Ms. Karin Prater Profile

Karin Prater

at EPFL

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 27 April 2016 Paper

Precision glass molding of high-resolution diffractive optical elements

Karin Prater, Julia Dukwen, Toralf Scharf, Hans Herzig, Sven Plöger, Andreas Hermerschmidt

Proceedings Volume 9888, 98880U (2016) https://doi.org/10.1117/12.2228873

KEYWORDS: Glasses, Carbon, Precision glass molding, Diffractive optical elements, Photomasks, Lithography, Micro optics, Fabrication, Electron beam lithography, Reactive ion etching, Optical resolution, Integrated optics, Etching, Silicon, Beam splitters, Scanning electron microscopy, Diffraction, Silica

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Proceedings Article | 24 September 2015 Paper

Multilevel micro-structuring of glassy carbon molds for precision glass molding

Karin Prater, Julia Dukwen, Toralf Scharf, Hans Peter Herzig, Sven Plöger, Andreas Hermerschmidt

Proceedings Volume 9628, 96281M (2015) https://doi.org/10.1117/12.2191661

KEYWORDS: Glasses, Etching, Precision glass molding, Beam splitters, Diffractive optical elements, Silicon, Carbon, Optical fabrication, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 13 March 2015 Paper

Multilevel micro-structuring of glassy carbon for precision glass molding of diffractive optical elements

Karin Prater, Julia Dukwen, Toralf Scharf, Hans Peter Herzig, Sven Plöger, Andreas Hermerschmidt

Proceedings Volume 9374, 937410 (2015) https://doi.org/10.1117/12.2080762

KEYWORDS: Glasses, Etching, Diffractive optical elements, Precision glass molding, Titanium, Silica, Carbon, Photomasks, Power meters, Reactive ion etching

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Proceedings Article | 25 September 2014 Paper

Surface micro-structuring of glassy carbon for precision glass molding of diffractive optical elements

Karin Prater, Julia Dukwen, Toralf Scharf, Hans Peter Herzig, Andreas Hermerschmidt

Proceedings Volume 9192, 919211 (2014) https://doi.org/10.1117/12.2062904

KEYWORDS: Glasses, Etching, Titanium, Carbon, Diffractive optical elements, Reactive ion etching, Glass molding, Photomasks, Silica, Precision glass molding

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Proceedings Article | 7 March 2014 Paper

Wafer-level microstructuring of glassy carbon

Loïc Hans, Karin Prater, Cédric Kilchoer, Toralf Scharf, Hans Peter Herzig, Andreas Hermerschmidt

Proceedings Volume 8974, 89740Y (2014) https://doi.org/10.1117/12.2038396

KEYWORDS: Etching, Carbon, Titanium, Aluminum, Reactive ion etching, Photomasks, Photoresist materials, Semiconducting wafers, Glasses, Optical lithography

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