Lin Wang
at Synopsys Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 1249503 (2023) https://doi.org/10.1117/12.2657538
KEYWORDS: Design and modelling, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Visualization, Reticles, Printing, 193nm lithography, Source mask optimization

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