Ms. Maria Oliva Profile

Maria Oliva

Director Global Product Management at JENOPTIK Optical Systems GmbH

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Author

Publications (5)

Proceedings Article | 27 September 2013 Paper

Optical design including characteristics of manufactured nanostructures

Christoph Wächter, Martin Müller, Erik Förster, Maria Oliva, Dirk Michaelis

Proceedings Volume 8840, 88400B (2013) https://doi.org/10.1117/12.2024055

KEYWORDS: Nanostructures, Optical design, Metamaterials, Near field optics, Optics manufacturing, Transmittance, Polarizers, Optical components, Data modeling, Nanostructuring

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Proceedings Article | 13 September 2011 Paper

Effects of metallic nanoparticle arrays in Si solar cell structures

Tino Benkenstein, Michael Flämmich, Torsten Harzendorf, Thomas Käsebier, Dirk Michaelis, Maria Oliva, Christoph Wächter, Uwe Zeitner

Proceedings Volume 8110, 81100D (2011) https://doi.org/10.1117/12.894385

KEYWORDS: Absorption, Particles, Silicon, Nanoparticles, Solar cells, Scattering, Silver, Plasmonics, Atomic force microscopy, Interfaces

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Proceedings Article | 14 May 2010 Paper

Smart technology for blazed multilevel gratings in resonance domain

M. Oliva, T. Benkenstein, J. Dunkel, T. Harzendorf, A. Matthes, D. Michaelis, U. Zeitner

Proceedings Volume 7716, 77161L (2010) https://doi.org/10.1117/12.854587

KEYWORDS: Diffraction gratings, Diffraction, Standards development, Chromium, Photomasks, Optical alignment, Optical design, Lithography, Etching, Electron beam lithography

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Proceedings Article | 17 June 2009 Paper

AFM characterization of large area micro-optical elements

M. Oliva, T. Benkenstein, M. Flemming, U. Zeitner

Proceedings Volume 7389, 73893K (2009) https://doi.org/10.1117/12.834223

KEYWORDS: Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Silica, Chromium, Optical components, Photomasks, Etching, Binary data, Associative arrays

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Proceedings Article | 9 September 2006 Paper

Multilevel pattern generation by GaN laser lithography: an application to beam shaper fabrication

Giuseppe Lullo, Riccardo Leto, Maria Oliva, Claudio Arnone

Proceedings Volume 6290, 62900A (2006) https://doi.org/10.1117/12.680460

KEYWORDS: Gallium nitride, Modulation, Optical lithography, Beam shaping, Gas lasers, Bragg cells, Lithography, Helium cadmium lasers, Microelectronics, Laser systems engineering

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