Mr. Jan H. C. Sedlacek Profile

Jan H. C. Sedlacek

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 12 May 2005 Paper

Long-term 193-nm laser irradiation of thin-film-coated CaF2 in the presence of H2O

V. Liberman, M. Switkes, M. Rothschild, S. Palmacci, J. Sedlacek, D. Hardy, A. Grenville

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601468

KEYWORDS: Thin film coatings, Laser irradiation, Thin films, Optical coatings, Birefringence, Metrology, Ellipsometry, Lithography, Ultraviolet radiation, Spectroscopic ellipsometry

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SPIE Journal Paper | 1 January 2005

Nanocomposite approaches toward pellicles for 157-nm lithography

Vladimir Liberman, Jan Sedlacek, Theodore Fedynyshyn, Russell Goodman, Mordechai Rothschild, Roger Sinta

JM3, Vol. 4, Issue 01, 013004, (January 2005) https://doi.org/10.1117/12.10.1117/1.1858131

KEYWORDS: Nanoparticles, Polymers, Pellicles, Absorbance, Polymer thin films, Nanocomposites, Particles, Transparency, Lithography, Silica

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Proceedings Article | 28 May 2004 Paper

Photo-induced changes in 157-nm optical coatings

Vladimir Liberman, Theodore Bloomstein, Mordechai Rothschild, Stephen Palmacci, Jan Sedlacek, Andrew Grenville

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534190

KEYWORDS: Thin films, Surface roughness, Thin film coatings, Atomic force microscopy, Optical coatings, Spectroscopic ellipsometry, Data modeling, Ellipsometry, Fluorine, X-rays

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Proceedings Article | 26 June 2003 Paper

Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists

Theodore Bloomstein, Jan Sedlacek, Stephen Palmacci, Dennis Hardy, Vladimir Liberman, Mordechai Rothschild

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485468

KEYWORDS: Oxygen, Contamination, Sulfur, Iodine, Photoresist materials, Antireflective coatings, Pulsed laser operation, Absorbance, Diffusion, Liquids

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Proceedings Article | 26 June 2003 Paper

Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation

Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, Nikolay Efremow, Jan Sedlacek, Andrew Grenville

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485470

KEYWORDS: Pulsed laser operation, Lithography, Laser irradiation, Beam delivery, Glasses, Laser induced damage, Calcium, Coating, Antireflective coatings, Laser optics

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Proceedings Article | 26 June 2003 Paper

Ambient effects on the laser durability of 157-nm optical coatings

Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, Nikolay Efremow, Jan Sedlacek, Andrew Grenville

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.497525

KEYWORDS: Oxygen, Thin film coatings, Optical coatings, Laser irradiation, Antireflective coatings, Thin films, Sensors, Contamination, Absorption, Fluorine

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SPIE Journal Paper | 1 January 2003

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Nikolay Efremow, Stephen Palmacci, Jan Sedlacek, Andrew Grenville, Kevin Orvek

JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1528948

KEYWORDS: Pellicles, Absorption, Sensors, Lithography, Contamination, Laser irradiation, Oxygen, Antireflective coatings, Lamps, Thin film coatings

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Proceedings Article | 30 July 2002 Paper

Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Andrew Grenville, Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Roger French, Robert Wheland, Xun Zhang, Joe Gordan

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474604

KEYWORDS: Pellicles, Oxygen, Lamps, Polymers, Reticles, Semiconducting wafers, Absorption, Laser irradiation, Absorbance, Polymer thin films

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Proceedings Article | 30 July 2002 Paper

Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities

Theodore Bloomstein, Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, D. Hardy, Jan Sedlacek

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474620

KEYWORDS: Contamination, Oxygen, Bioalcohols, Coating, Antireflective coatings, Absorption, Pulsed laser operation, Thin films, Fluorine, Silica

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Proceedings Article | 30 July 2002 Paper

Long-term laser durability testing of optical coatings and thin films for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Stephen Palmacci, N. Efremow, Jan Sedlacek, A. Grenville

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474552

KEYWORDS: Contamination, Thin films, Thin film coatings, Optical coatings, Antireflective coatings, Optical testing, Lithography, Lamps, Optical components, Spectroscopy

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Proceedings Article | 14 September 2001 Paper

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, N. Efremow, Stephen Palmacci, Jan Sedlacek, Chris Van Peski, Kevin Orvek

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435759

KEYWORDS: Pellicles, Absorption, Lamps, Lithography, Laser irradiation, Optical coatings, Thin film coatings, Spectroscopy, Oxygen, Chlorine

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Proceedings Article | 5 July 2000 Paper

Long-term testing of optical components for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Kevin Orvek

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389037

KEYWORDS: Sensors, Lithography, Absorption, Reflectors, Optical components, Calcium, Dielectrics, Silica, Reflectivity, Optical testing

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Proceedings Article | 26 July 1999 Paper

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Chris Van Peski

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354323

KEYWORDS: Absorption, Silica, Calcium, Lithography, Birefringence, Laser applications, Optical components, Beam splitters, Pulsed laser operation, Ozone

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Proceedings Article | 7 April 1999 Paper

Marathon testing of optical materials for 193-nm lithographic applications

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Allen Bates, Chris Van Peski

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344432

KEYWORDS: Absorption, Silica, Optical coatings, Reflectivity, Lithography, Calcium, Surface roughness, Transmittance, Surface finishing, Pulsed laser operation

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Proceedings Article | 27 October 1998 Paper

Testing of optical materials for 193-nm applications

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3427, (1998) https://doi.org/10.1117/12.328512

KEYWORDS: Absorption, Silica, Lithography, Optical coatings, Calcium, Antireflective coatings, Birefringence, Pulsed laser operation, Reflectivity, Beam splitters

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Proceedings Article | 29 June 1998 Paper

Assessment of optical coatings for 193-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310775

KEYWORDS: Absorption, Optical coatings, Excimer lasers, Interferometry, Reflectivity, Antireflective coatings, Lithography, Calorimetry, Dielectrics, Nitrogen

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Proceedings Article | 29 June 1998 Paper

Damage testing of pellicles for 193-nm lithography

Vladimir Liberman, Roderick Kunz, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro, Andrew Grenville, Allen Bates, Chris Van Peski

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310776

KEYWORDS: Pellicles, Reticles, Nitrogen, Ozone, Polymers, Refractive index, Lithography, Absorption, Surface roughness, Spectroscopy

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Proceedings Article | 7 July 1997 Paper

Performance of excimer lasers as light sources for 193-nm lithography

Jan Sedlacek, Scott Doran, Michael Fritze, Roderick Kunz, Mordechai Rothschild, Ray Uttaro, Daniel Corliss

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276008

KEYWORDS: Excimer lasers, Lithography, Light sources, Argon ion lasers

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Proceedings Article | 12 February 1997 Paper

Marathon damage testing of pellicles for 193-nm lithography

Andrew Grenville, Vladimir Liberman, Roderick Kunz, Mordechai Rothschild, Jan Sedlacek, Ray Uttaro

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301218

KEYWORDS: Pellicles, Ozone, Nitrogen, Reticles, Refractive index, Lithography, Absorption, Polymers, Radiation effects, Optical properties

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Proceedings Article | 8 April 1996 Paper

193-nm lithography (Review Paper)

Mordechai Rothschild, Anthony Forte, Mark Horn, Roderick Kunz, Susan Palmateer, Jan Sedlacek

Proceedings Volume 2703, (1996) https://doi.org/10.1117/12.237751

KEYWORDS: Lithography, Absorption, Etching, Photoresist materials, Polymers, Excimer lasers, Silica, Projection systems, Photoresist processing, Color centers

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SPIE Journal Paper | 1 October 1993

Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan Sedlacek

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.146857

KEYWORDS: Metals, X-ray lithography, X-rays, Silicon, Polymethylmethacrylate, Electroluminescence, Semiconducting wafers, Image processing, Chemistry, Halogens

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SPIE Journal Paper | 1 October 1993

Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan H. Sedlacek

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.146852

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Proceedings Article | 24 June 1993 Paper

Excimer-laser induced degradation in bulk-fused silica

Mordechai Rothschild, Jan Sedlacek

Proceedings Volume 1848, (1993) https://doi.org/10.1117/12.147397

KEYWORDS: Silica, Absorption, Color centers, Excimer lasers, Excimers, Luminescence, Annealing, Refraction, Optical lithography, Optical properties

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Proceedings Article | 19 April 1993 Paper

Optical materials for use with excimer lasers

Jan Sedlacek, Mordechai Rothschild

Proceedings Volume 1835, (1993) https://doi.org/10.1117/12.143032

KEYWORDS: Silica, Excimer lasers, Color centers, Absorption, Crystals, Transparency, Dielectrics, Refraction, Optical components, Excimers

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Proceedings Article | 1 June 1992 Paper

Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan Sedlacek

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130357

KEYWORDS: Pellicles, Absorption, Thin films, Laser induced damage, Optical lithography, Photons, Silica, Excimer lasers, Oxygen, Photomasks

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Proceedings Article | 1 December 1991 Paper

Laser-induced metal deposition and laser cutting techniques for fixing IC design errors

David Shaver, Scott Doran, Mordechai Rothschild, Jan Sedlacek

Proceedings Volume 1596, (1991) https://doi.org/10.1117/12.51010

KEYWORDS: Laser cutting, Metals, Excimer lasers, Platinum, Pulsed laser operation, Aluminum, Laser ablation, Deposition processes, Laser applications, Ion beams

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Showing 5 of 26 publications

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