Thin films of barium titanate (BaTiO3) have been grown on Si (100) and UV fused silica substrates using KrF pulsed-laser deposition (PLD). The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and UV/VIS/NIR spectroscopy. Smooth and stoichiometric films were grown on Si (100) substrate at O2 pressure range of 10-30 mTorr and substrate temperature of 600°C-620°C. The XRD patterns of the films revealed the polycrystalline peaks with a preferential orientation. The optical properties of BaTiO3 films were investigated in terms of UV-VIS transmission spectrum of the films deposited on UV fused silica substrate. The spectral dependences of refractive index and absorption coefficient, and the thickness of the films have been calculated from optical transmission measurements using the envelope method. The band gap energy (Eg) of BaTiO3 films was found to be 3.35eV.
BaTiO3 thin films have been grown on Si(100) substrate by KrF pulsed-laser deposition (PLD). The influence of substrate temperature and background oxygen pressure on the chemical composition and crystal structure of BaTiO3 films was studied. The films were characterized by X-ray diffraction (XRD), UV/VIS/NIR spectrometer, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). In our experiments, the BaTiO3 films with uniform grains were produced at O2 pressure range of 10-30 mTorr and a substrate temperature of 600°C-620°C. At lower substrate temperature, the XRD patterns of the films displayed weaker peaks with wider FWHM and the AFM images showed grain boundary defects and numerous holes. The compositional analysis performed by XPS indicated that almost stoichiometric 1:1:3 composition BaTiO3 films were grown by PLD at optimized deposition parameters. The excessive oxygen resulted in the formation of other molecules for the film development. The additional XRD peaks of the films were observed when O2 pressure was increased.
BaTiO3 thin films were grown on Si (100) and UV transparent fused silica substrates by KrF (248 nm) excimer laser deposition. The analysis of thin films was performed using XRD, AFM, UV/VIS/NIR spectrometer and Nano-indenter to study general features of BaTiO3 thin films and to optimize deposition parameters. The XRD spectra of BaTiO3 films at 600 degree(s)C on Si (100) show polycrystalline peaks with a strongly preferential orientation. The surface imaging was taken by AFM and shows obvious grain boundary structures. The transmittance spectra for BaTiO3 films on UV fused silica were measured. The absorption increases rapidly below 380 nm. The effects of changing background O2 gas pressure and substrate temperature were studied. Finally, the hardness and Young's reduced modulus and scratch test of BaTiO3 films were measured using Nano-indenter system.
This paper reports the results of our study on structure configurations and material compositions for the construction of smart photonic bandgap structures. The study focuses on the deposition of various Langmuir-Blodgett films for realizing these structures. Multilayer polymeric L-B films using different materials have been deposited and their physical properties studied using atomic force microscopy. Possible causes of film non-uniformity are investigated.
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