The laser attenuation device has always been an important component of the LIDT system,the attenuation adjustment ability of the laser attenuation device directly affects the performance of the testing system.The continuous attenuation device of high energy laser is achieved by combining polarization cube with rotating half wave plate,when the angle of the rotating half wave plate changes from 0° to 45°, the transmissivity of the attenuator changes from 99.9% to 0.3%.This design scheme reduces the volume of the attenuation device while achieving continuous adjustment of the transmissivity.Adopting optical devices with large aperture and high damage threshold, the maximum single pulse energy that the system can withstand is 2J@1064nm. The attenuated energy is tested by using a Ophir PE50BF-DIF-C pyroelectric energy sensor,the results show that the laser energy transmissivity can be continuously adjusted within the range of [0.3%,99.9%]. Using Beamtech China SGR20 laser, it can work stably with the power density of 2J@1064nm whose experimental results meet the design re-quirements. Compared with the traditional optical variable attenuator,this design has the advantages of large dynamic regulation range, stable attenuation and continuous regulation.
The infrared anti-reflection film is prepared by ion beam assisted thermal evaporation deposition technology. The film has good firmness and can meet the needs of wet transfer. By adjusting the number of layers of the graphene mesh, the electromagnetic shielding and optical transparency properties are simultaneously improved. The infrared anti-reflection film and graphene mesh are combined to design and prepare a compatible electromagnetic shielding infrared anti-reflection film device with sandwich structure. The test results of the device show that the peak transmittance of the graphene mesh/infrared film/substrate/infrared film combination structure in the 3 to 5 μm band is 95.06%, and the average transmittance is 93.40%. The peak shielding effectiveness (SE) in the 12 to 18 GHz frequency band is 14.50 dB, and the average SE is 12.98 dB. It shows that the film device of this structure maintains the high transmittance of the infrared anti-reflection film and has good electromagnetic shielding effectiveness.
Sub-wavelength ratings (SWGs) have the property of the laser induced damage threshold (LIDT) close to that of bulk optical medium material, which becomes the focus of research to improve the anti-laser damage properties of optical element in recent years. SWGs are the effective substitutes for the laser anti-reflection (AR) of multilayer dielectric (MLD) thin films. In this paper, a polarization-dependent SWG with anti-reflection and wide-spectrum properties based on optical glass was designed using rigorous coupled wave analysis (RCWA). Figure 1 shows the schematic of the 1D grating, h is the ridge height of the grating, w is the bottom width of the grating,Λ is the period of the grating, and θ is the incident angle. The spectral characteristics were simulated using finite element analysis (FEA). The results show that the transmittance is not less than 95% from 350 nm-2500 nm in 0°~40° incident angle when the polarization component z of the electric field (TE) is parallel to the ridge direction of the grating. And it is not less than 98.5% at 0° incident angle from 350 nm to 2500 nm. When the polarization component z of the magnetic field (TM) is parallel to the ridge direction of the grating, the transmittance is not less than 95% from 300 nm to 900 nm in 0°~40° incident angle.
In this paper, four continuous graphene films were successfully prepared by adjusting the nucleation density of graphene. The transparent electromagnetic shielding properties of graphene films under different preparation processes were studied. The results show that the electromagnetic shielding effectiveness of the graphene film does not increase with the increase of the growth thickness. Moreover, the graphene of different thicknesses are mainly absorption shielding, and the reflective shielding effectiveness is less than 0.5dB. The sample #1 is a single-layer graphene film with an optical transmittance of 97.3% and an electromagnetic shielding efficiency of 2.11dB. Its good single-layer structure and fewer defects are the reasons for obtaining higher transparent electromagnetic shielding performance.
This article uses AT89S51 single-chip microcomputer as the CPU of the human body temperature measurement system, uses the MLX90614 sensor to measure the body temperature, assists the use of the HC-SR04 ultrasonic module and the DS18B20 digital temperature sensor to measure the distance between the target and the system and the ambient temperature, and displays the temperature on the LCD system . It is suitable for non-contact measurement in public places, and can detect body temperature quickly and effectively with high accuracy.
In order to improve the laser-induced damage threshold (LIDT) of thin film optical elements in laser systems, the thermal damage and thermal stress damage processes in thin films induced by laser are analyzed. Based on the theoretical knowledge of heat conduction, material mechanics and thermoelasticity, the mathematical model of multilayer optical thin films irradiated by single-pulse Gauss laser is established. The active heat conduction equations and thermoelastic equilibrium differential equations under the model are established. The analytical solutions of temperature and thermal stress in multilayer optical thin films induced by laser are derived and calculated. Through software calculation and simulation, the distributions of temperature field and thermal stress field are obtained. By discussing and analyzing the simulation results, the influencing factors and distribution rules of temperature rise and thermal stress are obtained, which provide theoretical basis for preparing thin films with high laser-induced damage threshold.
Optical film damage threshold is an important basis for measuring the ability of film to resist laser damage, and laser parameters are the key factors affecting its accurate measurement. The single-factor control variable method was used to establish the the numerical model of laser energy error, the focused spot size error and the damage threshold error, and the M 2 factor and the damage threshold. The theoretical analysis and computer simulation of the energy error, the focused spot size error and the beam quality on the film damage threshold influences. A method based on the Shack-Hartman wave-front detection method is proposed to measure the pulsed laser beam parameters. The working principle is described in detail, and the Shack-Hartman beam shape parameter measurement system is designed. The actual output energy of the laser and the size of the focused spot were measured experimentally, and the uncertainty of the film damage threshold was evaluated according to the statistical principle. The results shows that the energy error and the focused spot error are directly proportional to the damage threshold error, and M 2 is inversely related to the damage threshold. From the thin film sample analysis, the relative uncertainty of the damage threshold measurement is 18.78%. Therefore, studying the influence of laser parameters on the damage threshold provides a direction for obtaining accurate film damage threshold test results.
To research the initiation of breakdown and the earliest stages of plasma formation, analyzing the ignition time and mechanism is necessary. The ignition time of laser-induced air plasmas is numerically simulated on the basis of air breakdown conditions in atmospheric air. This time is on the order of a few nanoseconds, and increases with increasing laser facula radius and pulse width, and decreases with increasing laser wavelength and incident laser energy. In addition, images obtained using a high-speed camera (NX5-X2) indicate that the ignition process of laser-induced air plasmas includes preionization, ionization, significant ionization, plasma shielding , plasma ignition and extinction.
In order to improve the shielding effectiveness of graphene films, graphene films were prepared by chemical vapor deposition. The effects of hydrogen flow rate, methane flow rate, reaction temperature and reaction time on the electromagnetic shielding properties of the films were investigated. The shielding effectiveness of the film was tested and the preparation process of the film was optimized based on the test results. The results show that when the hydrogen flow rate is 8sccm, the methane flow rate is 15sccm, the reaction temperature is 1030°C, and the reaction time is 30minutes, the shielding effectiveness of the film is 1.2dB (0.3-3000MHz) and the average transmittance is 96%. (400-800nm), the photoelectric comprehensive performance is better.
The Ta2O5 thin film is one of the most important high refractive materials in the band range from visible to near infrared. In this paper, Ta2O5 thin films were prepared by electron beam thermal evaporation(EBE) technology with different process parameters. The optical performance parameters of Ta2O5 thin films with different process parameters were tested, and the process parameters of the minimum extinction coefficient and the highest laser-induced damage threshold of Ta2O5 thin films were obtained. The results show that when the optimum process parameters are: electron beam current 110 mA, pressure 2.0×10 -2 Pa, substrate temperature 150°C, the extinction coefficient of the prepared Ta2O5 thin film is the minimum; when the optimum process parameters are: pressure 1.0×10 -2 Pa, substrate temperature 150°C, The laser-induced damage threshold (LIDT) of the prepared Ta2O5 thin film is the highest when the electron beam current is 90 mA. The research results have reference significance for the selection of process parameters of Ta2O5 thin film with different the laser-induced damage thresholds.
Shear interferometer measurement method is one of main techniques in optical interferometry metrology. A shearing interferometric detection system is presented in order to obtain the three- dimensional profile of wavefront. A aperture and chessboard grating were used to divide the measured wavefront into four wavefronts, and two coherent wavefronts form an interferogram. The theoretical model of shearing interferometric detection system based on Fourier Optics and light intensity transmission equation is structured. According to the Fourier transform algorithm, an algorithm of shear interferogram processing is presented. Finally, the measured wavefront can be reconstructed. The transient wavefront detection system was applied to reconstruct the transient wavefront automatically. Experiments show that the apparatus offers higher accuracy, which satisfies the need for the practical applications. The measured results are in good agreement with the reconstructed wavefronts from SID4 wavefront sensor. The system can be applied to transient wavefront reconsitution.
For the difficulty of measuring thin film thickness, a method of thin film thickness measurement based on laser heterodyne interferometry is proposed. Thin film difference of this method is generated by the relative optical path difference of Michelson interference light path with principle of heterodyne interference. The thickness is got by precision displacement table in line-by-line scaning. The shift of measurement system is about 8nm with constant temperature. Average deviation of measuring results is about 5nm. The comparison with ellipsometer shows the correctness of the method.
The electron temperature and density of air plasma hold important meanings for researching the process of laser-induced air breakdown plasma. In this paper, a TEM 00 Q Nd:YAG laser with a wavelength of 1064 nm is used. When the laser is focused on the atmosphere, it will produce a plasma flash. The spectrum of the resulting air breakdown plasma is collected using a Avantes-ULS3648 spectrometer with nine separate channels. Changes in electron temperature and density of the plasma at different delay times are studied by spectral analysis. According to the spectrum of a given element with different peak positions, the electron temperature of the plasma can be obtained by employing the intensity comparative method, and the electron density of the plasma can be obtained by invoking the Stark broadening method. It was found that both the temperature and density of the air plasma decrease with increasing of the delay time. Such results maintain a high degree scientific significance for improving the accuracy and precision of on-line measurements in the atmospheric environment.
Whether to diagnose accurately the laser damage of optical film or not is the key to measure the laser-induced damage threshold of the optical film, which directly affect the accurate assessment. In this paper, based on the plasma theory, researches on the characteristics of the laser-induced plasma while the optical film has been damaged in detail have been done, and theoretical and experimental analyzing on this plasma shockwave has been taken with acoustic method. The laser damage diagnosis method of optical film based on the characteristics of plasma has been proposed. The results show that, this method, taken the atomic spectrum of the laser-induced plasma spectrum and the peak value of pressure of the laser-induced plasma shockwave as the criteria, can efficiently improve the test accuracy of the laser-induced damage threshold of optical film.
A method used for precisely measuring the placement of the fast or slow axis of wave plate is presented. In this method, a test wave plate is placed between a polarizer and an analyzer. With the polarizer and analyzer being rotated to different positions, the intensity of the emergent light is measured and one of the optics principal axes of the test wave plate is marked. Then whether this optics principal axis is a fast or slow axis is measured by checking the state of the emergent light polarization. By taking the method of identifying the intensity value near the inflection point, the error caused by directly searching the extreme value of the light intensity can be avoided and the accuracy of determining axis can also be improved significantly. In addition, the source of the determining axis accuracy, which is ±0.1° . is also analyzed in detail. With regard to the method, there are no requirements for the wavelength of the light source or the linearity, undercurrent and isotropy of the photoelectric detector. Above all, it can be applied to determining the axis of wave plate with any phase retardation.
Diamond-like carbon (DLC) filmare widely used in the infrared protection window, but their ability of anti-laser damage is insufficient. The common methods to improve the anti-laser ability of DLC films were summarized at first, then a new method which use the external electric field was proposed. Based on the standards ISO11254 of laser damage threshold, the damage morphology of DLC films with and without the bias field were compared. The results show that with the bias field, damage morphologies changes obviously under the same laser energy. According to the physical mechanism analysis, the photogenerated electrons of the films under the action of electric field drift speedy, the drift reduce the heat generated from the laser radiation area, then relayed the graphitization of the DLC films. This after-treated method will be a new method to improve DLC films’ anti-laser damage ability.
The laser beam quality measurement has become a hot topic in the field of laser engineering nowadays. Based on the
method of Hartmann-Shack, the four-wave lateral shearing interferometer is presented in this paper to achieve the laser
beam shape parameters. The principle of shearing technology is described in detail. Parameters of semiconductor laser at
532nm and ZYGO interferometer laser are tested based on the method of four-wave lateral shearing interference and their
test results are compared with the nominal parameters. As the results, the test results are basically consistent with the
nominal value, which fully shows the feasibility of the four-wave lateral shearing interference method.
Optical thin film is the weak link in the entire laser systems; its resistant ability of laser induced damage is the bottleneck of laser systems which improve towards high-energy and high-power direction meanwhile. Owing to these, measurement of LIDT has been paid more and more attention to. The laser damage model of film was established. Based on this principle, criterion of photothermal deflection damage was determined. Experimental device based on laser damage model was set up. After experiments of SiO2 films were conducted, beam offset under different energy was obtained. Comparative analysis of results between image processing method and photothermal deflection method were shown in the article. Experimental results show that photothermal deflection method is more sensitive than image method on measurement of film laser damage.
The analysis of laser damage properties of films is the focus of most concern in recent years. Many properties of the film have been studied, but the surface accuracy of the substrates shouldn’t be ignored. TiO2 films are prepared on K9 glass substrates with different surface accuracy by ion beam assistant deposition technique. The films’ surface morphology, microstructure and thickness are been analyzed. It shows that the substrates with different surface accuracy have some impact on thin film growth and make different micro-structures of thin film. According to the international standard requirements of the damage threshold, the films’ damage threshold is measured on the films’ laser-induced damage threshold test platform composed with 1064 nm Nd: YAG laser. The results indicate that the laser damage threshold of the film deposited on the substrate with the better surface accuracy is higher, and the substrate with high accuracy can improve the laser damage resistance of the film.
A co-colored thin film device for laser-induced damage threshold test system is presented in this paper, to make the
laser-induced damage threshold tester operating at 532nm and 1064nm band. Through TFC simulation software, a film
system of high-reflection, high -transmittance, resistance to laser damage membrane is designed and optimized. Using
thermal evaporation technique to plate film, the optical properties of the coating and performance of the laser-induced
damage are tested, and the reflectance and transmittance and damage threshold are measured. The results show that, the
measured parameters, the reflectance R ≥ 98%@532nm, the transmittance T ≥ 98%@1064nm, the laser-induced damage
threshold LIDT ≥ 4.5J/cm2 , meet the design requirements, which lays the foundation of achieving laser-induced damage threshold multifunction tester.
Sapphire crystal as a kind of good material has a good transmittance in the ultraviolet, visible, infrared, which was widely used in the high-intensity laser system as the window material. Anti-reflection thin films on sapphire substrate were commonly used in high-energy laser system in the middle infrared bands 3~5μm and these thin films are very easily damaged for high energy laser system. In this paper, we adopt thermal evaporation technique on the sapphire substrate was prepared by design of single layer and multilayer anti-reflection coatings system so that the infrared transmittance satisfy the design requirements. The results of transmittance and laser damage performance tests show that the anti-reflection coating of 3~5μm transmittance is more than 97% on average, Laser-induced damage threshold (LIDT) is more than 5J/cm2 (1064nm), which means that this method could obtain a high-quality laser film.
The optical thin film parts are important components used in the laser systems. In practice, the electromagnetic field generated by the laser will make complex and diverse changes on the films, but the fundamental related with properties changing is not clear. For the purpose of recognizing the variation of TiO2 films irradiated by the laser, TiO2 films were prepared on K9 substrates at the same experimental conditions with the exception that the irradiating laser energy was different to investigate effects about the film’s properties and morphology between the before and after irradiation. The following film’s factors: transmittance, refractive index, extinction coefficient, film thickness and laser-induced damage threshold (LIDT) are included in experimental results, also, morphology and roughness by an Atomic Force Microscope (AFM) and a Taylor Surf CCI 2000 non-contact instrument are needed. The result showed that irradiating laser can decrease TiO2 films’ transmittance and roughness, and increases the films’ refractive index and LIDT. Furthermore, the results indicated that different laser energy cause the different morphology of films.
The determination method of laser damage of thin film and the evaluation method of damage threshold are indispensable for enhancing anti-laser ability of infrared system observation window and its operating performance. A novel method for determining laser damage threshold of thin film is proposed. Firstly, by using the two images that has taken from CCD before and after laser illumination, the method realizes the image matching the damaged image and the undamaged image which is regarded as template image through the control point examination and the affine transformation. Secondly, the damage threshold of thin film is examined through analyzing the average gray level and standard deviation of various regions of the image. Finally, a algorithm based on template image match is established. The research on examining the damage threshold for substrate Si shows that the method, which combine with image match calibration technology, is simple and feasible, and can be used to determinate the damage threshold of thin film.
In order to assisting human vision to identify degree of injury of optical films after laser irradiation , magnified optical
films images are acquired by a CCD camera together with a microscope before and after slotted by pulsed Laser in a real time in experiments. The algorithms to judge the film damage and identify the damage morphologies are designed and texted by MATLAB. The maximum damage diameter and damage area, which are calculated using minimum external rectangle and region filling separately, are compared with state standards on damage criterion of optical film to judge the damage degree. Morphologies characters of 3 typical laser damage mechanisms to optical films are explored. Geometric features and color features parameters of damage pictures were extracted, just like the circularity of the damage area’s edge and rgb average level in the damage areas and the undamaged, through which we could deduce the main damage mechanisms. The experiment shows that the algorithms could judge the film damage and identify the damage morphologies effectively. The algorithms could be improved and used in automatic measurement and test of LIDT of optical films, also in analysis of laser damage mechanism for consideration.
Optical interferometry is a proven high-precision measurement technology, this paper collect interference fringe pattern of the measured film with phase-shift and shear principle based on optical interferometry and digital image processing, obtain multiple interferogram through control phase shifter in the same step to strike the average phase value,then achieve thin film thickness measurement. The kernel of this technology is to obtain necessary phase parameter by processing interferogram with reasonable algorithm and software. Preprocessing the collected image, including noise elimination, skew correction and contrast enhancement to get clear interference fringe pattern, and strike the main phase value through phase shift algorithm. Phase unwrapping the interferogram as for the distribution in a rang of (-π,π) to restore a continuous wave front phase, get surface shape distribution and thickness information of the thin film. The results show that this method of measuring film thickness is not only having high processing precision, but also having the advantages of non-contact measurement.
The laser-induced damage threshold (LIDT) of thin film means that the thin film can withstand a maximum intensity of
laser radiation. The film will be damaged when the irradiation under high laser intensity is greater than the value of
LIDT. In this paper, an experimental platform with measurement operator interfaces and control procedures in the VB
circumstance is built according to ISO11254-1. In order to obtain more accurate results than that with manual
measurement, in the software system, a hardware device can be controlled by control widget on the operator interfaces.
According to the sample characteristic, critical parameters of the LIDT measurement system such as spot diameter,
damage threshold region, and critical damage pixel number are set up on the man-machine conversation interface, which
could realize intelligent measurements of the LIDT. According to experimental data, the LIDT is obtained by fitting
damage curve automatically.
The plasma spectrometry is an emerging method to distinguish the thin-film laser damage. Laser irradiation film surface occurrence of flash, using the spectrometer receives the flash spectrum, extracting the spectral peak, and by means of the spectra of the thin-film materials and the atmosphere has determine the difference, as a standard to determine the film damage. Plasma spectrometry can eliminate the miscarriage of justice which caused by atmospheric flashes, and distinguish high accuracy. Plasma spectra extraction algorithm is the key technology of Plasma spectrometry. Firstly, data de noising and smoothing filter is introduced in this paper, and then during the peak is detecting, the data packet is proposed, and this method can increase the stability and accuracy of the spectral peak recognition. Such algorithm makes simultaneous measurement of Plasma spectrometry to detect thin film laser damage, and greatly improves work efficiency.
Laser induced damage threshold of optical thin films were always a critical parameter. The key technology of testing
damage threshold is determining the incidence of injury accurately. In the present paper, acoustic method is applied to determine thin films damage. Acoustic model of laser-induced thin film has been proposed. The model on the sound waves of thin films damage divides into three stages, which is the thermal expansion stage, the gasification stage and plasma stage. The laser damage optical thin film of sound waves collection system is established. The laser energy is divided into different levels. Acoustic signals under different levels of laser energy are collected. By analyzing and processing of these acoustic signals, we get the sound characteristics of different laser energy; At the same time, damage of films are magnified 100 times, and the sound and thin-film damage is one-on-one mapped. Eventually, we find the acoustic identification basic of damage in thin films. According with the acoustic method of distinguish the film damage, we experiment DLC films. The results are consistent with microscope method. Experiments show that this study of the acoustic method to distinguish the thin films damage is not only feasible, but also reveals the law of thin films damage and acoustic characteristics, and to provide a basis for the acoustic study of thin films damage.
Optical interferometry is the most accurate known method to measurement of the thin film thickness. With phase shifting interferometry (PSI) can achieve fast automatic measurement of the thin film thickness, however, this method requires high-precision phase shifter, such as PZT phase shifter, to the introduction of phase shift. This paper will use Digital Moiré technique to obtain the information of the thin film thickness by processing and analysis a static interferogram. The static interferogram with a certain spatial frequency introduced by the interferometer, then a virtual sinusoidal grating with this spatial frequency is generated in the computer. By changing the initial phase of the sinusoidal grating, π/2 phase shift between adjacent sinusoidal gratings will be made accurately. 4 sinusoidal gratings are obtained in a grating period, then overlapped these 4 sinusoidal gratings on the interferogram to get 4 moiré patterns. Processing and analysis the moiré patterns then the thin film thickness can be obtained by 4-bucket algorithm. In this method, the static interferogram is analyzed with PSI algorithm but there is no need to have phase shifter. The phase shift is introduced mathematically to avoid the associated error.
Interference image processing is the key technology of optical interference measurement. Using high resolution image
sample system to recognize the interference fringe, which substituted the traditional method measured by technological
worker, is improving the measurement accuracy of thin film thickness. This paper introduced the problems on automatic
interference fringe processing in absolutely measurement based on laser interference, digital image processing
technology. The image acquisition of the SiO2 film and the pre-processing of interferogram was performed. Decimal part
of the interference fringes is obtained.
Digital Image Processing has many advantages of large image information, high precision, rich content, complex nonlinear
processing and integrated performance and so on. Application of digital image processing in the film thickness
measurement is deeply researched in this paper and the actual thickness of the SiO2 thin film is detected. In MATLAB
environment, the surface morphology of the tested film was obtained after several image processing to the interferogram
of the thin film sample which is obtained by CCD with high resolution, including reducing the noise, recognizing the
edge, spreading the region, doing two-dimensional Fourier transform and unwrapping the phase. On this basis, the thin
film thickness is obtained through extracting the section in the special place corresponding to the information of the thin
film thickness with certain step length from the 3-D topography and making data processing and analysis. The results
indicate that the thin film thickness used the method in this paper can reach good measurement accuracy with its error
less than 2 nm.
The kernel of modern interferometry is to the obtain necessary surface shape and
parameter by processing interferogram with a reasonable algorithm. On the basis of the study the basic
principle of interferometry by using 2-D FFT arithmetic, a new method to measure the thin film
thickness is proposed based on the FFT algorithm. A test sample is placed into the light path in
Twyman-Green interferometer, the interference fringes were generated by the reference beam with the
tested beam reflected respectively from the film surface and the substrate surface. The interferogram is
collected by the image acquisition system. The algorithm processing software is prepared to realize
identification of the films edge, regional extension, filtering, unwrapping the wrapped phase etc, the
film thickness distribution in whole field can be obtained to realize the thickness measurement of thin
film samples automatically. The results indicate that the new method has the advantages of high
precision, whole test and non-contact measurement.
Measuring the thin film thickness by modern interferometry has advantages of the whole test, high precision and
non-contact measurement, the kernel of which is to obtain necessary surface shape and parameter by processing
interferogram with reasonable algorithms. The pre-treatment of the interferogram is the most crucial and a basal part,
which includes the edge identification of based on Mathematical Morphology, regional extension based on the 2-D FFT
and unwrapped and wrapped phase based on the non-weighted least squares algorithm for DCT. At the result, surface
distribution can be obtained, which lays the groundwork for getting the thin films thickness correctly. In this paper, the
image collection of the SiO2 film and the pretreatment of interferogram is performed. The result indicates that it is
basically consistent to the result tested by Zygo interferometer.
Laser-induced damage threshold of prepared diamond like carbon films(DLC) and HfO2/SiO2 reflective coatings are
detected respectively by He-Ne laser scattered measurement system and plasma spark test method. He-Ne laser scattered
measurement system is to judge the damage of thin films by measuring energy change of He-Ne scattering light on the
same sample spot. Plasma spark testing method is to judge the damage by observing whether plasma spark occurs or not.
Different damage morphology is observed by 1000 multiple microscope. When the laser energy is lower than its damage
threshold, some slight ablition comes about; when the laser energy is stronger than its damage threshold, the abscin of
thin films and the change in fundus' colour are observed. The results are in accordance with the observation on Zygo GPI
interferometer. The two testing methods are compared based on the analysis of the damage morphology. When the
plasma spark occurs, there is no damage on thin films, which shows that there is no definite relationship between the
plasma spark and the degree of damage on thin films. However the judgement of damage made by using He-Ne laser
scattered measurement system is quantitative. This system can judge laser-induced damage effectively.
Thin film plays an important part of an optical system, especially high power laser system. The anti-damage ability is an important index in evaluating their quality. Both diamond-like carbon thin film and HfO2/SiO2 thin film are good optical thin films. In this paper their laser damage properties have been tested according to ISO11254. The results of damage threshold of coatings are shown as follows: Compared to HfO2/SiO2 thin film system with a laser damage threshold of 3.0~7.4 J /cm2, the DLC film threshold is only 0.6 J/cm2, which is the result of strong absorption of DLC films to laser energy. And also we can conclude from the results that the damage of film is derived from defect-induced damage, but the damage mechanisms are different. The DLC thin film damage results from heat-stress while HfO2/SiO2 thin films' damage results from plasma ablation. Besides, the substrate of film, the films' structure and deposition methods are also important to film damage threshold. Under the same condition, the threshold of the film on Si substrate is lower than those on K9 glass; with the same substrate, the film threshold is dependent of film thickness. As for deposition methods, films deposited by using ion-assisted method have higher threshold than those without using ion-assisted method.
Diamond-like carbon films (DLC) have been widely used in the fields of optics, mechanics and materials science due to the high optical transparency, high mechanical hardness and excellent chemical inertness. On the other hand, the laser-induced damage threshold of DLC films, which are used for infrared antireflection protection coatings, is an important index to evaluate the quality of film. However, the films prepared by various processes have different laser-induced damage threshold. Therefore, it is necessary to investigate the damage properties of DLC films under different deposition conditions.
Unbalanced magnetron sputtering (UBMS), on the other hand, combines the advantages of conventional magnetron sputtering (MS) and ion beam assistant deposition. Applying this technique, it is promising to prepare hydrogen-free carbon films with excellent characteristics by physical vapor deposition method.
In this paper described an UBMS system in details. Hydrogen-free DLC films were prepared by this system under various processes arranged according to the orthogonal experiments method. The laser-induced damage threshold of DLC films were investigated by using a 1064 nm pulsed laser at a pulse width of 12 ns following ISO standard 11254. The results indicated that the damage threshold of the DLC films is about 0.2-0.7 J/cm2. It was found that the target current is the most important factor which affects the threshold of DLC films based on orthogonal experiments, compared with other experiment parameters such as argon gas flow rate, substrate bias and excitation current. A optimization process was obtained in this study at a mass flow of 200 sccm, excitation current of 120 A, bias of about -30 ~ -80 V and target current of 8 A. The higher damage threshold of 0.7 J/cm2 was achieved by depositing DLC film under the optimization process.
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