CONFERENCE PROCEEDINGS
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Dr. Kelly A. Nowak
Research Associate III at Brewer Science Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 12 June 2003 Paper
Void elimination research in bottom antireflective coatings for dual damascene photolithography
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483737
KEYWORDS: Etching, Optical lithography, Coating, Metals, Bottom antireflective coatings, Scanning electron microscopy, Polymers, Chemical mechanical planarization, Liquids, Dielectrophoresis
Proceedings Article | 24 August 2001 Paper
Novel conformal organic antireflective coatings for advanced I-line lithography
Shreeram Deshpande, Kelly Nowak, Shelly Fowler, Paul Williams, Mikko Arjona
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436919
KEYWORDS: Photoresist materials, Etching, Semiconducting wafers, Manufacturing, Lithography, Semiconductors, Absorbance, Optical lithography, Polymers, Scanning electron microscopy
Proceedings Article | 26 April 2001 Paper
Sub-0.35-um i-line lithography with new advanced bottom antireflective coatings optimized for high-topography and dual-damascene applications
Shreeram Deshpande, Nickolas Brakensiek, Paul Williams, Kelly Nowak, Shelly Fowler
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425227
KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Lithography, Polymers, Reflectivity, Manufacturing, Scanning electron microscopy, Copper, Semiconductors
Proceedings Article | 11 June 1999 Paper
Recent progress in 193-nm antireflective coatings
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350269
KEYWORDS: Photoresist materials, Etching, Plasma etching, Polymers, Absorbance, Reflectivity, Plasma, Chemistry, Data modeling, Silicon
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