The field of ultraviolet (UV)-laser applications is currently experiencing rapid growth in the semiconductor processing, laser micromachining and biomedical markets. A key enabler for these technologies are optical coatings used to manipulate and direct laser beams in a targeted manner. As laser power, laser fluence and pulse frequencies increase, the demands on the physical properties of the coating materials become more stringent. We demonstrate how ion beam sputtering and post-deposition heat treatment are utilized to produce low loss optical coatings at 355 nm and 266 nm. The importance of precisely controlling the sputtering conditions for individual materials is highlighted and the influence of different process parameters on the resulting material properties is discussed. The effect of annealing on key performance parameters for optical coatings such as absorption, stress, roughness, and film structure is investigated. The low absorption achieved in this work results in high laser induced damage thresholds (LIDT) exceeding 2.5 J/cm2 and 6.5 J/cm2 for highly reflective (HR) mirrors and 7.6 J/cm2 and 15.7 J/cm2 for antireflective coatings at 266 nm and 355 nm, respectively.
This paper presents a review of the controlled growth of transition metal dichalcogenide (TMD) heterostructures, and the elucidation of the role of underlying two dimensional (2D) materials on temporal degradation of transition metal dichalcogenides (TMDs). Chemical vapor deposition (CVD)-growth is carried out to achieve localized, patterned, single crystalline or polycrystalline monolayers of TMDs, including MoS2, WS2, WSe2 and MoSe2, as well as their heterostructures. The localized growth of TMDs has an important implication for nonlinear optics applications. Extensive material characterization is performed to illuminate the role of dissimilar 2D substrates in the prevention of interior defects in TMDs. This characterization provides a detailed observation of the oxidation rates and behaviors of TMDs, which corroborate the role of underlying 2D layers in the prevention of in-air oxidation in TMDs. The epitaxial growth is demonstrated to create TMDs on hBN and graphene, as well as vertical/lateral heterostructures of TMDs, uniquely forming in-phase 2D heterostructures.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.