Films are widely used in electronic shielding, surface protection, etc. Since the spectral reflectance of the thick film layer has enough peaks and troughs, there are various ways to extract its thickness, such as the extreme value method, the envelope method, the Fourier transform and so on. However, because the theoretical model of the extreme value method ignores the extinction coefficient, the envelope method has a large extraction error, and the Fourier method ignores the dispersion characteristics of the refractive index, the measurement accuracy is limited for some precise scenario. In this paper, a new film thickness extracting strategy is proposed with genetic algorithm. At first, the measured spectral reflectance of the film is used to extract the extreme value points, and an extreme value sequence is obtained by dividing their corresponding wavelengths, and then the slope of the extreme value sequence is fitted with the slope of the extreme value sequence of the preset film thickness. When the two slops are consistent, the preset film thickness is the thickness to be measured. Theoretical analysis and measuring experiments are carried out to show a stability of about 0.05nm for a 8630.11nmfilm sample, verifying the feasibility and stability of the proposed strategy.
Thin films are used in many areas for protecting the base, isolating electrons, and so on. Based on the thin-film interference principle and the characteristics of Y-shaped fiber, this paper proposed a reflection objective with annular reflection. With the objective, incident light from the central fiber can be well received for high signal-to-noise ratio. By comparing with the prior-known spectral reflectance of the standard mirror, the absolute spectral reflectance of the thin-film can be achieved. Furthermore, according to the spectral reflectance of the thin-film, film thickness is acquired by the evolutionary genetic algorithm. In the algorithm, the thickness is taken as the independent variable, and the squared difference between the measured spectral reflectance and the preset theoretical spectral reflectance is set as the goal to carry out the global optimization. By testing different silicon-based silica films, the measurement results proved high feasibility and good global fitness. And the total measurement time of a single point is less than 1s. In conclusion, the thin-film measurement system based on the proposed reflection objective and inversion algorithm own excellent performance, which is hopeful for broad usage.
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