Kyoil Koo
Flash memory OPC Team leader at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129551E (2024) https://doi.org/10.1117/12.3009806
KEYWORDS: Image classification, Semiconducting wafers, Feature extraction, Artificial intelligence, Machine learning, Visualization, Image processing, Image enhancement, Design, Advanced patterning

Proceedings Article | 21 November 2023 Presentation + Paper
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son
Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373
KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12499, 124990C (2023) https://doi.org/10.1117/12.2657880
KEYWORDS: Etching, Data modeling, Modeling, Machine learning, Design and modelling, Statistical modeling, Optical proximity correction, Reflection, Feature extraction, Artificial intelligence

Proceedings Article | 9 September 2013 Paper
Kyoil Koo, Gyengseop Kim, Sanghun Kim, Seunghune Yang, Sooryong Lee, Youngchang Kim, Jungdal Choi, Hokyu Kang
Proceedings Volume 8880, 88801Q (2013) https://doi.org/10.1117/12.2025552
KEYWORDS: Data modeling, Scanning electron microscopy, Atomic force microscopy, Calibration, Optical proximity correction, Optical calibration, Instrument modeling, Critical dimension metrology, Metrology, Data conversion

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