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Mamoru Tamura
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 13 November 2024 Presentation
Drastic dose reduction of metal oxide resist induced by functional surface treatment process and primers
Taiki Saijo, Kodai Kato, Satoshi Takeda, Mamoru Tamura, Wataru Shibayama, Kiyofumi Wada
Proceedings Volume PC13215, PC132150O (2024) https://doi.org/10.1117/12.3034659
KEYWORDS: Metal oxides, Photoresist processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Etching, Chemical vapor deposition, Tin, Silica
Proceedings Article | 12 October 2018 Presentation
Advanced development of organic and inorganic under layers for EUV lithography (Conference Presentation)
Wataru Shibayama, Shuhei Shigaki, Satoshi Takeda, Mamoru Tamura, Yasunobu Someya, Makoto Nakajima, Rikimaru Sakamoto
Proceedings Volume 10809, 108090Y (2018) https://doi.org/10.1117/12.2503298
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Lithography, Etching, Carbon, System on a chip, Metals
Proceedings Article | 19 March 2018 Presentation + Paper
DDR process and materials for novel tone reverse technique
Shuhei Shigaki, Wataru Shibayama, Satoshi Takeda, Mamoru Tamura, Makoto Nakajima, Rikimaru Sakamoto
Proceedings Volume 10583, 105830M (2018) https://doi.org/10.1117/12.2297517
KEYWORDS: Optical lithography, Materials processing, Extreme ultraviolet lithography, Etching, Lithography, Polymers, Photomasks, Dry etching, Photoresist processing, Extreme ultraviolet
Proceedings Article | 27 March 2017 Paper
Novel gap filling BARC with high chemical resistance
Hiroto Ogata, Yuto Hashimoto, Yuki Usui, Mamoru Tamura, Tomoya Ohashi, Yasushi Sakaida, Takahiro Kishioka
Proceedings Volume 10146, 1014617 (2017) https://doi.org/10.1117/12.2257664
KEYWORDS: Resistance, Wet etching, Semiconductor manufacturing, Photomasks, Tin, Adhesives, Lithography, Absorbance, Etching, Polymers, Process control, Semiconducting wafers
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