Dr. Jinphil Choi Profile

Dr. Jinphil Choi

Principal Engineer at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 11 April 2017 Presentation + Paper

Process margin improvement through finger-print removal based on scanner leveling data

Young Jun Kim, Tony Park, Jeong Heung Kong, Dong Kyung Han, Jin Phil Choi, Young Seog Kang, Se Yeon Jang, Jeroen Cottaar, Jan-Pieter van Delft, Jeroen Rutten, Axel von Sydow, Marcel Bontekoe, Maarten Boogaarts, Arjan Donkerbroek, Ruiyue Ouyang, Balaji Rangarajan, Khalid Elbattay, Andrew Moe, Chung-Yong Kim

Proceedings Volume 10147, 1014709 (2017) https://doi.org/10.1117/12.2258184

KEYWORDS: Manufacturing

Read Abstract +

Proceedings Article | 24 March 2017 Presentation + Paper

Scanner-to-scanner CD analysis and control in an HVM environment

Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung

Proceedings Volume 10147, 101470A (2017) https://doi.org/10.1117/12.2258339

KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Improvement of inter-field CDU by using on-product focus control

Kyeong Dong Park, Tony Park, Jong Hyun Hwang, Jin Phil Choi, Young Seog Kang

Proceedings Volume 9050, 90500R (2014) https://doi.org/10.1117/12.2046224

KEYWORDS: Semiconducting wafers, Metrology, Reticles, Signal processing, Control systems, Lithography, Scanners, Process control, Scanning electron microscopy, Computer simulations

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Focus control budget analysis for critical layers of flash devices

Jong Hoon Jang, Tony Park, Kyeong Dong Park, Jong Hyun Hwang, Jin Phil Choi, Young Seog Kang

Proceedings Volume 9050, 90502F (2014) https://doi.org/10.1117/12.2046235

KEYWORDS: Semiconducting wafers, Scanners, Finite element methods, Monochromatic aberrations, Control systems, Error analysis, Code division multiplexing, Critical dimension metrology, Process control, Sensors

Read Abstract +

Proceedings Article | 31 March 2014 Paper

Analysis of overlay errors induced by exposure energy in negative tone development process for photolithography

Young Ha Kim, Jang-Sun Kim, Young-Hoon Kim, Byeong-Ok Cho, Jinphil Choi, Young Seog Kang, Hunhwan Ha

Proceedings Volume 9052, 90520V (2014) https://doi.org/10.1117/12.2046265

KEYWORDS: Semiconducting wafers, Photomasks, Overlay metrology, Error analysis, Image processing, Optical lithography, Photoresist processing, Lithography, Double patterning technology, Image contrast enhancement

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Lens heating impact analysis and controls for critical device layers by computational method

Du Hyun Beak, Jin Phil Choi, Tony Park, Young Sun Nam, Young Seog Kang, Chan-Hoon Park, Ki-Yeop(Chris) Park, Chang-Hoon Ryu, Wenjin Huang, Ki-Ho Baik

Proceedings Volume 8683, 86831Q (2013) https://doi.org/10.1117/12.2012135

KEYWORDS: Photomasks, Wavefronts, Calibration, 3D modeling, Scanners, Control systems, Semiconducting wafers, Data modeling, Reticles, Diffraction

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Enhancing lithography process control through advanced, on-board beam parameter metrology for wafer level monitoring of light source parameters

Jinphil Choi, Nakgeuon Seong, Omar Zurita, Joshua Thornes, Yookeun Won, Slava Rokitski, Youngseog Kang, Bernd Burfeindt, Chanhoon Park

Proceedings Volume 8326, 83262O (2012) https://doi.org/10.1117/12.917900

KEYWORDS: Semiconducting wafers, Metrology, Light sources, Process control, Lithography, Critical dimension metrology, Light, Laser metrology, Optical lithography, Lithographic illumination

Read Abstract +

Proceedings Article | 24 March 2009 Paper

Challenges of long-term process stability and solutions for better control

Jinphil Choi, Nakgeuon Seong, Sangho Lee, Youngseog Kang

Proceedings Volume 7272, 727234 (2009) https://doi.org/10.1117/12.815414

KEYWORDS: Critical dimension metrology, SRAF, Photoresist processing, Process control, Semiconducting wafers, Beam controllers, Imaging systems, Optical simulations, Resolution enhancement technologies, Laser stabilization

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Analysis of the effect of laser bandwidth on imaging of memory patterns

Nakgeuon Seong, Insung Kim, Dongwoo Kang, Sang-Ho Lee, Jinphil Choi

Proceedings Volume 7140, 714042 (2008) https://doi.org/10.1117/12.804557

KEYWORDS: Diffusion, Critical dimension metrology, SRAF, Optical simulations, Cadmium, Control systems, Fiber optic illuminators, Tolerancing, Lithographic illumination, Semiconductors

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years