Junhwa Jung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 17 November 2016 Paper
Proceedings Volume 9985, 99851S (2016) https://doi.org/10.1117/12.2242406
KEYWORDS: Photomasks, Etching, Plasma, Chromium, Argon, Dry etching, Chlorine, Emission spectroscopy, Critical dimension metrology, Plasma etching

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top