Ms. Krishnaparvathy Puthankovilakam Profile

Krishnaparvathy Puthankovilakam

Doctoral Student at EPFL

Publications (6)

Proceedings Article | 27 February 2017 Paper

Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime

Toralf Scharf, Myun-Sik Kim, Krishnaparvathy Puthankovilakam, Hans Peter Herzig, Reinhard Voelkel

Proceedings Volume 10120, 1012010 (2017) https://doi.org/10.1117/12.2251379

KEYWORDS: Computer simulations, Objectives, Modulation, Distance measurement, Radio propagation, Electromagnetism, Diffraction, Near field diffraction, Interferometry, Electromagnetic radiation, Diffraction gratings, Singular optics, Polarization, Near field, Nanofabrication

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Proceedings Article | 15 March 2016 Paper

Phase analysis of amplitude binary mask structures

Krishnaparvathy Puthankovilakam, Toralf Scharf, Hans Peter Herzig, Uwe Vogler, Arianna Bramati, Reinhard Voelkel

Proceedings Volume 9780, 97800V (2016) https://doi.org/10.1117/12.2219062

KEYWORDS: Printing, Optical proximity correction, Binary data, Phase measurement, Phase shift keying, Image resolution, Microscopy, Diffraction, Visualization, Phase shifting

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Proceedings Article | 4 March 2016 Paper

Structured amplitude and phase fields behind microstructures: the quest for high contrast modulation at proximity

Toralf Scharf, Myun-Sik Kim, Krishnaparvathy Puthankovilakam, Johana Bernasconi, Hans-Peter Herzig, Uwe Vogler, Reinhard Voelkel

Proceedings Volume 9764, 97640B (2016) https://doi.org/10.1117/12.2214341

KEYWORDS: Photomasks, Phase shift keying, Phase measurement, Modulation, Printing, Lithography, Neodymium, Diffraction, Stray light, Geometrical optics

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SPIE Journal Paper | 29 January 2016 Open Access

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy

Krishnaparvathy Puthankovilakam, Toralf Scharf, Myun-Sik Kim, Ali Naqavi, Hans Peter Herzig, Tina Weichelt, Uwe Zeitner, Uwe Vogler, Reinhard Voelkel

JM3, Vol. 15, Issue 02, 021203, (January 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021203

KEYWORDS: Phase shifts, Photomasks, Printing, Phase measurement, Microscopy, Diffraction, Quartz, Semiconducting wafers, Resolution enhancement technologies

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Proceedings Article | 18 March 2015 Paper

Intensity and phase fields behind Phase Shifting Masks studied with High Resolution Interference Microscopy

Krishnaparvathy Puthankovilakam, Toralf Scharf, Hans Peter Herzig, Tina Weichelt, Uwe Zeitner, Uwe Vogler, Reinhard Voelkel

Proceedings Volume 9426, 94260I (2015) https://doi.org/10.1117/12.2085804

KEYWORDS: Printing, Photomasks, Phase shifts, Diffraction, Phase shifting, Microscopy, Phase measurement, Optical proximity correction, Quartz, Tolerancing

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Proceedings Article | 18 August 2014 Paper

Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization

Krishnaparvathy Puthankovilakam, Toralf Scharf, Qing Tan, Hans Peter Herzig, David Nguyen, Uwe Vogler, Arianna Bramati, Reinhard Voelkel

Proceedings Volume 9203, 92031B (2014) https://doi.org/10.1117/12.2060954

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Lithographic illumination, Resolution enhancement technologies, Printing, Microscopes, Beam splitters, Objectives, Structural design

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Showing 5 of 6 publications

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