Mr. Kazuyuki Yoshimochi Profile

Kazuyuki Yoshimochi

at Huawei Technologies Japan K.K.

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Author

Publications (8)

Proceedings Article | 20 April 2011 Paper

CD uniformity improvement of through-pitch contact-hole patterning for advanced logic devices

Takaaki Kuribayashi, Yoshinori Matsui, Kazuyuki Yoshimochi, Seiji Nagahara, Takayuki Uchiyama

Proceedings Volume 7971, 79711P (2011) https://doi.org/10.1117/12.879589

KEYWORDS: Etching, Lithography, Critical dimension metrology, Semiconducting wafers, Logic devices, Spatial resolution, Cadmium, Optical lithography, Resistance, Process control

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Proceedings Article | 29 September 2010 Paper

SMO mask requirements for low k1 lithography

Seiji Nagahara, Kazuyoshi Kawahara, Hiroshi Yamazaki, Akihiko Ando, Masayuki Naganuma, Kazuyuki Yoshimochi, Takayuki Uchiyama, Ken Nakashima, Hidemichi Imai, Katsuya Hayano, Hidekazu Migita, Eiji Tsujimoto

Proceedings Volume 7823, 782310 (2010) https://doi.org/10.1117/12.864317

KEYWORDS: Photomasks, SRAF, Critical dimension metrology, Inspection, Lithography, Remote sensing, Semiconducting wafers, Source mask optimization, Error analysis, Data modeling

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Proceedings Article | 13 March 2010 Paper

SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance

Seiji Nagahara, Kazuyuki Yoshimochi, Hiroshi Yamazaki, Kazuhiro Takeda, Takayuki Uchiyama, Stephen Hsu, Zhipan Li, Hua-yu Liu, Keith Gronlund, Terunobu Kurosawa, Jun Ye, Luoqi Chen, Hong Chen, Zheng Li, Xiaofeng Liu, Wei Liu

Proceedings Volume 7640, 76401H (2010) https://doi.org/10.1117/12.846473

KEYWORDS: SRAF, Source mask optimization, Photomasks, Metals, Diffractive optical elements, Lithography, Manufacturing, Electroluminescence, Fiber optic illuminators, Logic devices

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Proceedings Article | 10 March 2010 Paper

Challenges for low-k1 lithography in logic devices by source mask co-optimization

Kazuyuki Yoshimochi, Seiji Nagahara, Kazuhiro Takeda, Takayuki Uchiyama

Proceedings Volume 7640, 76401K (2010) https://doi.org/10.1117/12.846263

KEYWORDS: Source mask optimization, SRAF, Photomasks, Scanners, Molybdenum, Binary data, Scanning electron microscopy, Logic devices, Image processing, Calibration

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Proceedings Article | 16 March 2009 Paper

32nm node device laser-bandwidth OPE sensitivity and process matching

Kazuyuki Yoshimochi, Takao Tamura, Takaaki Kuribayashi, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, James Bonafede

Proceedings Volume 7274, 72742Q (2009) https://doi.org/10.1117/12.813987

KEYWORDS: SRAF, Logic devices, Critical dimension metrology, Optical simulations, Laser stabilization, Light sources, Combined lens-mirror systems, Computer simulations, Laser cutting, Tolerancing

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Proceedings Article | 11 April 2008 Paper

45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

Kazuyuki Yoshimochi, Takao Tamura, Seiji Nagahara, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, James Bonafede

Proceedings Volume 6924, 69242K (2008) https://doi.org/10.1117/12.771628

KEYWORDS: Critical dimension metrology, Laser stabilization, Optical simulations, Nanoimprint lithography, Logic devices, Beam controllers, Chromatic aberrations, Lens design, Laser cutting, Light sources

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Proceedings Article | 26 March 2007 Paper

Benefit of ArF immersion lithography in 55 nm logic device manufacturing

Takayuki Uchiyama, Takao Tamura, Kazuyuki Yoshimochi, Paul Graupner, Hans Bakker, Eelco van Setten, Kenji Morisaki

Proceedings Volume 6520, 652009 (2007) https://doi.org/10.1117/12.711054

KEYWORDS: Immersion lithography, Logic devices, Semiconducting wafers, Lithography, Overlay metrology, Monochromatic aberrations, Lithographic illumination, Scanners, Manufacturing, Electronics

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Proceedings Article | 26 March 2007 Paper

Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node

Kazuyuki Yoshimochi, Takayuki Uchiyama, Takao Tamura, Thomas Theeuwes, Rudy Peeters, Hans van der Laan, Hans Bakker, Kenji Morisaki, Toshihiro Oga

Proceedings Volume 6520, 652011 (2007) https://doi.org/10.1117/12.711052

KEYWORDS: Critical dimension metrology, Light sources, Optical simulations, Laser stabilization, Optical proximity correction, Logic devices, Optics manufacturing, Laser applications, Composites, Electronics

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Showing 5 of 8 publications

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