Silicon oxide thin films were deposited by RF ion beam sputtering and E-beam gun evaporation from two different starting materials, silicon and silica. The properties were studied by using the UV-Visible spectrometer, Fourier transform infrared spectrometer (FTIR) and atomic force microscopy (AFM). The refractive indices, extinction coefficients, surface roughness and molecular bonding structure of these films were discussed for visible to UV range application.
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