Dr. Jeonkyu Lee Profile

Dr. Jeonkyu Lee

at SK Hynix Inc

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Author

Publications (6)

Proceedings Article | 26 March 2019 Presentation + Paper

OPC model accuracy study using high volume contour based gauges and deep learning on memory device

Young-Seok Kim, SeIl Lee, Zhenyu Hou, Yiqiong Zhao, Meng Liu, Yunan Zheng, Qian Zhao, Daekwon Kang, Lei Wang, Mark Simmons, Mu Feng, Jun Lang, Byoung-Il Choi, Gilbert Kim, Hakyong Sim, Jongcheon Park, Gyun Yoo, JeonKyu Lee, Sung-woo Ko, Jaeseung Choi, Cheolkyun Kim, Chanha Park

Proceedings Volume 10959, 1095913 (2019) https://doi.org/10.1117/12.2515274

KEYWORDS: Calibration, Metrology, Optical proximity correction, Data modeling, Instrument modeling, Scanning electron microscopy, Time metrology, Neural networks, Semiconducting wafers

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Proceedings Article | 12 April 2013 Paper

Mask compensation for process flare in 193nm very low k1 lithography

Jeonkyu Lee, Taehyeong Lee, Sangjin Oh, Chunsoo Kang, Jungchan Kim, Jaeseung Choi, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Irene Su, Hua Song, Jung-Hoe Choi, Yongfa Fan, Anthony Wang, Sung-Woo Lee, Robert Boone, Kevin Lucas

Proceedings Volume 8683, 86830F (2013) https://doi.org/10.1117/12.2012463

KEYWORDS: Optical proximity correction, Lithography, Extreme ultraviolet, Transistors, Critical dimension metrology, Model-based design, 193nm lithography, Cadmium, Photomasks, Optical lithography

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Proceedings Article | 14 December 2009 Paper

Study of OPC accuracy by illumination source types

Kiho Yang, Daejin Park, Jeonkyu Lee, Sangjin Oh, Jinhyuck Jeon, Taejun You, Chanha Park, Donggyu Yim, Sungki Park

Proceedings Volume 7520, 75202A (2009) https://doi.org/10.1117/12.837224

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Lithography, Transistors, Semiconducting wafers, Polarization, Image processing, Process modeling, Scanners

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Proceedings Article | 24 March 2006 Paper

Characterizing optical proximity effect difference among exposure tools

Jongkyun Hong, Jeonkyu Lee, Eunsuk Kang, Hyunjo Yang, Donggyu Yim, Jinwoong Kim

Proceedings Volume 6152, 61522N (2006) https://doi.org/10.1117/12.656918

KEYWORDS: Fiber optic illuminators, Critical dimension metrology, Semiconducting wafers, Inspection, Interferometers, Reticles, Metrology, Control systems, Process control, Optical proximity correction

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Proceedings Article | 15 March 2006 Paper

High NA polarized light lithography for 0.29-k1 process

Chanha Park, Jeonkyu Lee, Kiho Yang, Shih-en Tseng, Young-Hong Min, Alek Chen, Hyunjo Yang, Donggyu Yim, Jinwoong Kim

Proceedings Volume 6154, 61540F (2006) https://doi.org/10.1117/12.656841

KEYWORDS: Polarization, Lithography, Line width roughness, Photomasks, Printing, Line edge roughness, Optical lithography, Zirconium, Resolution enhancement technologies, Optical proximity correction

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Proceedings Article | 10 May 2005 Paper

Abnormal patterning analysis using actual lens and illumination source data

Jongkyun Hong, Jeonkyu Lee, Eunsuk Kang, Hyunjo Yang, Donggyu Yim, James Guerrero, Rob Chung

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599282

KEYWORDS: Optical lithography, Monochromatic aberrations, Semiconducting wafers, Lithographic illumination, Metals, Critical dimension metrology, Yield improvement, Interferometers, Error analysis, Lithography

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Showing 5 of 6 publications

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