We report a summary of the surface damage, growth mitigation effort at 3(omega) for fused silica optics at LLNL. The objective was to experimentally validate selected methods that could be applied to pre-initiated or retrieved-from- service optics, to stop further damage growth. A specific goal was to obtain sufficient data and information of successful methods for fused silica optics to select a single approach for processing NIF optics. This paper includes the test results and the evaluation thereof, for several mitigation methods for fused silica. The mitigation methods tested in this study are wet chemical etching, cold plasma etching, CO2 laser processing, and micro-flame torch processing. We found that CO2 laser processing produces the most significant and consistent results to halt laser-induced surface damage growth on fused silica. We recorded successful mitigation of the growth of laser-induced surface damage sites as large as 0.5-mm diameter, for 1000 shots at fluences in the range of 8 to 13 J/cm2. We obtained sufficient data for elimination of damage growth using CO2 laser processing on sub-aperture representative optics, to proceed with application to full- scale NIF optics.
Laser-induced damage on optical surfaces is often associated with absorbing contaminants introduced by the polishing process. This is particularly the case for UV optics. In the present study, secondary ion mass spectroscopy (SIMS) was used to measure depth profiles of finishing-process contamination on fused silica surfaces. Contaminating detected include the major polishing compound components, Al present largely because of the use of Al2O3 in the final cleaning process, and other metals incorporated during the polishing step or earlier grinding steps. Depth profile data typically showed an exponential decay of contaminant concentration to a depth of 100-200 nm. This depth is consistent with a polishing redeposition layers formed during the chemo-mechanical polishing of fused silica. Peak contaminant levels are typically in the 10-10 pm range, except for Al which often exceeds 1000 ppm.
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