Mr. Jeffrey M. Knecht Profile

Jeffrey M. Knecht

Sr. Assistant Staff at MIT Lincoln Lab

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Publications (1)

Proceedings Article | 1 April 2008 Paper

Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography

Jeffrey Knecht, Vladimir Bolkhovsky, Jay Sage, Brian Tyrrell, Bruce Wheeler, Charles Wynn

Proceedings Volume 6924, 69244R (2008) https://doi.org/10.1117/12.777133

KEYWORDS: Charge-coupled devices, Photomasks, Phase shifts, Signal processing, Lithography, Etching, CMOS technology, Critical dimension metrology, Double patterning technology, Photoresist materials

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