CONFERENCE PROCEEDINGS
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Kenichi Kanai
at ASML
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 2 April 2010 Paper
After development inspection defectivity studies of an advanced memory device
Hyung-Seop Kim, Byoung-Ho Lee, Eric Ma, Fei Wang, Yan Zhao, Kenichi Kanai, Hong Xiao, Jack Jau
Proceedings Volume 7638, 76380L (2010) https://doi.org/10.1117/12.848066
KEYWORDS: Inspection, Critical dimension metrology, Reticles, Optical inspection, Semiconducting wafers, Defect inspection, Bridges, Wafer inspection, Finite element methods, Optical lithography
Proceedings Article | 11 December 2009 Paper
After development inspection (ADI) studies of photo resist defectivity of an advanced memory device
Hyung-Seop Kim, Yong Min Cho, Byoung-Ho Lee, Roland Yeh, Eric Ma, Fei Wang, Yan Zhao, Kenichi Kanai, Hong Xiao, Jack Jau
Proceedings Volume 7520, 75200J (2009) https://doi.org/10.1117/12.837103
KEYWORDS: Inspection, Reticles, Semiconducting wafers, Optical inspection, Bridges, Wafer inspection, Defect inspection, Finite element methods, Scanning electron microscopy, Optical lithography
Proceedings Article | 4 December 2008 Paper
Electron beam charging of a SiO2 layer on Si: a comparison between Monte Carlo-simulated and experimental results
Kensuke Inai, Kaoru Ohya, Hideaki Kuwada, Ryosuke Kawasaki, Misako Saito, Kaoru Fujihara, Teruyuki Hayashi, Jack Jau, Kenichi Kanai
Proceedings Volume 7140, 71400X (2008) https://doi.org/10.1117/12.804461
KEYWORDS: Silica, Silicon, Selenium, Scanning electron microscopy, Monte Carlo methods, Defect inspection, Electron beams, Electron transport, Particles, Defect detection
Proceedings Article | 15 October 2001 Paper
Open loop method for waveform acquisition on electron-beam probe systems
Hui Wang, Hiroyasu Koike, Masayoshi Ikeda, Kenichi Kanai
Proceedings Volume 4600, (2001) https://doi.org/10.1117/12.444668
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