Mr. Laurent Stauffer Profile

Laurent Stauffer

Project Manager at Leica Geosystems AG

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Author

Publications (5)

Proceedings Article | 20 November 2017 Open Access

Assembly technique for miniaturized optical devices: towards space qualification

Renaud Matthey, Gaetano Mileti, Laurent Stauffer, Philippe Giaccari, Alexandre Pollini, Laurent Balet

Proceedings Volume 10564, 105643D (2017) https://doi.org/10.1117/12.2309064

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Proceedings Article | 8 September 2004 Paper

Sol-gel replication of optical components suited for surface mount assembly

Jurgen Sochtig, Sanida Mahmud, Samuel Obi, Jorn Pedersen, Claus Urban, Susanne Westenhofer, Peter Kipfer, Knut Siercks, Laurent Stauffer

Proceedings Volume 5454, (2004) https://doi.org/10.1117/12.544968

KEYWORDS: Semiconducting wafers, Lenses, Sol-gels, Wafer-level optics, Optical components, Glasses, Optical alignment, UV optics, Optical microsystems, Photomasks

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Proceedings Article | 8 September 2004 Paper

High-precision surface mount assembly of micro-optical components per laser reflow soldering: positioning accuracy and thermal stability

Laurent Stauffer, Felix Walti, Urs Vokinger, Knut Siercks

Proceedings Volume 5454, (2004) https://doi.org/10.1117/12.545510

KEYWORDS: Quartz, Promethium, Cameras, Optical mounts, Mirrors, Optical components, Laser welding, Metals, Micro optics, Sensors

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Proceedings Article | 13 November 2001 Paper

Efficient beamshaping of high-power diode lasers using micro-optics

Hans Peter Herzig, Andreas Schilling, Laurent Stauffer, Urs Vokinger, Markus Rossi

Proceedings Volume 4437, (2001) https://doi.org/10.1117/12.448150

KEYWORDS: Diffractive optical elements, Glasses, Multimode fibers, Gradient-index optics, Wave propagation, Silica, Diffraction, Optical components, Antireflective coatings, Lithography

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Proceedings Article | 18 August 2000 Paper

Fabrication technologies for micro-optical elements with arbitrary surfaces

Andreas Schilling, Philippe Nussbaum, Irene Philipoussis, Hans Peter Herzig, Laurent Stauffer, Markus Rossi, Ernst-Bernhard Kley

Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395692

KEYWORDS: Photoresist materials, Photomasks, Lithography, Binary data, Silica, Reactive ion etching, Multiphoton lithography, Optical lithography, Diffraction, Optical components

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