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Dr. Jun Wang
at Univ of Hong Kong
SPIE Involvement:
Author
Publications (4)
SPIE Journal Paper | 1 January 2005
Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates
JM3, Vol. 4, Issue 01, 013001, (January 2005) https://doi.org/10.1117/12.10.1117/1.1857529
KEYWORDS: Photomasks, Transistors, Lithography, Standards development, Resolution enhancement technologies, Field effect transistors, Capacitance, Phase shifts, Image quality standards, Binary data
Proceedings Article | 6 December 2004 Paper
Performance optimization for gridded-layout standard cells
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569398
KEYWORDS: Transistors, Photomasks, Lithography, Manufacturing, Resolution enhancement technologies, Field effect transistors, Standards development, Phase shifts, Resistors, Doping
Proceedings Article | 3 May 2004 Paper
Standard cell design with regularly placed contacts and gates
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.534538
KEYWORDS: Photomasks, Transistors, Lithography, Standards development, Phase shifts, Resolution enhancement technologies, Capacitance, Field effect transistors, Image quality standards, Binary data
Proceedings Article | 2 July 2003 Paper
Effects of grid-placed contacts on circuit performance
Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.485279
KEYWORDS: Field effect transistors, Capacitance, Photomasks, Lithography, Resolution enhancement technologies, Lithographic illumination, Transistors, Power supplies, Standards development, Image quality standards
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