Dr. Manouk Rijpstra Profile

Dr. Manouk Rijpstra

Physicist at ASML Netherlands BV

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Publications (3)

Proceedings Article | 20 March 2020 Presentation + Paper

Process context based wafer level grouping control: an advanced overlay process correction designed for DRAM 1z nm node in high volume manufacturing

Linmiao Zhang, William Susanto, Katsumasa Takahashi, Albert Chen, Tim Tang, Yi Zou, Chenxi Lin, Simon Hastings, Samee Ur Rehman, Manouk Rijpstra, Alfonso Sun

Proceedings Volume 11325, 113251O (2020) https://doi.org/10.1117/12.2552823

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Feedback control, Optical parametric oscillators, Control systems, High volume manufacturing, Data processing, Metrology, Optical lithography

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Proceedings Article | 20 March 2019 Paper

Holistic feedforward control for the 5 nm logic node and beyond

Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens

Proceedings Volume 10961, 109610K (2019) https://doi.org/10.1117/12.2515449

KEYWORDS: Lithographic process control, Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Distortion, Scanners, Logic, Metrology, Process control

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Proceedings Article | 20 March 2018 Paper

Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models

Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudhar Raghunathan, Igor Aarts, Krishanu Shome, Jonathan Lee, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Leendertjan Karssemeijer, Irina Lyulina, Chung-Tien Li, Jan Hermans, Philippe Leray

Proceedings Volume 10587, 105870C (2018) https://doi.org/10.1117/12.2297493

KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Polarization, Sensors, Chemical mechanical planarization, Etching, Scanners

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