Mr. Katsumi Sugisaki Profile

Katsumi Sugisaki

at Nikon Corp

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 21 March 2008 Paper

EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe

Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624

KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

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Proceedings Article | 24 March 2006 Paper

EUV wavefront metrology at EUVA

Chidane Ouchi, Seima Kato, Masanobu Hasegawa, Takayuki Hasegawa, Hideo Yokota, Katsumi Sugisaki, Masashi Okada, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 6152, 61522O (2006) https://doi.org/10.1117/12.656039

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Diffraction, EUV optics, Projection systems, Extreme ultraviolet lithography, Diffraction gratings, CCD cameras, Mirrors

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Proceedings Article | 17 September 2005 Paper

Comparisons between EUV at-wavelength metrological methods

Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

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Proceedings Article | 10 May 2005 Paper

Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqian Liu, Mikihiko Ishii, Jun Kawakami, Jun Saito, Katsuhiko Murakami, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Masahito Niibe

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

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Proceedings Article | 10 May 2005 Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Zhiqiang Liu, Masashi Okada, Katsumi Sugisaki, Mikihiko Ishii, Yucong Zhu, Katsura Ohtaki, Jun Saito, Akiyoshi Suzuki, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Masahito Niibe, Katsuhiko Murakami

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456

KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV interferometry methods in EUVA project

Seima Kato, Chidane Ouchi, Masanobu Hasegawa, Akiyoshi Suzuki, Takayuki Hasegawa, Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468

KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

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Proceedings Article | 6 May 2005 Paper

Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)

H. Oizumi, Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, K. Murakami

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599435

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Projection systems, Mirrors, Lithographic illumination, Light sources, Printing, Extreme ultraviolet, Spherical lenses

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Proceedings Article | 18 October 2004 Paper

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Chidane Ouchi, Takayuki Hasegawa, Seima Kato, Akinori Ohkubo, Akiyoshi Suzuki, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

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Proceedings Article | 20 May 2004 Paper

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Katsumi Sugisaki, Masanobu Hasegawa, Seima Kato, Chidane Ouchi, Jun Saito, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344

KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

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Proceedings Article | 20 May 2004 Paper

EUV wavefront metrology system in EUVA

Takayuki Hasegawa, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Akiyoshi Suzuki, Katsumi Sugisaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

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Proceedings Article | 20 May 2004 Paper

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Yucong Zhu, Katsumi Sugisaki, Chidane Ouchi, Masanobu Hasegawa, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331

KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

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Proceedings Article | 16 June 2003 Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Tetsuya Oshino, Masayuki Shiraishi, Noriaki Kandaka, Katsumi Sugisaki, Hiroyuki Kondo, Kazuya Ota, K. Mashima, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

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Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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Proceedings Article | 24 December 2002 Paper

Development of EUV point diffraction interferometry using the NewSUBARU undulator radiation

Masahito Niibe, Mikihito Mukai, Takeshi Tanaka, Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei

Proceedings Volume 4782, (2002) https://doi.org/10.1117/12.451354

KEYWORDS: Monochromators, Mirrors, Optical testing, Photons, Extreme ultraviolet, Diffraction, Diffraction gratings, EUV optics, Interferometry, Charge-coupled devices

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Proceedings Article | 1 July 2002 Paper

ASET development of at-wavelength phase-shifting point diffraction interferometer

Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472344

KEYWORDS: Wavefronts, Optical testing, Mirrors, Extreme ultraviolet, Photomasks, Visible radiation, Monochromatic aberrations, Phase shifts, Point diffraction interferometers, Diffraction

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Proceedings Article | 20 December 2001 Paper

Current status of ASET-HIT EUV phase-shifting point diffraction interferometer

Yoshio Gomei, Katsumi Sugisaki, Yucong Zhu, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450962

KEYWORDS: Extreme ultraviolet, Diffraction gratings, Diffraction, Phase shifts, Mirrors, Fringe analysis, CCD cameras, Point diffraction interferometers, Optical testing, Tantalum

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Proceedings Article | 20 August 2001 Paper

Feasibility study of EUV scanners

Kazuya Ota, Katsuhiko Murakami, Hiroyuki Kondo, Tetsuya Oshino, Katsumi Sugisaki, Hideki Komatsuda

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436704

KEYWORDS: Semiconducting wafers, Scanners, Mirrors, Reticles, Extreme ultraviolet lithography, Optical alignment, Sensors, Projection systems, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 20 August 2001 Paper

Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source

Noriaki Kandaka, Hiroyuki Kondo, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436714

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Carbon dioxide lasers, Reflectometry, Multilayers, Carbon dioxide, Interfaces, Plasma, Beryllium

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Proceedings Article | 8 November 2000 Paper

Present status of the ASET at-wavelength phase-shifting point diffraction interferometer

Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406675

KEYWORDS: Visible radiation, Extreme ultraviolet, Mirrors, Wavefronts, Interferometers, Information technology, Interferometry, Point diffraction interferometers, Phase shifts, Optical testing

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Proceedings Article | 2 November 2000 Paper

Development of an EUV reflectometer using a laser plasma x-ray source

Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4144, (2000) https://doi.org/10.1117/12.405906

KEYWORDS: Reflectometry, Mirrors, Reflectivity, X-rays, X-ray sources, Plasma, Carbon dioxide, Multilayers, Extreme ultraviolet, Carbon dioxide lasers

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Proceedings Article | 21 July 2000 Paper

Development for the alignment procedure of three-aspherical mirror optics

Shigeo Irie, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390122

KEYWORDS: Mirrors, Alignment procedures, NOx, Tolerancing, Extreme ultraviolet lithography, Optical alignment, Interferometers, Ray tracing, Monochromatic aberrations, Geometrical optics

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Proceedings Article | 21 July 2000 Paper

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Shigeo Irie, Shigeru Shirayone

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390114

KEYWORDS: Mirrors, Optical alignment, Extreme ultraviolet, Projection systems, Extreme ultraviolet lithography, Wavefronts, Tolerancing, Assembly tolerances, Monochromatic aberrations, Multilayers

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Proceedings Article | 21 July 2000 Paper

Recent advances of three-aspherical-mirror system for EUVL

Hiroo Kinoshita, Takeo Watanabe, Yanqiu Li, Atsushi Miyafuji, Tetsuya Oshino, Katsumi Sugisaki, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

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Proceedings Article | 20 October 1992 Paper

Fabrication of Wolter type I mirror for soft x-ray

Tetsuji Onuki, Katsumi Sugisaki, Sadao Aoki

Proceedings Volume 1720, (1992) https://doi.org/10.1117/12.132133

KEYWORDS: Mirrors, Polishing, X-rays, Glasses, X-ray imaging, Surface roughness, X-ray optics, Surface finishing, Platinum, Spindles

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Showing 5 of 24 publications

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