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Jianlin Wang
at Siemens Industry Software Inc
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Publications (1)
Proceedings Article | 16 November 2007 Paper
Reduction of layout complexity for shorter mask write-time
Proceedings Volume 6730, 67303K (2007) https://doi.org/10.1117/12.746986
KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Reticles, Manufacturing, Optical alignment, Tolerancing, Lithography, Data processing, Semiconducting wafers
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