Mr. Jirka Schatz Profile

Jirka Schatz

Applications Engineer, Sr II at Synopsys GmbH

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Author

Publications (13)

Proceedings Article | 12 November 2024 Presentation + Paper

Predictive printability assessment of EUV mask defects

Nicole Wu, Chun-Cheng Liao, Jirka Schatz, Thomas Muelders, Mariya Braylovska, John Tsai, Martin Bohn, Evgenii Sukhov, Wolfgang Demmerle

Proceedings Volume 13216, 1321611 (2024) https://doi.org/10.1117/12.3034491

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Contour extraction, Metrology, 3D mask effects, Printing, Lithography, Data modeling, Image processing, Calibration

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Proceedings Article | 5 October 2023 Paper

Test pattern generation by optimization of the feature space signature

Francois Weisbuch, Jirka Schatz

Proceedings Volume 12802, 1280207 (2023) https://doi.org/10.1117/12.2675601

KEYWORDS: Matrices, Design and modelling, Lithography, Design rules, Feature extraction, Etching, Optical lithography, Optical proximity correction, Evolutionary optimization, Binary data

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Proceedings Article | 14 June 2022 Poster + Paper

Automated SRAF printing detection and quantification through SEM image analysis

Jirka Schatz, Francois Weisbuch, Nivea Schuch, Frederic Robert, Thiago Figueiro

Proceedings Volume PC12053, PC120530Q (2022) https://doi.org/10.1117/12.2614732

KEYWORDS: SRAF, Printing, Scanning electron microscopy, Calibration, Data modeling, Computer simulations, Artificial intelligence, Optical proximity correction, Image analysis, Stochastic processes

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Proceedings Article | 9 March 2021 Presentation + Paper

Investigating SEM-contour to CD-SEM matching

Francois Weisbuch, Jirka Schatz, Sylvio Mattick, Nivea Schuch, Thiago Figueiro, Patrick Schiavone

Proceedings Volume 11611, 116110Y (2021) https://doi.org/10.1117/12.2583715

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Proceedings Article | 22 February 2021 Presentation + Paper

Contour-based model calibration to a minimum number of patterns

Bernd Küchler, Francois Weisbuch, Wolfgang Hoppe, Jirka Schatz, Martin Bohn, Ulrich Klostermann

Proceedings Volume 11613, 116130G (2021) https://doi.org/10.1117/12.2584714

KEYWORDS: Calibration, Data modeling, Resolution enhancement technologies, Process modeling, Scanning electron microscopy, Data acquisition, Optical lithography, Metrology, Lithography, Computer simulations

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Proceedings Article | 23 March 2020 Presentation + Paper

Rigorous simulation of implant resist on topographic wafer

Jirka Schatz, Bernd Küchler, Wolfgang Hoppe, Dimitrios Tsamados

Proceedings Volume 11327, 113270I (2020) https://doi.org/10.1117/12.2552102

KEYWORDS: Semiconducting wafers, Silicon, Etching, Oxides, Ions, Photomasks, Optical proximity correction, Lithography, Process modeling

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SPIE Journal Paper | 15 April 2019

Characterizing interlayer edge placement with SEM contours

François Weisbuch, Jirka Schatz, Matthias Ruhm

JM3, Vol. 18, Issue 02, 021203, (April 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.021203

KEYWORDS: Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Error analysis, Etching, Metrology, Distance measurement, Control systems, Lithography, Scanners

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Proceedings Article | 19 September 2018 Paper

Measuring inter-layer edge placement error with SEM contours

François Weisbuch, Jirka Schatz, Matthias Ruhm

Proceedings Volume 10775, 107750O (2018) https://doi.org/10.1117/12.2326529

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Etching, Distance measurement, Error analysis, Optical alignment, Metrology, Image processing, Statistical analysis

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SPIE Journal Paper | 6 March 2018

Introducing etch kernels for efficient pattern sampling and etch bias prediction

François Weisbuch, Andrey Lutich, Jirka Schatz

JM3, Vol. 17, Issue 01, 013505, (March 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.013505

KEYWORDS: Etching, Scanning electron microscopy, Data modeling, Optical proximity correction, Optical lithography, Performance modeling, Calibration, Anisotropic etching, Artificial neural networks, 3D modeling

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Proceedings Article | 28 September 2017 Paper

Contour-based etch modeling enablement: from pattern selection to final verification

Jirka Schatz, François Weisbuch, Andrey Lutich

Proceedings Volume 10446, 104460M (2017) https://doi.org/10.1117/12.2279694

KEYWORDS: Etching, Scanning electron microscopy, Performance modeling, Optical proximity correction, Metrology, Data modeling, Image processing, Resolution enhancement technologies, Buildings, Calibration

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Proceedings Article | 28 September 2017 Paper

Pattern sampling for etch model calibration

François Weisbuch, Andrey Lutich, Jirka Schatz

Proceedings Volume 10446, 1044610 (2017) https://doi.org/10.1117/12.2279700

KEYWORDS: Etching, Calibration, Optical lithography, Distance measurement, Scanning electron microscopy, Optical proximity correction, Physics, Photoresist materials, Anisotropic etching

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Proceedings Article | 24 March 2017 Paper

Optimal structure sampling for etch model calibration

François Weisbuch, Andrey Lutich, Jirka Schatz

Proceedings Volume 10147, 101470I (2017) https://doi.org/10.1117/12.2257994

KEYWORDS: Etching, Data modeling, Calibration, Optical proximity correction, Lithography, Photoresist materials, Physics, Scanning electron microscopy, Optical lithography, Computational lithography, Performance modeling, Anisotropic etching, Distance measurement

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Proceedings Article | 20 October 2016 Paper

Improving contact layer patterning using SEM contour based etch model

François Weisbuch, Andrey Lutich, Jirka Schatz, Tino Hertzsch, Hans-Peter Moll

Proceedings Volume 10032, 1003202 (2016) https://doi.org/10.1117/12.2248013

KEYWORDS: Scanning electron microscopy, Etching, Optical lithography, Calibration, Optical proximity correction, Data modeling, Lithography, Metrology, Photomasks, Semiconducting wafers

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Showing 5 of 13 publications

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