Dr. Marc Corthout
General Manager at OMC vzw
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 7 April 2011 Paper
Masaki Yoshioka, Yusuke Teramoto, Jeroen Jonkers, Max Schürmann, Rolf Apetz, Volker Kilian, Marc Corthout
Proceedings Volume 7969, 79691G (2011) https://doi.org/10.1117/12.879386
KEYWORDS: Tin, Scanners, Plasma, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Light sources, High volume manufacturing, Laser applications, Semiconductors

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 763610 (2010) https://doi.org/10.1117/12.846545
KEYWORDS: Extreme ultraviolet, Tin, Scanners, Extreme ultraviolet lithography, Plasma, Ultraviolet radiation, Reliability, Semiconducting wafers, Lithography, Electrodes

Proceedings Article | 18 March 2009 Paper
Masaki Yoshioka, Denis Bolshukhin, Marc Corthout, Günther Derra, Sven Götze, Jeroen Jonkers, Jürgen Kleinschmidt, Rainer Müller, Max Schürmann, Guido Schriever, Rob Snijkers, Peter Zink
Proceedings Volume 7271, 727109 (2009) https://doi.org/10.1117/12.814100
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Xenon, Plasma, Tin, Integrated optics, Scanners, Curtains, Electrodes, Reliability

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71401F (2008) https://doi.org/10.1117/12.804687
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Plasma, Xenon, Energy efficiency, Electrodes, Capacitors, Prototyping

Proceedings Article | 27 March 2008 Paper
Marc Corthout, Rolf Apetz, Jesko Brudermann, Marcel Damen, Günther Derra, Oliver Franken, Jeroen Jonkers, Jürgen Klein, Felix Küpper, Arnaud Mader, Willi Neff, Hans Scheuermann, Guido Schriever, Max Schürmann, Guido Seimons, Rob Snijkers, Dominik Vaudrevange, Erik Wagenaars, Peiter van de Wel, Masaki Yoshioka, Peter Zink, Oliver Zitzen
Proceedings Volume 6921, 69210V (2008) https://doi.org/10.1117/12.772633
KEYWORDS: Extreme ultraviolet, Tin, Plasma, Pulsed laser operation, Extreme ultraviolet lithography, Astatine, Ultraviolet radiation, Electrodes, Capacitors, Lithography

Showing 5 of 6 publications
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