Dr. Joon-Min Park Profile

Dr. Joon-Min Park

at Hanyang Univ

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Author

Publications (9)

Proceedings Article | 1 April 2009 Paper

Temperature and critical dimension variation in a single wafer on hot plate due to non-uniform heat source

Bobae Kim, Joon-Min Park, Hyunsu Kim, Ilsin An, Seung-Wook Park, Hye-Keun Oh

Proceedings Volume 7273, 72732Z (2009) https://doi.org/10.1117/12.814009

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photoresist materials, Process control, Lithography, Semiconductors, Etching, Photoresist processing, Chemically amplified resists, Polymers

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Proceedings Article | 1 April 2009 Paper

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

In Wook Cho, Joon-Min Park, Hyunsu Kim, Joo-Yoo Hong, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proceedings Volume 7273, 72732D (2009) https://doi.org/10.1117/12.814108

KEYWORDS: Line edge roughness, Line width roughness, Photoresist processing, Lithography, Polymers, Surface roughness, Diffusion, Glasses, Extreme ultraviolet lithography, Monte Carlo methods

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Proceedings Article | 1 April 2009 Paper

Position shift analysis in resist reflow process for sub-50-nm contact hole

Jee-Hye You, Joonwoo Park, Joon-Min Park, Heejun Jeong, Hye-Keun Oh

Proceedings Volume 7273, 727344 (2009) https://doi.org/10.1117/12.814016

KEYWORDS: Photoresist processing, Optical proximity correction, Electron beam lithography, Scanning electron microscopy, Optical lithography, Critical dimension metrology, Glasses, Lithography, Cadmium, Applied physics

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Proceedings Article | 16 March 2009 Paper

32 nm half pitch formation with high numerical aperture single exposure

Minhee Jung, Joon-Min Park, Moonseok Kim, Sukjoon Hong, Jaisoon Kim, In-Ho Park, Hye-Keun Oh

Proceedings Volume 7274, 72741Z (2009) https://doi.org/10.1117/12.814103

KEYWORDS: Nanoimprint lithography, Lithography, Double patterning technology, Critical dimension metrology, Immersion lithography, Microfluidics, Optical lithography, Binary data, Physics, Ultraviolet radiation

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Proceedings Article | 4 December 2008 Paper

22nm 1:1 line and space patterning by using double patterning and resist reflow process

Joon Min Park, Ji-Hye Yoo, Joo-Yoo Hong, Ilsin An, Hye-Keun Oh

Proceedings Volume 7140, 714038 (2008) https://doi.org/10.1117/12.804643

KEYWORDS: Double patterning technology, Photoresist processing, Etching, Lithography, Photomasks, Optical lithography, Extreme ultraviolet, Immersion lithography, Glasses, Applied physics

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Proceedings Article | 26 March 2008 Paper

Resist reflow process for arbitrary 32 nm node pattern

Joon-Min Park, Ilsin An, Hye-Keun Oh

Proceedings Volume 6923, 69233A (2008) https://doi.org/10.1117/12.772130

KEYWORDS: Double patterning technology, Photoresist processing, Optical proximity correction, Extreme ultraviolet, Resolution enhancement technologies, Information technology, Lithography, Applied physics, Ultraviolet radiation, Roads

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Proceedings Article | 7 March 2008 Paper

32 nm 1:1 line and space patterning by resist reflow process

Joon-Min Park, Heejun Jeong, Ilsin An, Hye-Keun Oh

Proceedings Volume 6924, 69244S (2008) https://doi.org/10.1117/12.772133

KEYWORDS: Double patterning technology, Electron beam lithography, Photoresist processing, Critical dimension metrology, Semiconductors, Photoresist materials, Optical simulations, Glasses, Information technology, Lithography

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Proceedings Article | 1 November 2007 Paper

Critical dimension control for 32 nm random contact hole array with resist reflow process

Joon-Min Park, Young-Min Kang, Seung-Wook Park, Joo-Yoo Hong, Hye-Keun Oh

Proceedings Volume 6730, 673043 (2007) https://doi.org/10.1117/12.746518

KEYWORDS: Optical proximity correction, Photomasks, Critical dimension metrology, Photoresist processing, Optical lithography, Cadmium, Lithography, Optical arrays, Process control, Control systems

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Proceedings Article | 21 March 2007 Paper

Photoresist adhesion effect of resist reflow process

Joon-Min Park, Ji-Eun Lee, Moon-Seok Kim, Jung-Hun Kim, Jai-Soon Kim, Sung-Muk Lee, Jun-Tack Park, Chul-Kyu Bok, Seung-Chan Moon, Seung-Wook Park, Joo-Yoo Hong, Hye-Keun Oh

Proceedings Volume 6519, 65193O (2007) https://doi.org/10.1117/12.712498

KEYWORDS: Photoresist processing, Photoresist materials, Semiconductors, Glasses, Thin films, Lithography, Physics, Chemistry, Computer simulations, Applied physics

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Showing 5 of 9 publications

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