Dr. Laurens Kwakman Profile

Dr. Laurens Kwakman

at FEI Co

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Author

Publications (7)

Proceedings Article | 25 June 2020 Presentation + Paper

Accuracy assessment between on-product and on-optical-target overlay metrology with SEM and STEM

Yaniv Abramovitz, Guy Levin, Lior Sarig, Shimon Levi, Ofer Adan, Ashley Tilson, Jason Arjavac, Michael Strauss, Laurens Kwakman, Philippe Leray, Sandip Halder

Proceedings Volume 11325, 1132508 (2020) https://doi.org/10.1117/12.2563606

KEYWORDS: Overlay metrology, Scanning electron microscopy, Scanning transmission electron microscopy, Wafer-level optics, Semiconducting wafers, Line edge roughness, Photomasks, Transmission electron microscopy, Dysprosium, Metrology

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Proceedings Article | 26 March 2019 Presentation + Paper

Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices

Hayley Johanesen, Michael Strauss, Anne Kenslea, Chris Hakala, Laurens Kwakman, Werner Boullart, Hans Mertens, Yong Kong Siew, Kathy Barla

Proceedings Volume 10959, 109591C (2019) https://doi.org/10.1117/12.2514995

KEYWORDS: Metrology, Scanning transmission electron microscopy, Nanowires, Silicon, Signal to noise ratio, 3D metrology

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Proceedings Article | 26 March 2019 Presentation + Paper

Statistical significance of STEM based metrology on advanced 3D transistor structures

Laurens Kwakman, Anne Kenslea, Hayley Johanesen, Jillian Cramer, Michael Strauss, Werner Boullart, Hans Mertens, Yong Kong Siew, Kathy Barla

Proceedings Volume 10959, 109590C (2019) https://doi.org/10.1117/12.2514963

KEYWORDS: Metrology, Scanning transmission electron microscopy, Line edge roughness, Semiconducting wafers, Transmission electron microscopy, Critical dimension metrology, Line width roughness, Transistors, Dielectrics, Etching

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Proceedings Article | 2 August 2018 Presentation + Paper

A holistic metrology sensitivity study for pattern roughness quantification on EUV patterned device structures with mask design induced roughness

Shimon Levi, Ishai Swrtsband, Vladislav Kaplan, Ilan Englard, Kurt Ronse, Bogumila Kutrzeba-Kotowska , Gaoliang Dai, Frank Scholze, Kenslea Anne, Hayley Johanesen, Laurens Kwakman, Igor Turovets, Maxim Rabinovitch, Sven Krannich, Nikolai Kasper, Brid Connolly, Romy Wende, Markus Bender

Proceedings Volume 10585, 1058511 (2018) https://doi.org/10.1117/12.2297265

KEYWORDS: Metrology, Extreme ultraviolet, Photomasks, Semiconducting wafers, Signal processing, Transmission electron microscopy, Atomic force microscopy, Etching

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Proceedings Article | 3 October 2016 Presentation + Paper

Towards laboratory x-ray nanotomography: instrumental improvements on a SEM-based system

L. A. Gomes Perini, P. Bleuet, B. Buijsse, L. F. Tz. Kwakman, W. Parker

Proceedings Volume 9967, 99671A (2016) https://doi.org/10.1117/12.2235993

KEYWORDS: X-rays, Tomography, Signal to noise ratio, Scanning electron microscopy, Electron beams, Nanowires, X-ray imaging, Sensors, X-ray detectors, Spatial resolution

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Proceedings Article | 24 March 2006 Paper

In-line TEM sample preparation and wafer return strategy for rapid yield learning

N. Bicaïs-Lépinay, F. André, S. Brevers, P. Guyader, C. Trouiller, L. F. Tz. Kwakman, S. Pokrant, D. Verkleij, R. Schampers, L. Ithier, E. Sicurani, C. Wyon

Proceedings Volume 6152, 615217 (2006) https://doi.org/10.1117/12.656410

KEYWORDS: Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Contamination, Gallium, Platinum, Silicon, Inspection, Nondestructive evaluation, Particles

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Proceedings Article | 19 September 1995 Paper

SCA and SPV in line monitoring

Kathy Barla, D. Levy, A. Fleury, J. Reynard, L. Kwakman

Proceedings Volume 2637, (1995) https://doi.org/10.1117/12.221309

KEYWORDS: Oxides, Semiconducting wafers, Iron, Contamination, Silicon, Diffusion, Sodium, Aluminum, Oxygen, Oxidation

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Showing 5 of 7 publications

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