Dr. Manouk Rijpstra
Physicist at ASML Netherlands BV
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 113251O (2020) https://doi.org/10.1117/12.2552823
KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Feedback control, Optical parametric oscillators, Control systems, High volume manufacturing, Data processing, Metrology, Optical lithography

Proceedings Article | 20 March 2019 Paper
Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens
Proceedings Volume 10961, 109610K (2019) https://doi.org/10.1117/12.2515449
KEYWORDS: Lithographic process control, Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Distortion, Scanners, Logic, Metrology, Process control

Proceedings Article | 20 March 2018 Paper
Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudhar Raghunathan, Igor Aarts, Krishanu Shome, Jonathan Lee, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Leendertjan Karssemeijer, Irina Lyulina, Chung-Tien Li, Jan Hermans, Philippe Leray
Proceedings Volume 10587, 105870C (2018) https://doi.org/10.1117/12.2297493
KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Polarization, Sensors, Chemical mechanical planarization, Etching, Scanners

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