Mr. Jinhyuk Kim Profile

Jinhyuk Kim

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Proceedings Article | 13 November 2024 Presentation

EUV mask defect mitigation strategy at Samsung Foundry

Jongkil Choi, Suyeon Chae, Hyunjin Kim, Jinhyuk Kim, Dongsik Jung, Sang Lee

Proceedings Volume PC13215, PC132150E (2024) https://doi.org/10.1117/12.3034526

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Pellicles, Defect detection, Metrology

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EUV Lithography has made tremendous improvement over the last decade, but one of the remaining challenges is the mask defectivity. The current membrane-based EUV pellicle scheme can prevent the yield loss due to mask defectivity, but it comes with a high price tag including low throughput and availability loss when it ruptures in the scanner. On-time delivery of the final products by ensuring high yield is Samsung Foundry's number one priority, and Samsung Foundry has strengthened mask defect detection schemes and metrology to prevent and overcome the mask defectivity issue in the EUV scanners. However, as advanced nodes are rapidly ramping up and the types of defects becomes more diverse, there are limitations in detecting 'very small' defects with the existing techniques. Especially, one tiny defect can lead to a detrimental yield loss for large dies and one-shot-one-die products. In this paper, we will discuss various schemes including the most advanced EUV pellicle technology to mitigate and fundamentally solve the EUV mask defectivity issue and how we will deliver the highest quality and highest yield products to the end customers for the advance node products.

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