Dr. Mahesh Chandramouli Profile

Dr. Mahesh Chandramouli

Staff Engineer / Technologist at Intel Corp

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 13 November 2024 Presentation

Presentation

Co-optimization of photomask exposure conditions and MPC

Michael Erickson, Mahesh Chandramouli, Alex Johnson, Michael Mroz, Vlad Liubich, Zach Rice, Arvind Sundaramurthy, Kushlendra Mishra, Rachit Sharma, Ingo Bork, Alex Wei, Jörg Mellmann, Jiechang Hou

Proceedings Volume 13216, 132161S (2024) https://doi.org/10.1117/12.3038102

KEYWORDS: Photomasks, Critical dimension metrology, SRAF, Scattering, Printing, Bias correction, Forward error correction, Extreme ultraviolet, Modulation, Etching

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Proceedings Article | 22 November 2023 Open Access

Open Access

Presentation

End to end curvilinear for sub-2nm lithography

Frank Abboud, Mahesh Chandramouli, Arvind Sundaramurthy

Proceedings Volume PC12751, PC1275108 (2023) https://doi.org/10.1117/12.2688594

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Optical proximity correction, Inspection, Ecosystems, Design and modelling, Standards development, Semiconductor manufacturing, Semiconducting wafers

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Proceedings Article | 1 May 2023 Presentation + Paper

Presentation + Paper

Multi-beam patterning technology and mask making beyond 5nm

B. Shamoun, Z. Alberti, I. Bucay, S. Ellis, M. Erickson, B. Liu, M. Chandramouli, A. Sowers, F. Abboud, G. Hochleitner, M. Tomandl, C. Klein, E. Platzgummer

Proceedings Volume 12497, 1249707 (2023) https://doi.org/10.1117/12.2657746

KEYWORDS: Line edge roughness, Lithography, Printing, Extreme ultraviolet lithography, Laser scattering, Analytic models, Beam diameter, Optical aberrations, Opacity, Manufacturing

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Proceedings Article | 1 December 2022 Presentation + Paper

Presentation + Paper

Multibeam mask requirements for advanced EUV patterning

M. Chandramouli, B. Liu, Z. Alberti, F. Abboud, G. Hochleitner, W. Wroczewski, S. Kuhn, C. Klein, E. Platzgummer

Proceedings Volume 12293, 122930O (2022) https://doi.org/10.1117/12.2645895

KEYWORDS: Photomasks, Extreme ultraviolet, Line edge roughness, Line width roughness, Electron beam lithography, Distortion, Optical lithography, Critical dimension metrology

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Proceedings Article | 24 February 2021 Presentation + Paper

Presentation + Paper

Multi-beam mask writer in EUV era: challenges and opportunities

Bassam Shamoun, Mahesh Chandramouli, Bin Liu, Reid Juday, Igal Bucay, Andrew Sowers, Frank Abboud

Proceedings Volume 11610, 116100Q (2021) https://doi.org/10.1117/12.2586863

KEYWORDS: Photomasks, Extreme ultraviolet, Line edge roughness, Data conversion, Wafer manufacturing, Roads, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2020 Paper

Paper

Development and deployment of advanced multi-beam mask writer

Mahesh Chandramouli, Bin Liu, Reid Juday, Bassam Shamoun, Yulia Korobko, Andrew Sowers, Yoshihiro Tezuka, Frank Abboud

Proceedings Volume 11324, 113240K (2020) https://doi.org/10.1117/12.2556552

KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Lithography, Electrodes, Overlay metrology, Optical lithography, Manufacturing, Printing, Extreme ultraviolet

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Proceedings Article | 21 October 2014 Paper

Paper

Mask data processing in the era of multibeam writers

Frank Abboud, Michael Asturias, Maesh Chandramouli, Yoshihiro Tezuka

Proceedings Volume 9235, 92350W (2014) https://doi.org/10.1117/12.2072135

KEYWORDS: Photomasks, Semiconducting wafers, Vestigial sideband modulation, Monte Carlo methods, Diffusion, Data processing, Optical proximity correction, Electron beam lithography, Raster graphics, Computer aided design

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Proceedings Article | 8 November 2012 Paper

Paper

Future mask writers requirements for the sub-10nm node era

Mahesh Chandramouli, Frank Abboud, Nathan Wilcox, Andrew Sowers, Damon Cole

Proceedings Volume 8522, 85221K (2012) https://doi.org/10.1117/12.977172

KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Lithography, Raster graphics, Photomask technology, Beam shaping, Electrons, Signal to noise ratio, Optical proximity correction

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Proceedings Article | 21 March 2007 Paper

Paper

Design for manufacturing approach to second level alternating phase shift mask patterning

Sven Henrichs, Mahesh Chandramouli, Min Chun Tsai

Proceedings Volume 6521, 65211W (2007) https://doi.org/10.1117/12.712297

KEYWORDS: Neodymium, Photomasks, Optical lithography, Tolerancing, Phase shifts, Manufacturing, Design for manufacturing, Data conversion, Overlay metrology, Lithography

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Proceedings Article | 20 October 2006 Paper

Paper

Variable shaped beam writing throughput at the 45nm node and beyond

A. Sowers, M. Shumway, M. Kamna, N. Wilcox, M. Vernon, D. Cole, M. Chandramouli

Proceedings Volume 6349, 63490V (2006) https://doi.org/10.1117/12.686566

KEYWORDS: Vestigial sideband modulation, Beam shaping, Photomasks, Manufacturing, Data modeling, Optical proximity correction, Optical lithography, Model-based design, Manufacturing equipment

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Proceedings Article | 5 November 2005 Paper

Paper

Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask

Jian Ma, Ke Han, Kyung Lee, Yulia Korobko, Mary Silva, Joas Chavez, Brian Irvine, Sven Henrichs, Kishore Chakravorty, Robert Olshausen, Mahesh Chandramouli, Bobby Mammen, Ramaswamy Padmanaban

Proceedings Volume 5992, 59921P (2005) https://doi.org/10.1117/12.632160

KEYWORDS: Overlay metrology, Neodymium, Quartz, Chromium, Photomasks, Tolerancing, Phase shifts, Etching, Scanning electron microscopy, Optical testing

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Proceedings Article | 5 November 2005 Paper

Paper

Production performance of a Sigma7300 DUV mask writer

Bob Olshausen, Mahesh Chandramouli, Dustin Wall, Bruce Auches, Damon Cole

Proceedings Volume 5992, 59920V (2005) https://doi.org/10.1117/12.633167

KEYWORDS: Spatial light modulators, Binary data, Deep ultraviolet, Neodymium, Electron beam lithography, Calibration, Data conversion, Overlay metrology, Critical dimension metrology, Photoresist processing

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Proceedings Article | 28 June 2005 Paper

Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359

KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

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Proceedings Article | 6 December 2004 Paper

Paper

Calibration of the registration metrology systems

Mahesh Chandramouli, Yulia Korobko

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568245

KEYWORDS: Calibration, Metrology, Photomasks, Mirrors, Interferometers, Manufacturing, Reticles, Error analysis, Lithography, Imaging systems

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Proceedings Article | 27 December 1996 Paper

Paper

Investigation of multiphase printing writing modes on mask performance in MEBES 4500

Mahesh Chandramouli, Jim DeWitt, Gary Meyers, J. Millino, David Hwang

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262805

KEYWORDS: Spiral phase plates, Cadmium, Critical dimension metrology, Printing, Photomasks, Inspection, Mendelevium, Raster graphics, Reticles, Wafer inspection

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Showing 5 of 15 publications

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