operating at 300K. The structures were grown by MOCVD on bulk AlN substrates and were fabricated into cleaved bars with a cavity length ~1mm. The epitaxial structures consist of ten 3 nm AlGaN quantum wells with 5 nm AlGaN barriers and an AlN buffer layer deposited on a (0001) AlN substrate at a growth temperature 1155 ºC. The bars were photopumped under pulsed conditions at 300K with a 193nm excimer laser. The threshold optical pump power is 455 kW/cm2 and laser emission is observed at 247 nm.
High resolution imaging in the UV band has a lot of applications in defense and commercial systems. The
shortest wavelength is desired for spatial resolution which allows for small pixels and large formats.
UVAPD's have been demonstrated as discrete devices demonstrating gain. The next frontier is to develop UV
APD arrays with high gain to demonstrate high resolution imaging.
We will discuss model that can predict sensor performance in the UV band using APD's with various gain
and other parameters for a desired UV band of interest. SNR's can be modeled from illuminated targets at
various distances with high resolution under standard atmospheres in the UV band and the solar-blind region
using detector arrays with unity gain and with high-gain APD's.
We will present recent data on the GaN based APD's for their gain, detector response, dark current noise and
the 1/f noise. We will discuss various approaches and device designs that are being evaluated for developing
APD's in wide band gap semiconductors. The paper will also discuss state-of-the-art in UV APDs and the
future directions for small unit cell size and gain in the APD's.
High resolution imaging in the UV band has a lot of applications in Defense and Commercial
Applications. The shortest wavelength is desired for spatial resolution which allows for small pixels and
large formats. UVAPD's have been demonstrated as discrete devices demonstrating gain. The next frontier is
to develop UV APD arrays with high gain to demonstrate high resolution imaging. We also disuses our recent
efforts on development of APD's using MOCVD of GaN/ AlGaN.
We present an analytical model that can predict sensor performance in the UV band using p-i-n or
APD detectors with and without gain and other detector and sensor parameters for a desired UV band of
interest. SNR's can be modeled from illuminated targets at various distances with high resolution under
standard MODTRAN atmospheres in the UV band using detector arrays with unity gain and with high gain
APD along with continuous or pulsed UV lasers.
Blue laser diode (LD) structures with GaN waveguide layers and with In0.03Ga0.97N waveguide layers were grown. A
comparison study showed In0.03Ga0.97N waveguide layers significantly enhance the LD performance. The mechanism
behind this was investigated using reciprocal space mapping of X-ray diffraction and time-resolved
cathodoluminescence measurements. Room-temperature lasing of laser diodes at 454.6 nm was realized for LD structure
with In0.03Ga0.97N waveguide layers.
High-efficiency "true" green light-emitting diodes (LEDs) (λ~550nm) are one of the key elements in realizing high-brightness
RGB-based white-lighting systems. Because the InGaN multiple quantum wells (MQWs) in the active
regions of green LEDs contain a high indium alloy composition and a corresponding large lattice mismatch, the QW has
a reduced material quality and contains large piezoelectric fields induced by the large strain. The piezoelectric field
reduces the overlap of the electron-hole wave functions, and so results in reduced internal quantum efficiency in green
LEDs. In addition, other effects can strongly impact InGaN materials with high indium content, e.g., detrimental
annealing of the MQW active region during the subsequent growth of the p-type hole injection and contact layers. In
this study, the optical and structural characteristics of green LEDs employing p-InGaN and p-InGaN/p-GaN superlattices
(SLs) were examined. For the LEDs with a p-In0.04Ga0.96N:Mg layer grown at 840°C, only a slight decrease in PL
intensity was observed compared to similar structures grown without a p-layer. However, pits are observed for p-
In0.04Ga0.96N:Mg layers, which may cause increased reverse current leakage. In order to decrease the reverse leakage
current, p-InxGa1-xN/p-GaN SLs were developed. The hole concentration of the p-InxGa1-xN/p-GaN SLs is close to that
of p-In0.04Ga0.96N, and is much higher than that of p-GaN grown at an acceptably low temperature. In addition, pits
disappear in optimized p-InxGa1-xN/p-GaN SLs. In order to study the structural and optical characteristics of green LEDs
with p-In0.04Ga0.96N and p-InxGa1-xN/p-GaN SL layers, I-V characterization and electroluminescence measurements were
performed and the results will be described in detail.
Wide-bandgap GaN-based avalanche photodetectors (APDs) are important for photodetectors operating in UV spectral
region. For the growth of GaN-based heteroepitaxial layers on lattice-mismatched substrates such as sapphire and SiC, a
high density of defects is introduced, thereby causing device failure by premature microplasma breakdown before the
electric field reaches the level of the bulk avalanche breakdown field, which has hampered the development of III-nitride
based APDs. In this study, we investigate the growth and characterization of GaN and AlGaN-based APDs on bulk GaN
and AlN substrates. Epitaxial layers of GaN and AlxGa1-xN p-i-n ultraviolet avalanche photodiodes were grown by
metalorganic chemical vapor deposition (MOCVD). Improved crystalline and structural quality of epitaxial layers was
achieved by employing optimum growth parameters on low-dislocation-density bulk substrates in order to minimize the
defect density in epitaxially grown materials. GaN and AlGaN APDs were fabricated into 30μm- and 50μm-diameter
circular mesas and the electrical and optoelectronic characteristics were measured. APD epitaxial structure and device
design, material growth optimization, material characterizations, device fabrication, and device performance
characteristics are reported.
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