Prof. Kevin T. Turner Profile

Prof. Kevin T. Turner

Assistant Professor at Univ of Pennsylvania

SPIE Involvement:

Author

Publications (20)

SPIE Journal Paper | 31 March 2016

Models to relate wafer geometry measurements to in-plane distortion of wafers

Kevin Turner, Pradeep Vukkadala, Jaydeep Sinha

JM3, Vol. 15, Issue 02, 021404, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021404

KEYWORDS: Semiconducting wafers, Distortion, Optical lithography, Etching, Overlay metrology, Mechanics, Error analysis, Lithography, Shape analysis, Image registration

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Effect of wafer geometry on lithography chucking processes

Kevin Turner, Jaydeep Sinha

Proceedings Volume 9424, 94240L (2015) https://doi.org/10.1117/12.2085693

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Mechanics, Neodymium, Spatial frequencies, Scanners, Etching, Shape analysis, Rhodium

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Monitoring process-induced overlay errors through high-resolution wafer geometry measurements

K. Turner, P. Vukkadala, S. Veeraraghavan, J. Sinha

Proceedings Volume 9050, 905013 (2014) https://doi.org/10.1117/12.2046340

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical lithography, Mechanics, Shape analysis, Etching, Finite element methods, Scanners, Thin films, Metrology

Read Abstract +

SPIE Journal Paper | 22 May 2013 Open Access

Role of wafer geometry in wafer chucking

Kevin Turner, Roshita Ramkhalawon, Jaydeep Sinha

JM3, Vol. 12, Issue 02, 023007, (May 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.023007

KEYWORDS: Semiconducting wafers, 3D modeling, Finite element methods, Chemical elements, Lithography, Extreme ultraviolet lithography, Interfaces, Mechanics, Shape analysis, Scanners

Read Abstract +

DOWNLOAD PAPER

SPIE Journal Paper | 21 March 2012

Relationship between localized wafer shape changes induced by residual stress and overlay errors

Kevin Turner, Sathish Veeraraghavan, Jaydeep Sinha

JM3, Vol. 11, Issue 1, 013001, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013001

KEYWORDS: Semiconducting wafers, Distortion, Overlay metrology, Lithography, Optical lithography, Scanners, Thin films, Finite element methods, Thin film deposition, Error analysis

Read Abstract +

Proceedings Article | 20 April 2011 Paper

Simulation of non-uniform wafer geometry and thin film residual stress on overlay errors

Sathish Veeraraghaven, Kevin Turner, Jaydeep Sinha

Proceedings Volume 7971, 79711U (2011) https://doi.org/10.1117/12.879493

KEYWORDS: Semiconducting wafers, Overlay metrology, Thin films, Lithography, Optical lithography, Mechanics, Error analysis, Semiconductor manufacturing, Metrology, Edge roughness

Read Abstract +

Proceedings Article | 24 August 2010 Paper

Assessment of the mechanical integrity of silicon and diamond-like-carbon coated silicon atomic force microscope probes

Jingjing Liu, David Grierson, Kumar Sridharan, Robert Carpick, Kevin Turner

Proceedings Volume 7767, 776708 (2010) https://doi.org/10.1117/12.861789

KEYWORDS: Silicon, Atomic force microscopy, Transmission electron microscopy, Adhesives, Image resolution, Spatial frequencies, Atomic force microscope, Coating, Plasma, Silicon carbide

Read Abstract +

SPIE Journal Paper | 1 October 2009

Predicting distortions and overlay errors due to wafer deformation during chucking on lithography scanners

Kevin Turner, Sathish Veeraraghavan, Jaydeep Sinha

JM3, Vol. 8, Issue 04, 043015, (October 2009) https://doi.org/10.1117/12.10.1117/1.3247857

KEYWORDS: Semiconducting wafers, Optical lithography, Lithography, Overlay metrology, Scanners, Shape analysis, Data modeling, Finite element methods, Error analysis, Chemical elements

Read Abstract +

Proceedings Article | 2 May 2008 Paper

Status of EUVL reticle chucking

Roxann Engelstad, Jaewoong Sohn, Jacob Zeuske, Venkata Siva Battula, Pradeep Vukkadala, Chris Van Peski, Kevin Orvek, Kevin Turner, Andrew Mikkelson, Madhura Nataraju

Proceedings Volume 6792, 67920X (2008) https://doi.org/10.1117/12.798937

KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

Read Abstract +

Proceedings Article | 16 November 2007 Paper

Techniques to measure force uniformity of electrostatic chucks for EUV mask clamping

Sathish Veeraraghavan, Jaewoong Sohn, Kevin Turner

Proceedings Volume 6730, 67305G (2007) https://doi.org/10.1117/12.746843

KEYWORDS: Semiconducting wafers, Photomasks, 3D modeling, Extreme ultraviolet lithography, Distortion, Finite element methods, Dielectrics, Silicon, Particles, Interfaces

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks

Roxann Engelstad, Kevin Turner, Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Venkata Siva Battula, Pradeep Vukkadala, Jacob Zeuske, Chris Van Peski

Proceedings Volume 6730, 673014 (2007) https://doi.org/10.1117/12.746842

KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

Read Abstract +

Proceedings Article | 24 October 2007 Paper

Compensating for image placement errors induced during the fabrication and chucking of EUVL masks

Roxann Engelstad, Jaewoong Sohn, Andrew Mikkelson, Madhura Nataraju, Kevin Turner

Proceedings Volume 6730, 673004 (2007) https://doi.org/10.1117/12.752601

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Distortion, Electron beam lithography, 3D modeling, Etching, Interferometry, Surface finishing, Thin films

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Predicting and correcting for image placement errors during the fabrication of EUVL masks

R. Engelstad, J. Sohn, A. Mikkelson, M. Nataraju, K. Turner

Proceedings Volume 6533, 653314 (2007) https://doi.org/10.1117/12.737181

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Distortion, Reticles, 3D modeling, Etching, Electron beam lithography, Surface finishing, Thin films, Multilayers

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Simulating droplet dynamics during evaporation-driven self-assembly

John Dyreby, Kevin Turner, Gregory Nellis

Proceedings Volume 6517, 651738 (2007) https://doi.org/10.1117/12.720620

KEYWORDS: Particles, 3D modeling, Capillaries, Computer simulations, Computational fluid dynamics, Performance modeling, Spherical lenses, Temperature metrology, Process modeling, Nanoparticles

Read Abstract +

Proceedings Article | 15 March 2007 Paper

Electrostatic chucking of EUVL reticles

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Roxann Engelstad, Kevin Turner, Chris Van Peski, Kevin Orvek

Proceedings Volume 6517, 65170Y (2007) https://doi.org/10.1117/12.720621

KEYWORDS: Reticles, Extreme ultraviolet lithography, Standards development, Photomasks, Interferometers, Photography, Dielectrics, Finite element methods, Coating, Interferometry

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 634939 (2006) https://doi.org/10.1117/12.686153

KEYWORDS: Reticles, Data modeling, Photomasks, Extreme ultraviolet lithography, Interferometers, Standards development, Finite element methods, Photography, Vibration isolation, Particles

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Measuring force uniformity in electrostatic chucking of EUVL masks

Jaewoong Sohn, Sathish Veerarghavan, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 63493B (2006) https://doi.org/10.1117/12.686282

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Particles, Analytical research, Dielectrics, Interferometry, Data modeling, Finite element methods, Fourier transforms

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Predicting the influence of trapped particles on EUVL reticle distortion during exposure chucking

Vasu Ramaswamy, Kevin Turner, Roxann Engelstad, Edward Lovell

Proceedings Volume 6349, 634938 (2006) https://doi.org/10.1117/12.686145

KEYWORDS: Particles, Reticles, Dielectrics, Extreme ultraviolet lithography, Distortion, Particle systems, Photomasks, Data modeling, Glasses, Semiconducting wafers

Read Abstract +

Proceedings Article | 22 March 2006 Paper

EUV mask and chuck analysis: simulation and experimentation

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6151, 61510C (2006) https://doi.org/10.1117/12.657154

KEYWORDS: Photomasks, Extreme ultraviolet, Data modeling, Focus stacking software, Lithography, Semiconductors, Extreme ultraviolet lithography, Standards development, Interferometers, Contamination

Read Abstract +

Proceedings Article | 1 April 1991 Paper

Microstructures and domain size effects in diamond films characterized by Raman spectroscopy

Robert Nemanich, Larry Bergman, Yvonne LeGrice, Kevin Turner, T. Humphreys

Proceedings Volume 1437, (1991) https://doi.org/10.1117/12.45125

KEYWORDS: Diamond, Raman spectroscopy, Raman scattering, Crystals, Silicon, Microcrystalline materials, Scattering, Phonons, Materials science, Scanning tunneling microscopy

Read Abstract +