Mr. Jim R. Rodriguez Profile

Jim R. Rodriguez

Director, Technology Development at Zygo Extreme Precision Optics

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Author

Publications (10)

Proceedings Article | 16 March 2015 Paper

Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography

Michael Kriese, Yuriy Platonov, Jim Rodriguez, Gary Fournier, Steven Grantham, Charles Tarrio, John Curry, Shannon Hill, Thomas Lucatorto

Proceedings Volume 9422, 94220K (2015) https://doi.org/10.1117/12.2085934

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Annealing, Resistance, Oxides, Reflectometry, Silicon, Oxidation

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Proceedings Article | 17 April 2014 Paper

Improved measurement capabilities at the NIST EUV reflectometry facility

C. Tarrio, S. Grantham, T. Germer, J. Rife, T. Lucatorto, M. Kriese, Y. Platonov, L. Jiang, J. Rodriguez

Proceedings Volume 9048, 90481I (2014) https://doi.org/10.1117/12.2046290

KEYWORDS: Sensors, Extreme ultraviolet, Reflectometry, Polarization, Radiation effects, Reflectivity, Motion models, EUV optics, 3D modeling, Data modeling

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Proceedings Article | 18 March 2014 Paper

Development of an EUVL collector with infrared radiation suppression

Michael Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Ulrich Mueller, Jay Daniel, Shayna Khatri, Adam Magruder, Steven Grantham, Charles Tarrio, Thomas Lucatorto

Proceedings Volume 9048, 90483C (2014) https://doi.org/10.1117/12.2049279

KEYWORDS: Extreme ultraviolet, Reflectivity, Infrared radiation, Extreme ultraviolet lithography, Plasma, Infrared technology, Neodymium, Nickel, Surface finishing, Diffraction gratings

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Proceedings Article | 4 May 2011 Paper

Multilayers for next generation EUVL at 6.X nm

Yuriy Platonov, Jim Rodriguez, Michael Kriese, Eric Gullikson, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8076, 80760N (2011) https://doi.org/10.1117/12.889519

KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Lanthanum, Multilayers, Extreme ultraviolet, Mirrors, Sputter deposition, Laser beam diagnostics, Boron, X-ray optics

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Proceedings Article | 6 May 2005 Paper

Characterization of prototype optical surfaces and coatings for the EUV reticle imaging microscope

H. Glatzel, J. Daniel, K. Khajehnouri, T. Roff, S. Sporer, S. Wong, M. Kriese, Y. Platonov, J. Rodriguez

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.619290

KEYWORDS: Optical coatings, Reflectivity, Photovoltaics, Extreme ultraviolet, Microscopes, Reticles, Light scattering, Mirrors, Atomic force microscopy, Prototyping

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Proceedings Article | 17 December 2003 Paper

Initial results of new photomask-blank deposition tool

Michael Kriese, James Rodriguez, Yuriy Platonov, James Wood

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518314

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet, Thin films, Thin film coatings, Ions, Particles, Reflectivity, Ion beams, Sputter deposition

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Proceedings Article | 28 August 2003 Paper

Initial capability of new photomask-blank deposition tool

Michael Kriese, James Wood, James Rodriguez, Gary Fournier, David Thompson, David Mercer, Jason Gass, Dale Mauldin

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504179

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet, Thin films, Thin film coatings, Particles, Reflectivity, Ions, Ion beams, Sputter deposition

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Proceedings Article | 23 November 1999 Paper

Control of Mo/Si multilayers for soft x-ray performance

Michael Kriese, Gary Fournier, James Rodriguez, Yuriy Platonov

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371123

KEYWORDS: X-rays, Optical coatings, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Reflectivity, Photomasks, X-ray optics, Sputter deposition, Process control

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Proceedings Article | 1 November 1997 Paper

Deposition of x-ray multilayers on long-size substrates for synchrotron applications

Yuriy Platonov, David Broadway, Brian DeGroot, Boris Verman, Bonglea Kim, George Gutman, James Wood, James Rodriguez, Nicola Grupido

Proceedings Volume 3152, (1997) https://doi.org/10.1117/12.295561

KEYWORDS: Multilayers, Mirrors, Reflectivity, Coating, Silicon, X-rays, Silicon carbide, Angiography, Synchrotrons, Sputter deposition

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Proceedings Article | 11 July 1997 Paper

X-ray reflectivity and mechanical stress in W/Si multilayers deposited on thin substrates of glass, epoxy-replicated aluminum foil, and Si wafer

Yuriy Platonov, David Broadway, Brian DeGroot, Peter Mao, Fiona Harrison, George Gutman, James Rodriguez

Proceedings Volume 3113, (1997) https://doi.org/10.1117/12.278878

KEYWORDS: Multilayers, Reflectivity, Silicon, Glasses, Annealing, X-rays, Tungsten, Temperature metrology, Semiconducting wafers, Aluminum

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Showing 5 of 10 publications

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