Dr. Marina Y. Timmermans Profile

Dr. Marina Y. Timmermans

Researcher at imec

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Author

Publications (21)

Proceedings Article | 10 April 2024 Presentation + Paper

Unraveling strength and mechanical properties of CNT-based EUV pellicle

Hyun-Gyu Kang, Ivan Pollentier, Marina Timmermans, Steven Brems, Emily Gallagher

Proceedings Volume 12953, 129530M (2024) https://doi.org/10.1117/12.3010378

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Scanners, Permeability, Extreme ultraviolet, Plasma, Materials properties, Resistance, Hydrogen, Fabrication

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Proceedings Article | 28 April 2023 Presentation + Paper

EUV pellicle scanner integration for N2 nodes and beyond

Mark van de Kerkhof, Paul Vermeulen, Beatriz Seoane, Alexander Klein, Emily Gallagher, Joost Bekaert, Marina Timmermans, Ivan Pollentier

Proceedings Volume 12494, 124940D (2023) https://doi.org/10.1117/12.2658353

KEYWORDS: Pellicles, Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Deep ultraviolet, Reticles, Semiconducting wafers, Composites, Particles, Metals

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Proceedings Article | 28 April 2023 Presentation + Paper

CNT pellicles: recent optimization and exposure results

Emily Gallagher, Marina Timmermans, Ivan Pollentier, Rik Jonckheere, Remko Aubert, Eric Hendrickx, Joost Bekaert

Proceedings Volume 12494, 124940E (2023) https://doi.org/10.1117/12.2660595

KEYWORDS: Pellicles, Semiconducting wafers, Scanners, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Plasma, Hydrogen

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SPIE Journal Paper | 27 July 2021

Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment

Marina Timmermans, Ivan Pollentier, Maxim Korytov, Thomas Nuytten, Stefanie Sergeant, Thierry Conard, Johan Meersschaut, Yide Zhang, Masoud Dialameh, Wilfried Alaerts, Ehsan Jazaeri, Valentina Spampinato, Alexis Franquet, Steven Brems, Cedric Huyghebaert, Emily Gallagher

JM3, Vol. 20, Issue 03, 031010, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031010

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Raman spectroscopy, Scanners, Carbon, Carbon nanotubes, Plasma, Particles, Coating

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Background: An extreme ultraviolet (EUV)-transparent pellicle must be used during lithography to protect the photomask from fall-on particles. A pellicle made of free-standing carbon nanotube (CNT) films stops particles despite the presence of gaps while demonstrating high EUV transmission, mechanical stability, low EUV scattering and reflectivity, and DUV transmission that enables through-pellicle mask inspection. Aim: The CNT EUV pellicle properties can be tailored based on the diversity of CNT structures and tunability of their configuration within the CNT film (density, bundle size, composition, etc.) as shown in this work. A remaining challenge is extending the CNT EUV pellicle lifetime in the scanner environment of EUV-induced hydrogen-based plasma, and the effects on different CNT films are explored here. Approach: Optical and thermal properties of different CNT pellicles with respect to the CNT material type, density, composition, and bundle size were explored. The ability of uncoated CNT EUV pellicles to withstand high EUV powers in the hydrogen-based environment was tested. Transmission, spectroscopic, and chemical mapping of the exposed CNT membranes were performed to explore the material modifications under various exposure conditions. Results: Uncoated CNT pellicles withstand 600-W source power equivalent in the EUV scanner-like gas environment but exhibit structural changes with prolonged exposure. Multiwalled CNT pellicles exhibit less EUV transmission change as compared to single-walled CNT pellicles under the same exposure conditions. The protection of CNT material from structural degradation by means of coating was shown. Conclusions: These investigations add to the understanding of CNT EUV pellicle tunability for optimal performance and lifetime limiters of CNT pellicles under the influence of EUV radiation and plasma. We anticipate the need for coating the CNT pellicle to protect the CNT material against plasma damage for the current scanner conditions. Optimization of both the CNT membrane and its coating is in progress.

SPIE Journal Paper | 8 June 2021

EUV scattering from carbon nanotube pellicles: measurement and control

Ivan Pollentier, Marina Timmermans, Cedric Huyghebaert, Steven Brems, Emily Gallagher, Bernhard Lüttgenau, Sascha Brose

JM3, Vol. 20, Issue 02, 021007, (June 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021007

KEYWORDS: Pellicles, Extreme ultraviolet, Scattering, Extreme ultraviolet lithography, Scanners, Carbon nanotubes, Sensors, Printing, Distance measurement, Scatter measurement

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SPIE Journal Paper | 27 May 2021

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gökay Yeğen, Par Broman

JM3, Vol. 20, Issue 02, 021005, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021005

KEYWORDS: Pellicles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Semiconducting wafers, Scattering, Reticles, Particles, Line width roughness

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Proceedings Article | 23 March 2021 Presentation + Paper

CNT EUV pellicle tunability and performance in a scanner-like environment

Ivan Pollentier, Steven Brems, Cedric Huyghebaert, Emily Gallagher, Maxim Korytov, Marina Timmermans, Thomas Nuytten, Stefanie Sergeant, Johan Meersschaut, Yide Zhang, Masoud Dialameh, Wilfried Alaerts, Ehsan Jazaeri, Thierry Conard, Valentina Spampinato, Alexis Franquet

Proceedings Volume 11609, 116090Y (2021) https://doi.org/10.1117/12.2584519

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Scanners, Plasma, Thermography, Photomask technology, Hydrogen, Spectroscopy

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Proceedings Article | 12 March 2021 Presentation + Paper

EUV scattering from CNT pellicles: measurement and control

Ivan Pollentier, Marina Timmermans, Cedric Huyghebaert, Steven Brems, Emily Gallagher, Bernhard Luettgenau, Sascha Brose

Proceedings Volume 11609, 1160911 (2021) https://doi.org/10.1117/12.2584718

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Proceedings Article | 5 March 2021 Presentation + Paper

Enabling non-actinic EUV mask inspection using CNT pellicle

Yaniv Blinder, Yonatan Orr, Mor Keshet, Dor Gershon, Uriel Malul, Aviram Tam, Gaetano Santoro, Kevin Houchens, Emily Gallagher, Marina Timmermans, Andreas Frommhold, Gian Lorusso

Proceedings Volume 11609, 1160910 (2021) https://doi.org/10.1117/12.2584695

KEYWORDS: Pellicles, Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Carbon nanotubes, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Imaging systems

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Wafer fab mask inspection is facing new challenges in the era of Extreme Ultraviolet Lithography (EUVL). Mask qualification methods in use for ArF lithography are reticle verification based on wafer prints or defect inspection on Deep Ultraviolet (DUV) mask inspection tools. The latter is the industry preference in most cases. To implement this established methodology for EUV masks with pellicle, the pellicle must have transmission that enables inspection for defect detection. In this work we test the viability of a DUV mask inspection platform to image and inspect an EUV mask with a Carbon Nanotube (CNT) based pellicle [1]. Pellicles are used to keep particles off the patterned side of the photomask. For DUV and longer exposure wavelengths, polymers with transmission above 99% are routine. For EUV wavelengths, identifying a transparent, mechanically robust film that is compatible with EUV exposure environments has been challenging. Commercially-available EUV pellicles for lithography are p-Si based[2]. This pellicle type achieves the critical protection of the mask but induces a significant productivity loss due to EUV light absorption. The critical need for a highly-transmissive pellicle will increase with advanced nodes that put more pressure on uniformity specifications and throughput. In this arena, CNT based pellicles exceed the required transmission for High-Volume Manufacturing (HVM) and show promise towards production adoption [3]. DUV light absorption is relevant for mask inspection. DUV light is absorbed by the p-Si pellicle, while the CNT has high transmission in this wavelength region as well, making mask inspection of EUV masks with pellicles possible on existing DUV inspection tools, such as Applied Materials Aera5TM. In order to understand the impact of CNT pellicle on DUV inspection, a controlled study was performed by Applied Materials in cooperation with imec. The study consisted of various system measurements and extensive application qualification. Aera5TM inspection results on a Programmed Defect Mask (PDM) with a full field CNT pellicle will be presented. The results with pellicle are comparable to the reference no-pellicle inspection and meet the same detection sensitivity. Detection optimization Best-Known Methods (BKM) developed on EUV masks without pellicles proved to be effective. These include, but are not limited to, aperture shaping, defocus and polarization. Moreover, the imaging and main system components performance were examined, and no impact was observed.

Proceedings Article | 23 February 2021 Presentation + Paper

CNT pellicles: imaging results of the first full-field EUV exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve Van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gokay Yeğen, Pär Broman

Proceedings Volume 11609, 116090Z (2021) https://doi.org/10.1117/12.2584724

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Proceedings Article | 23 March 2020 Presentation + Paper

The EUV CNT pellicle: balancing material properties to optimize performance

Steven Brems, Ivan Pollentier, Marina Timmermans, Cedric Huyghebaert, Emily Gallagher

Proceedings Volume 11323, 113231G (2020) https://doi.org/10.1117/12.2552357

KEYWORDS: Pellicles, Extreme ultraviolet, Particles, Coating, Atmospheric particles, Extreme ultraviolet lithography, Scattering, Light scattering, Scanners

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Proceedings Article | 17 October 2019 Presentation

CNT EUV pellicle: balancing options (Conference Presentation)

Marina Mariano Juste, Cedric Huyghebaert, Emily Gallagher, Ivan Pollentier, Marina Timmermans

Proceedings Volume 11148, 111480Z (2019) https://doi.org/10.1117/12.2539262

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Semiconducting wafers, Wafer inspection, Photomasks, Scanners, Tolerancing

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SPIE Journal Paper | 13 March 2019

Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging

Iacopo Mochi, Marina Timmermans, Emily Gallagher, Marina Mariano, Ivan Pollentier, Rajeev Rajendran, Patrick Helfenstein, Sara Fernandez, Dimitrios Kazazis, Yasin Ekinci

JM3, Vol. 18, Issue 01, 014002, (March 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.014002

KEYWORDS: Pellicles, Extreme ultraviolet, Scattering, Reticles, Diffraction, Image quality, Inspection, Coating, Photomasks, Carbon nanotubes

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SPIE Journal Paper | 27 November 2018

Free-standing carbon nanotube films for extreme ultraviolet pellicle application

Marina Y. Timmermans, Marina Mariano, Ivan Pollentier, Olivier Richard, Cedric Huyghebaert, Emily Gallagher

JM3, Vol. 17, Issue 04, 043504, (November 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043504

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Carbon nanotubes, Coating, Scanners, Hydrogen, Inspection, Photomasks

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Proceedings Article | 3 October 2018 Presentation + Paper

Experimental evaluation of the impact of EUV pellicles on reticle imaging

Iacopo Mochi, Rajendran Rajeev, Patrick Helfenstein, Sara Fernandez, Dimitrios Kazazis, Yasin Ekinci, Emily Gallagher, Marina Timmermans, Marina Mariano Juste, Ivan Pollentier

Proceedings Volume 10810, 108100Y (2018) https://doi.org/10.1117/12.2502480

KEYWORDS: Pellicles, Extreme ultraviolet, Scattering, Diffraction, Reticles, Image quality, Inspection, Coating

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Proceedings Article | 23 April 2018 Presentation + Paper

CNTs in the context of EUV pellicle history

Emily Gallagher, Marina Timmermans, Ivan Pollentier, Jae Uk Lee, Marina Mariano, Christoph Adelmann, Cedric Huyghebaert, Frank Scholze, Christian Laubis

Proceedings Volume 10583, 105831E (2018) https://doi.org/10.1117/12.2297710

KEYWORDS: Pellicles, Extreme ultraviolet, Particles, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Scanners, Scattering, Silicon, Hydrogen

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Proceedings Article | 16 October 2017 Paper

EUV optical characterization of alternative membrane materials for EUV pellicles

Frank Scholze, Christian Laubis, Marina Timmermans, Ivan Pollentier, Emily Gallagher, Michael Krumrey

Proceedings Volume 10451, 104510R (2017) https://doi.org/10.1117/12.2280553

KEYWORDS: Extreme ultraviolet, Pellicles, Transmittance, Photomasks, Extreme ultraviolet lithography, EUV optics, Reflectivity, Carbon, Wafer-level optics, Particles

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Proceedings Article | 16 October 2017 Paper

Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet

Lukas Bahrenberg, Serhiy Danylyuk, Peter Loosen, Sascha Brose, Jochen Stollenwerk, Emily Gallagher, Ivan Pollentier, Marina Timmermans

Proceedings Volume 10450, 104501L (2017) https://doi.org/10.1117/12.2280579

KEYWORDS: Reflectivity, Reflectance spectroscopy, Pellicles, Transmittance, Spectroscopy, Extreme ultraviolet, Silicon, Carbon nanotubes, Mirrors, Reflectometry

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Proceedings Article | 16 October 2017 Paper

CNT EUV pellicle: moving towards a full-size solution

Johan Meersschaut, Olivier Richard, Marina Timmermans, Ivan Pollentier, Jae Uk Lee, Christoph Adelmann, Cedric Huyghebaert, Emily Gallagher

Proceedings Volume 10451, 104510P (2017) https://doi.org/10.1117/12.2280632

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Scanners, Resistance, Coating, Reticles, Particles, Thin films

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Proceedings Article | 24 March 2017 Presentation + Paper

Novel membrane solutions for the EUV pellicle: better or not?

Ivan Pollentier, Jae Uk Lee, Marina Timmermans, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Emily Gallagher

Proceedings Volume 10143, 101430L (2017) https://doi.org/10.1117/12.2257891

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, High volume manufacturing, Absorption, Lithography, Solids, Scanners, Coating, Hydrogen

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Proceedings Article | 25 October 2016 Paper

Introducing the EUV CNT pellicle

Ivan Pollentier, Houman Zahedmanesh, Cedric Huyghebaert, Michael De Volder, Jae Uk Lee, Johannes Vanpaemel, Christoph Adelmann, Emily Gallagher, Marina Timmermans

Proceedings Volume 9985, 99850C (2016) https://doi.org/10.1117/12.2243019

KEYWORDS: Pellicles, Extreme ultraviolet, Photomasks, Carbon nanotubes, Extreme ultraviolet lithography, Carbon, Scanners, Molybdenum, Finite element methods, Silicon

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Showing 5 of 21 publications

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