Mr. Konrad Knapp Profile

Konrad Knapp

Business Segment Manager at Linde AG

SPIE Involvement:

Author

Publications (29)

Proceedings Article | 15 May 2007 Paper

Dry etch behavior of different TaN absorber layers for EUVL mask making

Florian Letzkus, Günter Hess, Mathias Irmscher, Konrad Knapp, Markus Renno, Eugen Röhrle, Holger Seitz

Proceedings Volume 6607, 66073D (2007) https://doi.org/10.1117/12.729032

KEYWORDS: Etching, Dry etching, Extreme ultraviolet lithography, Reflectivity, Photomasks, Inspection, Scanning electron microscopy, Mask making, Electron beam lithography, Manufacturing

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Proceedings Article | 26 March 2007 Paper

Investigations regarding the prevention of depolarization of ArF excimer laser irradiation by CaF₂ laser optics

Ute Natura, Dietmar Keutel, Martin Letz, Lutz Parthier, Konrad Knapp

Proceedings Volume 6520, 652030 (2007) https://doi.org/10.1117/12.712108

KEYWORDS: Polarization, Crystals, Temperature metrology, Laser crystals, Excimer lasers, Laser optics, Birefringence, Calcium, Laser irradiation, Optical properties

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Proceedings Article | 4 November 2005 Paper

Antireflection solutions for next generation 193-nm binary and phase-shifting masks

Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess

Proceedings Volume 5992, 59920I (2005) https://doi.org/10.1117/12.632113

KEYWORDS: Reflection, Antireflective coatings, Photomasks, Binary data, Inspection, Phase shifts, Interfaces, Etching, Lithography, Opacity

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Proceedings Article | 5 October 2005 Paper

Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning

Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess

Proceedings Volume 5963, 59630J (2005) https://doi.org/10.1117/12.625210

KEYWORDS: Inspection, Etching, Phase shifts, Photomasks, Tantalum, Dry etching, Lithography, Phase shifting, Reflection, Oxides

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Proceedings Article | 16 June 2005 Paper

Production challenges of making EUV mask blanks

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Gunter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637335

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

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Proceedings Article | 6 May 2005 Paper

Recent results on EUV mask blank multilayers and absorbers

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Guenter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600538

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Reflectivity, Etching, Dry etching, Metrology, CCD cameras, Inspection

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Proceedings Article | 21 February 2005 Paper

Analysis of laser durability of CaF2 for optical lithography

Guenter Grabosch, Lutz Parthier, Ute Natura, Karin Poehl, Martin Letz, Christian Muehlig, Konrad Knapp

Proceedings Volume 5647, (2005) https://doi.org/10.1117/12.585247

KEYWORDS: Optical lithography, Silver, Lithography, Semiconductors, Semiconductor lasers, Laser applications, Lenses, Immersion lithography, Laser induced damage, Biological research

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Proceedings Article | 6 December 2004 Paper

Absorber stack optimization toward EUV lithography mask blank pilot production

Frank Sobel, Lutz Aschke, Markus Renno, Holger Seitz, Hans Becker, Nathalie Olschewski, Torsten Reichardt, Guenter Hess, Ute Buttgereit, Konrad Knapp, Florian Letzkus, Joerg Butschke, Corinna Koepernik

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568787

KEYWORDS: Coating, Reflectivity, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Dry etching, Inspection, Manufacturing, Multilayers

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Proceedings Article | 6 December 2004 Paper

New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM

Hans Becker, Pascal Schley, Frank Schmidt, Frank Sobel, Markus Renno, Nathalie Olschewski, Holger Seitz, Ute Buttgereit, Konrad Knapp, Guenter Hess

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570217

KEYWORDS: Inspection, Etching, Tantalum, Phase shifts, Dry etching, Lithography, Oxides, Silica, Reflection, Mask cleaning

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SPIE Journal Paper | 1 October 2004

Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm

Martin Letz, Konrad Knapp

JM3, Vol. 3, Issue 04, (October 2004) https://doi.org/10.1117/12.10.1117/1.1794179

KEYWORDS: Scattering, Light scattering, Liquids, Polarizability, Polarization, Raman scattering, Molecules, Immersion lithography, Rayleigh scattering, Microfluidics

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Proceedings Article | 20 August 2004 Paper

Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography

Hans Becker, Frank Schmidt, Frank Sobel, Markus Renno, Ute Buttgereit, Jay Chey, Marie Angelopoulos, Konrad Knapp, Gunter Hess

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557798

KEYWORDS: Particles, Phase shifts, Silica, Lithography, Etching, Photomasks, Tantalum, Surface roughness, Scanning electron microscopy, Deposition processes

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Proceedings Article | 2 June 2004 Paper

Production challenges of making an EUV mask blank

Lutz Aschke, Hans Becker, Falk Friemel, Thomas Leutbecher, Nathalie Olschewski, Markus Renno, Frauke Rueggeberg, Mario Schiffler, Frank Schmidt, Frank Sobel, Kurt Walter, Guenter Hess, Frank Lenzen, Konrad Knapp, Jochen Alkemper, Hrabanus Hack, Klaus Megges, Ina Mitra, Rolf Mueller, Uwe Nolte, Joerg Schumacher, Wolfgang Pannhorst

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568007

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Zerodur, Reflectivity, Polishing, Temperature metrology, Surface finishing, Glasses

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Proceedings Article | 28 May 2004 Paper

Strong improvement of critical parameters of CaF2 lens blanks for 193-nm and 157-nm lithography

Guenter Grabosch, Lutz Parthier, Peter Kruell, Konrad Knapp

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536310

KEYWORDS: Annealing, Crystals, Lens blanks, Refractive index, Lithography, Wavefronts, Photovoltaics, 193nm lithography, Birefringence, Quantitative analysis

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Proceedings Article | 28 May 2004 Paper

Liquid immersion lithography: microscopic polarizabilities and the role of orientation contributions to light scattering

Martin Letz, Konrad Knapp

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.547886

KEYWORDS: Scattering, Light scattering, Polarizability, Molecules, Raman scattering, Liquids, Microfluidics, Polarization, Water, Immersion lithography

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Proceedings Article | 28 May 2004 Paper

CaF2 for DUV lens fabrication: basic material properties and dynamic light-matter interaction

Martin Letz, Axel Engel, Wolfgang Mannstadt, Lutz Parthier, Ute Natura, Konrad Knapp

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536666

KEYWORDS: Ions, Crystals, Absorption, Deep ultraviolet, Distortion, Electron holes, Optical properties, Chemical species, Glasses, Temperature metrology

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Proceedings Article | 20 May 2004 Paper

Optimized glass-ceramic substrate materials for EUVL applications

Ina Mitra, Jochen Alkemper, Rolf Mueller, Uwe Nolte, Axel Engel, Hrabanus Hack, Heiko Kohlmann, Volker Wittmer, Wolfgang Pannhorst, Mark Davis, Lutz Aschke, Konrad Knapp

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535193

KEYWORDS: Zerodur, Surface roughness, Temperature metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Glasses, Metrology, Surface finishing, Refractive index, Crystals

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EUV substrate materials have to meet enhanced requirements with respect to extreme low thermal expansion, high homogeneity and superior surface quality. A SCHOTT R&D program aims at the development of advanced materials covering these various aspects. The glass-ceramic Zerodur (registered trademark) of SCHOTT represents a substrate material currently used for EUV masks and optics of first generation tools due to its extremely low coefficient of thermal expansion (CTE) and its excellent homogeneity. Zerodur(registered trademark) even allows continuous shifting of the position of zero crossing of the CTE-slope to control the thermal expansion behavior according to varying customer requirements: As a result of specifically adjusted process parameters, samples of Zerodur (registered trademark) exhibit a coefficient of thermal expansion CTE < 5 ppb/K corresponding to the lowest expansion class of the SEMI standard P37 (19 to 25°C) for EUV mask blanks. By further variation of process parameters, the position of zero crossing, e.g. at 22.5°C or 30°C, can be varied, revealing an attractive attribute feature of Zerodur (registered trademark). A new dilatometer type reveals an improved reproducibility of ~ 1ppb/K in the temperature range of 0 to 50°C. A series of CTE(0;50°C) measurements with a test-cube of Zerodur (registered trademark) provides information on CTE homogeneity on a cm-scale: no CTE variation was observed within the error of measurements (1ppb/K) for a block exhibiting ± 3.5*10^-6 variation in refractive index. CTE variation can cause surface deformations during changing temperature conditions. A Fizeau-Interferometer was used to record surface roughness at two different temperatures. This non- destructive metrology is regarded as a method to distinguish CTE variation < 1ppb/K. The surface deformation of Zerodur (registered trademark) due to elevated temperature was determined to be lower than the resolution. Both methods to analyze the CTE homogeneity of Zerodur (registered trademark) lead to the result of CTE variation below 1 ppb/K. Surface treatment of glass-ceramic material is a major challenge as final finishing of EUV substrates may increase roughness of super-polished surfaces significantly. Improved new glass-ceramic materials demonstrate optimization of glass-ceramic compositions to nearly meeting the specification of surface roughness after a standard finishing process. Recent achievements of material development reveal CTE-performance of this new glass-ceramic to also be adjustable to varying customer needs as already known for Zerodur (registered trademark). These results are regarded as a promising milestone to develop an optimized glass-ceramic material, because the features of the modified New-Glass Ceramic now better match the key requirements of EUVL substrate materials.

Proceedings Article | 20 May 2004 Paper

Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber

Frank Sobel, Lutz Aschke, Frauke Rueggeberg, Holger Seitz, Nathalie Olschewski, Torsten Reichhardt, Hans Becker, Markus Renno, Steffen Kirchner, Thomas Leutbecher, Guenter Hess, Konrad Knapp

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.533292

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet lithography, Polishing, Extreme ultraviolet, Surface finishing, Magnetorheological finishing, Surface roughness, Silica, Optical coatings

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Proceedings Article | 17 December 2003 Paper

Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography

Hans Becker, Jay Chey, Frank Sobel, Frank Schmidt, Markus Renno, Ute Buttgereit, Marie Angelopoulos, Guenter Hess, Konrad Knapp

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518339

KEYWORDS: Phase shifts, Particles, Tantalum, Phase shifting, Lithography, Photomasks, Chemical lasers, Laser stabilization, Vacuum ultraviolet, Ion beams

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Proceedings Article | 17 December 2003 Paper

Update on the EUVL mask blank activity at Schott Lithotec

Frank Sobel, Lutz Aschke, Hans Becker, Markus Renno, Frauke Ruggeberg, Steffen Kirchner, Thomas Leutbecher, Nathalie Olschewski, Mario Schiffler, Kurt Walter, Guenter Hess, Ute Buttgereit, Konrad Knapp, Rainer Lebert, Larissa Juschkin, Christian Wies, Bernhard Jagle

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518061

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Coating, Reflectivity, Polishing, Reflectometry, Surface finishing, Metrology

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Proceedings Article | 26 June 2003 Paper

Critical enabling properties of CaF2 lens blanks for state-of-the-art lithography tools

Joerg Hahn, Guenter Grabosch, Lutz Parthier, Konrad Knapp

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485417

KEYWORDS: Birefringence, Lens blanks, Refractive index, Lithography, Annealing, Crystals, Lens design, Manufacturing, 193nm lithography, Image quality

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Proceedings Article | 16 June 2003 Paper

Improved materials meeting the demands for EUV substrates

Ina Mitra, Jochen Alkemper, Uwe Nolte, Axel Engel, Rolf Mueller, Simone Ritter, Hrabanus Hack, Klaus Megges, Heiko Kohlmann, Wolfgang Pannhorst, Mark Davis, Lutz Aschke, Konrad Knapp

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484728

KEYWORDS: Zerodur, Surface roughness, Temperature metrology, Extreme ultraviolet, Metrology, Glasses, Standards development, Extreme ultraviolet lithography, Surface finishing, Crystals

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The enhanced demands for substrate materials for next-generation optics and masks have initiated detailed investigations on Zerodur as a proposed EUVL substrate material with focus on thermal expansion behavior and surface roughness. As a result of specifically adjusted process parameters, the coefficient of thermal expansion (CTE) was tailored to be a minimum at 22.5°C. Laboratory samples of Zerodur exhibit a CTE < 5 ppb/K corresponding to the lowest expasnion class of the SEMI standard P37 (19 to 25°C) for EUV mask blanks. By further variation of process parameters, the position of zero crossing, e.g. at 30°C, can be varied, revealing an attractive attribute feature of Zerodur. A new dilatometer type was mounted in 2002 with first operatinoal results revealing an improved reproducibility of ~1ppb/K in the temperature range of 0 to 50°C. A series of CTE measurements with a small block of Zerodur provides information on CTE homogeneity on a cm-scale: No CTE variation was observed within the error of measurements for a block exhibiting ± 3.5*10^-6 vairtion in refractinve index. CTE variation can cause surface deformations during changing temperature conditions. A first setup of Fizeau-Interferometer with a current resolution of 0.3 nm rms was used to record surface deformation of Zerodur due to elevated temperature was determined to be lower than the current resolution. Both methods to analyze the CTE homogeneity of Zerodur lead to the result of CTE variation below 1 ppb/K, still identifying today's need to improve metrology further. Final finishing of EUV substrates may increase roughness of super-polished surfaces significantly. Using appropriate processes a to surface roughness < 0.25 nm rms under production conditions can be achieved after final finishing of Zerodur. As an improved Zerodur-type material, recent achievements of material development demonstrate the optimization of glass-ceramic composition to nearly meeting the specification of surface roughness after a standard finishing process. These results are regarded as a promising milestone to develop an optimized glass-ceramic material providnig adjusted thermal expansion behavior and surface processability according to the specific demands of EUV technology.

Proceedings Article | 27 December 2002 Paper

High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition

Hans Becker, Frank Sobel, Lutz Aschke, Markus Renno, Juergen Krieger, Ute Buttgereit, Guenter Hess, Frank Lenzen, Konrad Knapp, Sergey Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467578

KEYWORDS: Reflectivity, Multilayers, Particles, Extreme ultraviolet, Ion beams, Transmission electron microscopy, Silicon, Sputter deposition, Interfaces, Reflectometry

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Proceedings Article | 10 December 2001 Paper

Present and future industrial metrology needs for qualification of high-quality optical microlithography materials

Axel Engel, Ewald Moersen, A. Jordanov, Konrad Knapp

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450080

KEYWORDS: Absorption, Birefringence, Metrology, Surface finishing, Lithography, Refractive index, Industrial metrology, Silica, Laser induced fluorescence, Semiconductors

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Proceedings Article | 14 September 2001 Paper

Development and investigation of high-quality CaF2 used for 157-nm microlithography

Axel Engel, Konrad Knapp, Lutz Aschke, Ewald Moersen, Wolfgang Triebel, Christoph Chojetzki, Sven Brueckner

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435711

KEYWORDS: Absorption, Birefringence, Lithography, Annealing, Pulsed laser operation, Polishing, Crystals, Optical lithography, Vacuum ultraviolet, Calcium

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Proceedings Article | 20 August 2001 Paper

Flatness correction of NZTE mask blank substrates

Lutz Aschke, Fredi Schubert, Joerg Kegeler, Axel Schindler, Thomas Haensel, Konrad Knapp

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436634

KEYWORDS: Ion beams, Etching, Ion beam finishing, Polishing, Zerodur, Surface finishing, Photomasks, Spatial frequencies, Extreme ultraviolet lithography, Ions

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Proceedings Article | 26 April 2001 Paper

Final inspection of photomask blanks

Fredi Schubert, Hartmut Sauerbrei, Lutz Aschke, Konrad Knapp

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425223

KEYWORDS: Inspection, Photomasks, Manufacturing, Light scattering, Defect detection, Particles, Laser scattering, Semiconductor lasers, Solid state lasers, Laser systems engineering

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