CONFERENCE PROCEEDINGS
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Kazumasa Takeshi
Semiconductor Research Lab at Toppan Printing Co Ltd
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Publications (4)
Proceedings Article | 20 May 2006 Paper
Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold-making as studied by dissolution rate monitor
Kazumasa Takeshi, Kazuto Oono, Yoshiyuki Negishi, Daisuke Inokuchi, Keishi Tanaka, Akira Tamura
Proceedings Volume 6283, 62831Z (2006) https://doi.org/10.1117/12.681763
KEYWORDS: Nanoimprint lithography, Polymers, Semiconducting wafers, Chemically amplified resists, Lithography, Vestigial sideband modulation, Photoresist processing, Quartz, Crystals, Mask making
Proceedings Article | 28 June 2005 Paper
Development of positive-tone chemically amplified resist for LEEPL mask making
Yoshiyuki Negishi, Kazumasa Takeshi, Takashi Yoshii, Keishi Tanaka, Yasuhiro Okumoto
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617283
KEYWORDS: Charged-particle lithography, Mask making, Vestigial sideband modulation, Photomasks, Chemically amplified resists, Diffusion, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Semiconductors
Proceedings Article | 6 December 2004 Paper
Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II
Kazumasa Takeshi, Masahito Tanabe, Daisuke Inokuchi, Yuichi Fukushima, Yasuhiro Okumoto, Yoshimitsu Okuda
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569516
KEYWORDS: Polymers, Chromium, Chemically amplified resists, Mask making, Lithography, Coating, Structural design, Chemical analysis, Fluorine, Printing
Proceedings Article | 20 August 2004 Paper
Chemical characteristics of negative-tone chemically amplified resist for advanced mask making
Kazumasa Takeshi, Naoko Ito, Daisuke Inokuchi, Yasushi Nishiyama, Yuichi Fukushima, Yasuhiro Okumoto
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557692
KEYWORDS: Polymers, Chromium, Lithography, Photomasks, Chemical analysis, Chemically amplified resists, Mask making, Critical dimension metrology, Optical lithography, Semiconductors
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